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公开(公告)号：US09944828B2
公开(公告)日：2018-04-17
申请号：US14919526
申请日：2015-10-21
Applicant: Cabot Microelectronics Corporation
Inventor： Elise Sikma , Witold Paw , Benjamin Petro , Jeffrey Cross , Glenn Whitener
IPC: H01L21/302 , H01L21/461 , C09G1/02 , B24B37/04 , C23F3/04 , C23F3/06 , H01L21/321
CPC classification number: C09G1/02 , B24B37/044 , C23F3/04 , C23F3/06 , H01L21/3212
Abstract: The invention provides a chemical-mechanical polishing composition including (a) an abrasive comprising alumina particles, silica particles, or a combination thereof, (b) a rate accelerator comprising a phosphonic acid, an N-heterocyclic compound, or a combination thereof, (c) a corrosion inhibitor comprising an amphoteric surfactant, a sulfonate, a phosphonate, a carboxylate, a fatty acid amino acid, an amine, an amide, or a combination thereof, (d) an oxidizing agent, and (e) an aqueous carrier. The invention also provides a method of polishing a substrate, especially a substrate comprising a cobalt layer, with the polishing composition.
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公开(公告)号：US20160108286A1
公开(公告)日：2016-04-21
申请号：US14919526
申请日：2015-10-21
Applicant: Cabot Microelectronics Corporation
Inventor： Elise Sikma , Witold Paw , Benjamin Petro , Jeffrey Cross , Glenn Whitener
CPC classification number: C09G1/02 , B24B37/044 , C23F3/04 , C23F3/06 , H01L21/3212
Abstract: The invention provides a chemical-mechanical polishing composition including (a) an abrasive comprising alumina particles, silica particles, or a combination thereof, (b) a rate accelerator comprising a phosphonic acid, an N-heterocyclic compound, or a combination thereof, (c) a corrosion inhibitor comprising an amphoteric surfactant, a sulfonate, a phosphonate, a carboxylate, a fatty acid amino acid, an amine, an amide, or a combination thereof, (d) an oxidizing agent, and (e) an aqueous carrier. The invention also provides a method of polishing a substrate, especially a substrate comprising a cobalt layer, with the polishing composition.
Abstract translation: 本发明提供了一种化学机械抛光组合物，其包括（a）包含氧化铝颗粒，二氧化硅颗粒或其组合的研磨剂，（b）包含膦酸，N-杂环化合物或其组合的速率促进剂（ c）包含两性表面活性剂，磺酸盐，膦酸盐，羧酸盐，脂肪酸氨基酸，胺，酰胺或其组合的腐蚀抑制剂，（d）氧化剂，和（e） 。 本发明还提供了一种抛光衬底，特别是包含钴层的衬底与抛光组合物的方法。
