利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

19 条记录 (耗时 0.032 秒)

    Method of manufacturing a thin-film transistor and method of manufacturing a display substrate using the same
    7.
    发明授权
    Method of manufacturing a thin-film transistor and method of manufacturing a display substrate using the same 有权
    薄膜晶体管的制造方法及其制造方法

    公开(公告)号：US08574971B2

    公开(公告)日：2013-11-05

    申请号：US12900936

    申请日：2010-10-08

    申请人： Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Hi-Kuk Lee

    发明人： Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Hi-Kuk Lee

    IPC分类号： H01L21/336

    CPC分类号： H01L27/1288 ,  H01L27/1214

    摘要： An approach for patterning and etching without a mask is provided in a manufacturing a thin-film transistor, a gate electrode, a gate insulating layer, a semiconductor layer, an ohmic contact layer and source metal layer of a substrate. A first photoresist pattern including a first photo pattern and a second photo pattern is formed using a digital exposure device by generating a plurality of spot beams, the first photo pattern is formed to a first region of the base substrate and has a first thickness, and the second photo pattern is formed to a second region adjacent to the first region, and has a second thickness and a width in a range of about 50% to about 60% of a diameter of the spot beam. The source metal layer is patterned to form a source electrode and a drain electrode, and the source electrode and the drain electrode are spaced apart from each other in the first region of an active pattern.

    摘要翻译： 在制造薄膜晶体管，栅极电极，栅极绝缘层，半导体层，欧姆接触层和源极金属层的衬底的制造中提供了用于没有掩模的图案化和蚀刻的方法。 使用数字曝光装置通过产生多个点光来形成包括第一照片图案和第二照片图案的第一光致抗蚀剂图案，第一照片图案形成于基底基板的第一区域并具有第一厚度，并且 第二照片图案形成在与第一区域相邻的第二区域上，并且具有第二厚度和在点光束直径的约50％至约60％的范围内的宽度。 图案化源极金属层以形成源电极和漏电极，并且源电极和漏电极在活性图案的第一区域中彼此间隔开。

    METHOD OF FORMING A PHOTOSENSITIVE PATTERN, METHOD OF MANUFACTURING A DISPLAY SUBSTRATE, AND DISPLAY SUBSTRATE
    8.
    发明申请
    METHOD OF FORMING A PHOTOSENSITIVE PATTERN, METHOD OF MANUFACTURING A DISPLAY SUBSTRATE, AND DISPLAY SUBSTRATE 有权
    形成感光图案的方法，制造显示基板的方法和显示基板

    公开(公告)号：US20120241740A1

    公开(公告)日：2012-09-27

    申请号：US13407423

    申请日：2012-02-28

    申请人： Jung-In Park ,  Su-Yeon Sim ,  Sang-Hyun Yun ,  Cha-Dong Kim ,  Hi-Kuk Lee

    发明人： Jung-In Park ,  Su-Yeon Sim ,  Sang-Hyun Yun ,  Cha-Dong Kim ,  Hi-Kuk Lee

    IPC分类号： H01L29/04 ,  G03F7/20 ,  H01L33/08

    CPC分类号： G03F7/70291 ,  G03F7/70508 ,  H01L27/1288

    摘要： A method of forming a photosensitive pattern on a substrate with a photosensitive layer disposed thereon may include moving at least one of the substrate and a set of micro-mirrors in a first direction, the set of micro-mirrors being disposed above the substrate and being arranged as an array, the array having a first edge extending in a second direction, the second direction being at an acute angle with respect to the first direction. The method may also include selectively turning on one or more micro-mirrors of the set of micro-mirrors according to a position of the set of micro-mirrors relative to the photosensitive layer, thereby irradiating one or more spot beams on the photosensitive layer. The photosensitive layer exposed by the spot beams is developed to form a photosensitive pattern having an edge portion extending in a third direction crossing the first and second directions.

    摘要翻译： 在其上设置有感光层的基板上形成感光图案的方法可以包括在第一方向上移动基板和一组微镜中的至少一个，所述微镜组设置在基板上方并且 排列为阵列，所述阵列具有沿第二方向延伸的第一边缘，所述第二方向相对于所述第一方向成锐角。 该方法还可以包括根据微镜相对于感光层的位置选择性地打开该组微镜的一个或多个微镜，从而在感光层上照射一个或多个光束。 由点光束曝光的感光层被显影以形成具有沿与第一和第二方向交叉的第三方向延伸的边缘部分的感光图案。

    Digital Exposure Method and Digital Exposure Device for Performing the Method
    9.
    发明申请
    Digital Exposure Method and Digital Exposure Device for Performing the Method 有权
    用于执行该方法的数字曝光方法和数字曝光装置

    公开(公告)号：US20110205508A1

    公开(公告)日：2011-08-25

    申请号：US12906623

    申请日：2010-10-18

    申请人： Sang-Hyun Yun ,  Hi-Kuk Lee ,  Sang-Woo Bae ,  Cha-Dong Kim ,  Jung-In Park

    发明人： Sang-Hyun Yun ,  Hi-Kuk Lee ,  Sang-Woo Bae ,  Cha-Dong Kim ,  Jung-In Park

    IPC分类号： G03B27/52

    CPC分类号： G03B27/526 ,  G03B27/52 ,  G03F7/70291 ,  G03F7/70508 ,  G03F7/70541

    摘要： A digital exposure method and a digital exposure device for performing the method are disclosed. In the method, a graphic data system file is produced in correspondence with each of a plurality of patterns formed on a substrate. Then, a digital micromirror device on/off data is generated from the graphic data system file. Then, the substrate is exposed in response to the digital micromirror device on/off data. Thus, at least a first exposure for forming a first pattern of a display panel, and a second exposure for forming identification numbers of a substrate and each display panel and removing an edge portion of the substrate may be simultaneously performed, to simplify the exposure process decrease costs.

    摘要翻译： 公开了一种用于执行该方法的数字曝光方法和数字曝光装置。 在该方法中，与形成在基板上的多个图案中的每一个对应地生成图形数据系统文件。 然后，从图形数据系统文件生成数字微镜装置开/关数据。 然后，响应于数字微镜装置的开/关数据曝光基板。 因此，可以同时执行用于形成显示面板的第一图案的第一曝光和用于形成基板和每个显示面板的识别号和去除基板的边缘部分的第二曝光，以简化曝光过程 降低成本

    Digital exposure apparatus and method of exposing a substrate using the same
    10.
    发明授权
    Digital exposure apparatus and method of exposing a substrate using the same 有权
    数字曝光装置及使用其的曝光基板的方法

    公开(公告)号：US09025132B2

    公开(公告)日：2015-05-05

    申请号：US13406828

    申请日：2012-02-28

    申请人： Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee

    发明人： Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee

    IPC分类号： G03B27/54 ,  G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/70275

    摘要： A digital exposure apparatus includes a displaceable stage, a light source part, a digital micro mirror part and a micro lens part. A substrate is disposed on the stage. The light source part generates a first light. The digital micro mirror part is disposed over the stage. The digital micro mirror part includes a plurality of digital micro mirrors. The digital micro mirror converts the first light into one or more second light beams. The micro lens part is disposed between the stage and the digital micro mirror part and includes a plurality of micro lenses. The micro lenses convert the one or more second light beams into one or more third light beams which are irradiated upon the substrate. The third light has an oval cross sectional shape.

    摘要翻译： 数字曝光装置包括可位移台，光源部分，数字微镜部分和微透镜部分。 衬底设置在平台上。 光源部分产生第一光。 数字微镜部分设置在舞台上。 数字微镜部分包括多个数字微镜。 数字微镜将第一光转换成一个或多个第二光束。 微透镜部分设置在平台和数字微镜部分之间并且包括多个微透镜。 微透镜将一个或多个第二光束转换成照射在基板上的一个或多个第三光束。 第三个光具有椭圆形横截面形状。