-
公开(公告)号:US20100159132A1
公开(公告)日:2010-06-24
申请号:US12628189
申请日:2009-11-30
申请人: Chad Conroy , Scott Wayne Priddy , Jacob Allan Dahlstrom , Richard Charles Bresnahan , David William Gotthold , John Charles Patrin
发明人: Chad Conroy , Scott Wayne Priddy , Jacob Allan Dahlstrom , Richard Charles Bresnahan , David William Gotthold , John Charles Patrin
CPC分类号: C23C14/243 , C23C14/26 , C23C14/562 , Y02E10/541 , Y02P70/521
摘要: A deposition source includes a plurality of crucibles that each contains a deposition material. A heat shield provides at least partial thermal isolation for at least one of the plurality of crucibles. A body is included with a plurality of conductance channels. An input of each of the plurality of conductance channels is coupled to an output of a respective one of the plurality of crucibles. A heater increases a temperature of the plurality of crucibles so that each crucible evaporates the deposition material into the plurality of conductance channels. An input of each of a plurality of nozzles is coupled to an output of one of the plurality of conductance channels. Evaporated deposition materials are transported from the crucibles through the conductance channels to the nozzles where the evaporated deposition material is ejected from the plurality of nozzles to form a deposition flux.
摘要翻译: 沉积源包括多个坩埚,每个坩埚均包含沉积材料。 热屏蔽为多个坩埚中的至少一个提供至少部分热隔离。 身体包含多个电导通道。 多个电导通道中的每一个的输入耦合到多个坩埚中的相应一个的输出。 加热器增加多个坩埚的温度,使得每个坩埚将沉积材料蒸发成多个电导通道。 多个喷嘴中的每一个的输入耦合到多个电导通道中的一个的输出。 蒸发的沉积材料从坩埚通过导电通道输送到喷嘴,喷嘴从多个喷嘴喷射蒸发的沉积材料以形成沉积焊剂。
-
公开(公告)号:US08192547B2
公开(公告)日:2012-06-05
申请号:US11903727
申请日:2007-09-24
IPC分类号: C23C16/00
CPC分类号: F04B37/08
摘要: The present invention relates to vacuum depositions systems and related deposition methods. Vacuum deposition systems that use one or more cyropanels for localized pumping of a deposition region where a substrate is positioned are provided. The present invention is particularly applicable to pumping and minimizing reevaporation of high vapor pressure deposition materials during molecular beam epitaxy.
摘要翻译: 本发明涉及真空沉积系统和相关沉积方法。 提供使用一个或多个细胞浆进行局部泵送位于衬底的沉积区域的真空沉积系统。 本发明特别适用于在分子束外延期间泵送和最小化高蒸气压沉积材料的再蒸发。
-
公开(公告)号:US20080134975A1
公开(公告)日:2008-06-12
申请号:US11903727
申请日:2007-09-24
CPC分类号: F04B37/08
摘要: The present invention relates to vacuum depositions systems and related deposition methods. Vacuum deposition systems that use one or more cyropanels for localized pumping of a deposition region where a substrate is positioned are provided. The present invention is particularly applicable to pumping and minimizing reevaporation of high vapor pressure deposition materials during molecular beam epitaxy.
摘要翻译: 本发明涉及真空沉积系统和相关沉积方法。 提供使用一个或多个细胞浆进行局部泵送位于衬底的沉积区域的真空沉积系统。 本发明特别适用于在分子束外延期间泵送和最小化高蒸气压沉积材料的再蒸发。
-
公开(公告)号:US20100282167A1
公开(公告)日:2010-11-11
申请号:US12818101
申请日:2010-06-17
申请人: Chad Conroy , Scott Wayne Priddy , Jacob A. Dahlstrom , Rich Bresnahan , David William Gotthold , John Patrin
发明人: Chad Conroy , Scott Wayne Priddy , Jacob A. Dahlstrom , Rich Bresnahan , David William Gotthold , John Patrin
IPC分类号: C23C16/448 , C23C16/44
CPC分类号: C23C14/243 , C23C14/26 , C23C14/562
摘要: A deposition source includes a crucible for containing deposition material and a body comprising a conductance channel. An input of the conductance channel is coupled to an output of the crucible. A heater heats the crucible so that the crucible evaporates the deposition material into the conductance channel. A heat shield comprising a plurality of heat resistant material layers is positioned around at least one of the heater and the body. A plurality of nozzles is coupled to an output of the conductance channel so that evaporated deposition material is transported from the crucible through the conductance channel to the plurality of nozzles where the evaporated deposition material is ejected from the plurality of nozzles to form a deposition flux.
摘要翻译: 沉积源包括用于容纳沉积材料的坩埚和包括电导通道的主体。 电导通道的输入耦合到坩埚的输出端。 加热器加热坩埚,使得坩埚将沉积材料蒸发到电导通道中。 包括多个耐热材料层的隔热屏围绕加热器和主体中的至少一个定位。 多个喷嘴被耦合到电导通道的输出端,使得蒸发的沉积材料从坩埚通过导电通道传送到多个喷嘴,其中蒸发的沉积材料从多个喷嘴喷射以形成沉积焊剂。
-
公开(公告)号:US20100285218A1
公开(公告)日:2010-11-11
申请号:US12818117
申请日:2010-06-17
申请人: Chad Conroy , Scott Wayne Priddy , Jacob A. Dahlstrom , Rich Bresnahan , David William Gotthold , John Patrin
发明人: Chad Conroy , Scott Wayne Priddy , Jacob A. Dahlstrom , Rich Bresnahan , David William Gotthold , John Patrin
IPC分类号: C23C16/448 , C23C16/44
CPC分类号: C23C14/243 , C23C14/26 , C23C14/562
摘要: A deposition source includes at least one crucible for containing deposition material. A body includes a conductance channel with an input coupled to an output of the crucible. A heater increases a temperature of the crucible so that the crucible evaporates the deposition material into the conductance channel. A plurality of nozzles is coupled to an output of the conductance channel so that evaporated deposition material is transported from the crucible through the conductance channel to the plurality of nozzles where the evaporated deposition material is ejected from the plurality of nozzles to form a deposition flux. At least one of the plurality of nozzles includes a tube that is positioned proximate to the conductance channel so that the tube restricts an amount of deposition material supplied to the nozzle including the tube.
摘要翻译: 沉积源包括至少一个用于容纳沉积材料的坩埚。 身体包括电导通道,输入端与坩埚的输出相连接。 加热器增加坩埚的温度,使得坩埚将沉积材料蒸发到电导通道中。 多个喷嘴被耦合到电导通道的输出端,使得蒸发的沉积材料从坩埚通过导电通道传送到多个喷嘴,其中蒸发的沉积材料从多个喷嘴喷射以形成沉积焊剂。 多个喷嘴中的至少一个喷嘴包括靠近导电通道定位的管,使得管限制供应到包括管的喷嘴的沉积材料的量。
-
-
-
-