Developing photoresist with supercritical fluid and developer
    2.
    发明授权
    Developing photoresist with supercritical fluid and developer 失效
    用超临界流体和显影剂显影光刻胶

    公开(公告)号:US07044662B2

    公开(公告)日:2006-05-16

    申请号:US10911085

    申请日:2004-08-03

    IPC分类号: G03D5/00

    CPC分类号: B05D3/02 G03C5/26 G03F7/30

    摘要: An apparatus for developing a polymeric film without the need for a water rinse step is disclosed. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber of the apparatus. A fluid and developer is introduced into the pressure chamber and the object is processed at supercritical conditions to develop the polymeric film such that the polymeric film is not substantially deformed. The pressure chamber is then vented.

    摘要翻译: 公开了一种用于显影聚合物膜而不需要水冲洗步骤的装置。 具有支撑聚合物膜的表面的物体被放置在设备的压力室内的支撑区域上。 将流体和显影剂引入压力室中,并且物体在超临界条件下进行处理以开发聚合物膜,使得聚合物膜基本上不变形。 然后将压力室排气。