利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

21 条记录 (耗时 0.031 秒)

    Segmented resist islands for photolithography on single sliders
    2.
    发明申请
    Segmented resist islands for photolithography on single sliders 失效
    在单个滑块上用于光刻的分段抗蚀岛

    公开(公告)号：US20060045971A1

    公开(公告)日：2006-03-02

    申请号：US10928038

    申请日：2004-08-27

    申请人： Cherngye Hwang ,  Kim Lee ,  Dennis McKean ,  Gary Suzuki

    发明人： Cherngye Hwang ,  Kim Lee ,  Dennis McKean ,  Gary Suzuki

    IPC分类号： B05D5/00

    CPC分类号： G11B5/6005 ,  G11B5/3163 ,  G11B5/3173

    摘要： A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that is below a proper softbake temperature. The single sliders reside in a divider and the single sliders and walls of the divider have a layer of resist deposited on them. Coarse lithography is then performed to remove the resist from above portions of the walls of the divider; and the temperature of the single sliders, the resist and the divider is then ramped to a proper softbake temperature.

    摘要翻译： 公开了一种用于在单个滑块上创建用于光刻的分割的抗蚀岛的方法。 该方法包括将多个单个滑块的温度升高到低于适当的软烘烤温度的温度。 单个滑块位于分隔器中，分隔器的单个滑块和壁具有沉积在其上的抗蚀剂层。 然后进行粗光刻以从分隔器的壁的上部的部分去除抗蚀剂; 然后将单个滑块，抗蚀剂和分隔器的温度倾斜到适当的软烘烤温度。

    Methods of making magnetic write heads with use of linewidth shrinkage techniques
    3.
    发明申请
    Methods of making magnetic write heads with use of linewidth shrinkage techniques 失效
    使用线宽收缩技术制造磁头的方法

    公开(公告)号：US20060010684A1

    公开(公告)日：2006-01-19

    申请号：US10881782

    申请日：2004-06-30

    申请人： Kim Lee ,  Jyh-Shuey Lo ,  Dennis McKean

    发明人： Kim Lee ,  Jyh-Shuey Lo ,  Dennis McKean

    IPC分类号： G11B5/127 ,  H04R31/00

    CPC分类号： G11B5/3163 ,  G11B5/3116 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： A method for use in making a magnetic write head includes the steps of forming a first pole piece layer of a first pole piece; forming a patterned resist over the first pole piece layer; electroplating a pedestal over the first pole piece layer within a channel of the patterned resist; electroplating a metal gap layer over the pedestal within the channel of the patterned resist; forming a resist channel shrinking film over the patterned resist; baking the resist channel shrinking film over the patterned to thereby reduce a width of the channel; removing the resist channel shrinking film; electroplating a second pole piece within the reduced-width channel of the patterned resist; removing the patterned resist; and milling the pedestal, using the second pole piece as a mask, to form a central notched pedestal having side walls with angled slopes. Advantageously, the reduction in channel width using the resist channel shrinking film provides for self-alignment of the second pole piece with the pedestal which can be symmetrically notched for improved overwrite (OW) properties and reduced adjacent track interference (ATI).

    摘要翻译： 一种用于制造磁写头的方法包括以下步骤：形成第一极片的第一极片层; 在所述第一极片层上形成图案化抗蚀剂; 在图案化的抗蚀剂的通道内的第一极片层上电镀一个基座; 在图案化的抗蚀剂的通道内的基座上方电镀金属间隙层; 在图案化的抗蚀剂上形成抗蚀剂通道收缩膜; 在图案上烘烤抗蚀剂通道收缩膜，从而减小通道的宽度; 去除抗蚀剂通道收缩膜; 在图案化的抗蚀剂的减小宽度的通道内电镀第二极片; 去除图案化的抗蚀剂; 并使用第二极片作为掩模铣削基座，以形成具有倾斜斜面的侧壁的中心凹口底座。 有利地，使用抗蚀剂通道收缩薄膜的通道宽度的减小提供了第二极靴与基座的自对准，该基座可对称切口以改善覆盖（OW）特性和减小的相邻轨道干涉（ATI）。

    Methods of making magnetic write heads with use of a resist channel shrinking solution having corrosion inhibitors
    4.
    发明申请
    Methods of making magnetic write heads with use of a resist channel shrinking solution having corrosion inhibitors 审中-公开
    使用具有腐蚀抑制剂的抗蚀剂通道收缩溶液制造磁性写入头的方法

    公开(公告)号：US20060096081A1

    公开(公告)日：2006-05-11

    申请号：US11312064

    申请日：2005-12-19

    申请人： Christian Bonhote ,  Jila Tabib ,  Dennis McKean ,  Daniel Bedell ,  Jyh-Shuey Lo ,  Hieu Lam ,  Kim Lee

    发明人： Christian Bonhote ,  Jila Tabib ,  Dennis McKean ,  Daniel Bedell ,  Jyh-Shuey Lo ,  Hieu Lam ,  Kim Lee

    IPC分类号： G11B5/127 ,  H04R31/00

    CPC分类号： G11B5/3116 ,  G11B5/3163 ,  Y10T29/49032 ,  Y10T29/49039 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： One preferred method for use in making a magnetic write head with use of the resist channel shrinking solution includes the steps of forming a first pole piece layer of a first pole piece; forming a gap layer over the first pole piece layer; forming a patterned resist over the first pole piece layer and the gap layer; electroplating a first pedestal portion of a second pole piece over the gap layer within a channel of the patterned resist; forming an oxide layer over the first pedestal portion; applying the resist channel shrinking solution comprising the resist channel shrinking film and the corrosion inhibitors over the patterned resist; baking the resist channel shrinking solution over the patterned resist to thereby reduce a width of the channel; removing the resist channel shrinking solution; electroplating a second pedestal portion of the second pole piece within the reduced-width channel of the patterned resist; removing the patterned resist; and milling the structure. Advantageously, the oxide layer and the corrosion inhibitors of the resist channel shrinking solution reduce corrosion in the pole piece during the act of baking the resist channel shrinking solution.

    摘要翻译： 使用抗蚀剂通道收缩溶液制造磁性写入头的一种优选方法包括以下步骤：形成第一极片的第一极片层; 在所述第一极片层上形成间隙层; 在所述第一极片层和所述间隙层上形成图案化的抗蚀剂; 在图案化的抗蚀剂的通道内的间隙层上电镀第二极片的第一基座部分; 在所述第一基座部分上形成氧化物层; 在图案化的抗蚀剂上施加包含抗蚀剂通道收缩膜和腐蚀抑制剂的抗蚀剂通道收缩溶液; 在图案化的抗蚀剂上烘烤抗蚀剂通道收缩溶液，从而减小通道的宽度; 去除抗蚀剂通道收缩溶液; 在所述图案化抗蚀剂的所述减小宽度的通道内电镀所述第二极靴的第二基座部分; 去除图案化的抗蚀剂; 并研磨结构。 有利地，抗蚀剂通道收缩溶液的氧化物层和腐蚀抑制剂在烘烤抗蚀剂通道收缩溶液的作用期间减少极片中的腐蚀。

    Elimination of write head plating defects using high activation chemically amplified resist
    5.
    发明申请
    Elimination of write head plating defects using high activation chemically amplified resist 失效
    使用高激活化学放大抗蚀剂消除写头电镀缺陷

    公开(公告)号：US20050239001A1

    公开(公告)日：2005-10-27

    申请号：US10831412

    申请日：2004-04-23

    申请人： Kim Lee ,  Dennis McKean

    发明人： Kim Lee ,  Dennis McKean

    IPC分类号： G03F7/039 ,  G03F7/40 ,  G11B5/187 ,  G11B5/31

    CPC分类号： G03F7/405 ,  G03F7/0392 ,  G11B5/3116 ,  G11B5/3163 ,  Y10T29/49021

    摘要： Methods of forming a component of a thin film magnetic head and improving the plating of a component of a thin film magnetic head are provided. The methods include the use of a high activation energy chemically amplified photoresist (CARS) that is contacted with a low pH high saturation magnetic moment plating solution to form a magnetic head component that is essentially free of plating defects. The methods find utility in hard disk drive applications, such as in the manufacture of magnetic poles for the write head of a hard disk drive.

    摘要翻译： 提供了形成薄膜磁头的部件并改善薄膜磁头的部件的电镀的方法。 这些方法包括使用与低pH高饱和磁矩电镀溶液接触的高活化能化学放大光致抗蚀剂（CARS），以形成基本上没有电镀缺陷的磁头组分。 该方法可用于硬盘驱动器应用，例如用于制造用于硬盘驱动器的写头的磁极。

    SUBLIMATION INKS FOR THERMAL INKJET PRINTERS USING THERMALLY STABLE DYE PARTICLES
    8.
    发明申请
    SUBLIMATION INKS FOR THERMAL INKJET PRINTERS USING THERMALLY STABLE DYE PARTICLES 审中-公开
    使用热稳定的染料颗粒进行热喷墨打印机的底漆

    公开(公告)号：US20120162332A1

    公开(公告)日：2012-06-28

    申请号：US12975397

    申请日：2010-12-22

    申请人： Dennis McKean ,  Francis Chee-Shuen LEE

    发明人： Dennis McKean ,  Francis Chee-Shuen LEE

    IPC分类号： B41J2/01 ,  C09D11/02

    CPC分类号： C09D11/32 ,  C09D11/40

    摘要： Thermal inkjet printer sublimation inks are provided having high melting point suspended particles such that the ink does not clog thermal ink jet print heads. Low-cost thermal ink jet printers are used to create thermal transfer images from the inks which are used in conventional thermal transfer processes. An ink set having at least three ink colors includes an aqueous medium of 30-95 weight percent having particles of 50 nm to 1000 nm suspended therein in an amount of 1-10 weight percent. The suspended particles include a sublimation dye and have a melting point of at least a surface of the particle greater than or equal to 200° C. The particles may have a core-shell structure with a sublimation dye core. The ink includes one or more cosolvents from 4-40 weight percent, a surfactant of 0.01 to 5 weight percent, and a biocide of 0.01-5 weight percent.

    摘要翻译： 提供具有高熔点悬浮颗粒的热喷墨打印机升华油墨，使得油墨不会堵塞热喷墨打印头。 低成本的热喷墨打印机用于从常规热转印工艺中使用的油墨产生热转印图像。 具有至少三种油墨颜色的油墨组包括以1-10重量％的量悬浮在其中的具有50nm至1000nm的颗粒的30-95重量％的水性介质。 悬浮颗粒包括升华染料，并且至少具有大于或等于200℃的颗粒的表面的熔点。颗粒可以具有带升华染料芯的核 - 壳结构。 油墨包含一种或多种4-40重量％的共溶剂，0.01至5重量％的表面活性剂和0.01-5重量％的杀生物剂。

    Method for repairing photoresist layer defects using index matching overcoat
    10.
    发明申请
    Method for repairing photoresist layer defects using index matching overcoat 失效
    使用指数匹配大衣修复光致抗蚀剂层缺陷的方法

    公开(公告)号：US20070089288A1

    公开(公告)日：2007-04-26

    申请号：US11257911

    申请日：2005-10-24

    申请人： Dennis McKean ,  Gary Suzuki

    发明人： Dennis McKean ,  Gary Suzuki

    IPC分类号： G11B5/127 ,  C23C14/00

    CPC分类号： G11B5/102 ,  Y10S438/946 ,  Y10T29/4903 ,  Y10T29/49041 ,  Y10T29/49046 ,  Y10T29/49798

    摘要： A method is presented for repairing damaged photomasks for electronic component fabrication processes, particularly for fabrication of the ABS of a disk drive slider. The method includes applying an overcoat of material having index of fraction which is close to the index of refraction of the photoresist material of the damaged photomask to produce a non-scattering boundary surface. The overcoat material preferably includes an overcoat base material which is a polymer having an index of refraction which is in the range of plus or minus 0.1 from the index of refraction of said photoresist material.

    摘要翻译： 提出了一种用于修复用于电子元件制造工艺的损坏的光掩模的方法，特别是用于制造磁盘驱动器滑块的ABS。 该方法包括施加具有接近损伤的光掩模的光致抗蚀剂材料的折射率的分数的材料的外涂层以产生非散射边界表面。 外涂层材料优选包括外涂层基材，其是具有折射率的聚合物，其折射率从所述光致抗蚀剂材料的折射率在正或负0.1的范围内。