公开(公告)号：US6026762A

公开(公告)日：2000-02-22

申请号：US839111

申请日：1997-04-23

申请人： Chien-Teh Kao ,  Kenneth Tsai ,  Quyen Pham ,  Ronald L. Rose ,  Calvin R. Augason ,  Joseph Yudovsky

发明人： Chien-Teh Kao ,  Kenneth Tsai ,  Quyen Pham ,  Ronald L. Rose ,  Calvin R. Augason ,  Joseph Yudovsky

IPC分类号： C23C16/44 ,  C23C16/452 ,  C23C16/50 ,  C23C16/511 ,  C23C16/52 ,  H01J37/32 ,  H01L21/00 ,  H01L21/205 ,  H01L21/285 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  C23C16/00

CPC分类号： C23C16/52 ,  C23C16/4405 ,  C23C16/452 ,  H01J37/32192 ,  H01J37/32357 ,  H01J37/32862 ,  H01L21/67028

摘要： An apparatus and methods for an upgraded CVD system providing a remote plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides apparatus for an easily removable, conveniently handled, and relatively inexpensive, robust microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. The present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a remote plasma for efficiently cleaning the chamber.

摘要翻译： 根据具体实施例的用于提供用于有效清洁腔室的远程等离子体的升级CVD系统的装置和方法。 使用本发明的升级的CVD系统也可以实现在基板上的蚀刻或沉积层。 在具体实施例中，本发明提供了一种用于易于移除，方便处理且相对便宜的鲁棒微波等离子体源的装置，作为对现有CVD设备的改进或可移除的添加。 本发明提供了一种改进的CVD装置或改进现有CVD装置，其能够产生用于有效清洁腔室的远程等离子体。

公开(公告)号：US06271148B1

公开(公告)日：2001-08-07

申请号：US09416861

申请日：1999-10-13

申请人： Chien-Teh Kao ,  Kenneth Tsai ,  Quyen Pham ,  Ronald L. Rose ,  Calvin R. Augason ,  Joseph Yudovsky

发明人： Chien-Teh Kao ,  Kenneth Tsai ,  Quyen Pham ,  Ronald L. Rose ,  Calvin R. Augason ,  Joseph Yudovsky

IPC分类号： H01L21302

CPC分类号： C23C16/52 ,  C23C16/4405 ,  C23C16/452 ,  H01J37/32192 ,  H01J37/32357 ,  H01J37/32862 ,  H01L21/67028

摘要： An apparatus and methods for an upgraded CVD system providing a remote plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides apparatus for an easily removable, conveniently handled, and relatively inexpensive, robust microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. The present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a remote plasma for efficiently cleaning the chamber.

摘要翻译： 根据具体实施例的用于提供用于有效清洁腔室的远程等离子体的升级CVD系统的装置和方法。 使用本发明的升级的CVD系统也可以实现在基板上的蚀刻或沉积层。 在具体实施例中，本发明提供了一种用于易于移除，方便处理且相对便宜的鲁棒微波等离子体源的装置，作为对现有CVD设备的改进或可移除的添加。 本发明提供了一种改进的CVD装置或改进现有CVD装置，其能够产生用于有效清洁腔室的远程等离子体。

公开(公告)号：US20110151119A1

公开(公告)日：2011-06-23

申请号：US13038309

申请日：2011-03-01

申请人： Lawrence Chung-Lai Lei ,  Alfred Mak ,  Rex Liu ,  Kon Park ,  Samuel S. Pak ,  Tzy-Chung Terry Wu ,  Simon Zhu ,  Ronald L. Rose ,  Gene Shin ,  Xiaoming Wang

发明人： Lawrence Chung-Lai Lei ,  Alfred Mak ,  Rex Liu ,  Kon Park ,  Samuel S. Pak ,  Tzy-Chung Terry Wu ,  Simon Zhu ,  Ronald L. Rose ,  Gene Shin ,  Xiaoming Wang

IPC分类号： H01L21/677 ,  H01L21/673 ,  C23C16/44 ,  C23C16/458 ,  C23C16/56

CPC分类号： H01L21/67173 ,  H01L21/6719 ,  H01L21/67706 ,  H01L21/67712 ,  H01L21/67727 ,  H01L21/67736 ,  H01L21/67748 ,  Y10S414/135

摘要： In accordance with some embodiments described herein, a method for transferring a substrate to two or more process modules is provided, comprising loading at least one substrate into one or more mobile transverse chambers, the mobile transverse chambers being carried on a rail positioned adjacent to the two or more process modules, and wherein each mobile transverse chamber is configured to maintain a specified gas condition during conveyance of the substrate. One or more drive systems are actuated to propel at least one of the one or more mobile transverse chambers along the rail. The at least one mobile transfer chamber docks to at least one of the process modules, and the substrate is conveyed from the mobile transverse chamber to the at least one process modules.

摘要翻译： 根据本文描述的一些实施例，提供了一种用于将衬底转移到两个或更多个工艺模块的方法，包括将至少一个衬底加载到一个或多个移动横向室中，所述移动横向室承载在邻近 两个或更多个处理模块，并且其中每个移动横向室被构造成在输送基板期间保持特定的气体状态。 一个或多个驱动系统被致动以沿着轨道推进一个或多个移动横向室中的至少一个。 所述至少一个移动传送室与所述处理模块中的至少一个对接，并且所述基板从所述移动横向室传送到所述至少一个处理模块。

公开(公告)号：US20100167503A1

公开(公告)日：2010-07-01

申请号：US12319231

申请日：2008-12-31

申请人： Lawrence Chung-Lai Lei ,  Alfred Mak ,  Rex Liu ,  Kon Park ,  Samuel S. Pak ,  Tzy-Chung Terry Wu ,  Simon Zhu ,  Ronald L. Rose ,  Gene Shin ,  Xiaoming Wang

发明人： Lawrence Chung-Lai Lei ,  Alfred Mak ,  Rex Liu ,  Kon Park ,  Samuel S. Pak ,  Tzy-Chung Terry Wu ,  Simon Zhu ,  Ronald L. Rose ,  Gene Shin ,  Xiaoming Wang

IPC分类号： H01L21/677 ,  H01L21/36 ,  H01L21/673

CPC分类号： H01L21/67173 ,  H01L21/6719 ,  H01L21/67706 ,  H01L21/67712 ,  H01L21/67727 ,  H01L21/67736 ,  H01L21/67748 ,  Y10S414/135

摘要： In accordance with some embodiments described herein, a method for transferring a substrate to two or more process modules is provided, comprising loading at least one substrate into one or more mobile transverse chambers, the mobile transverse chambers being carried on a rail positioned adjacent to the two or more process modules, and wherein each mobile transverse chamber is configured to maintain a specified gas condition during conveyance of the substrate. One or more drive systems are actuated to propel at least one of the one or more mobile transverse chambers along the rail. The at least one mobile transfer chamber docks to at least one of the process modules, and the substrate is conveyed from the mobile transverse chamber to the at least one process modules.

摘要翻译： 根据本文描述的一些实施例，提供了一种用于将衬底转移到两个或更多个工艺模块的方法，包括将至少一个衬底加载到一个或多个移动横向室中，所述移动横向室承载在邻近 两个或更多个处理模块，并且其中每个移动横向室被构造成在输送基板期间保持特定的气体状态。 一个或多个驱动系统被致动以沿着轨道推进一个或多个移动横向室中的至少一个。 所述至少一个移动传送室与所述处理模块中的至少一个对接，并且所述基板从所述移动横向室传送到所述至少一个处理模块。

公开(公告)号：US06206971B1

公开(公告)日：2001-03-27

申请号：US09281998

申请日：1999-03-29

申请人： Salvador P. Umotoy ,  Lawrence Chung-Lai Lei ,  Russell C. Ellwanger ,  Ronald L. Rose ,  Joel Huston ,  James Jin-Long Chen

发明人： Salvador P. Umotoy ,  Lawrence Chung-Lai Lei ,  Russell C. Ellwanger ,  Ronald L. Rose ,  Joel Huston ,  James Jin-Long Chen

IPC分类号： C23C1600

CPC分类号： B01D8/00 ,  C23C16/4412 ,  Y10S55/15 ,  Y10S55/30

摘要： A temperature-controlled exhaust assembly with cold trap capability. One embodiment of the exhaust assembly comprises a multi-heater design which allows for independent multi-zone closed-loop temperature control. Another embodiment comprises a compact multi-valve uni-body design incorporating a single heater for simplified closed-loop temperature control. The cold trap incorporates a heater for temperature control at the inlet of the trap to minimize undesirable deposits. One embodiment also comprises a multi-stage cold trap and a particle trap. As a removable unit, this cold trap provides additional safety in the handling and disposal of the adsorbed condensables.

摘要翻译： 具有冷阱能力的温度控制排气组件。 排气组件的一个实施例包括允许独立的多区域闭环温度控制的多加热器设计。 另一个实施例包括紧凑的多阀单体设计，其包括用于简化闭环温度控制的单个加热器。 冷阱包含一个加热器，用于在陷阱入口进行温度控制，以尽量减少不必要的沉积物。 一个实施例还包括多级冷阱和颗粒捕集器。 作为可拆卸单元，该冷阱在吸附的可冷凝物的处理和处理中提供了额外的安全性。

公开(公告)号：US08268734B2

公开(公告)日：2012-09-18

申请号：US13038309

申请日：2011-03-01

申请人： Lawrence Chung-Lai Lei ,  Alfred Mak ,  Rex Liu ,  Kon Park ,  Samuel S. Pak ,  Tzy-Chung Terry Wu ,  Simon Zhu ,  Ronald L. Rose ,  Gene Shin ,  Xiaoming Wang

发明人： Lawrence Chung-Lai Lei ,  Alfred Mak ,  Rex Liu ,  Kon Park ,  Samuel S. Pak ,  Tzy-Chung Terry Wu ,  Simon Zhu ,  Ronald L. Rose ,  Gene Shin ,  Xiaoming Wang

IPC分类号： H01L21/00

CPC分类号： H01L21/67173 ,  H01L21/6719 ,  H01L21/67706 ,  H01L21/67712 ,  H01L21/67727 ,  H01L21/67736 ,  H01L21/67748 ,  Y10S414/135

摘要： In accordance with some embodiments described herein, a method for transferring a substrate to two or more process modules is provided, comprising loading at least one substrate into one or more mobile transverse chambers, the mobile transverse chambers being carried on a rail positioned adjacent to the two or more process modules, and wherein each mobile transverse chamber is configured to maintain a specified gas condition during conveyance of the substrate. One or more drive systems are actuated to propel at least one of the one or more mobile transverse chambers along the rail. The at least one mobile transfer chamber docks to at least one of the process modules, and the substrate is conveyed from the mobile transverse chamber to the at least one process modules.

摘要翻译： 根据本文描述的一些实施例，提供了一种用于将衬底转移到两个或更多个工艺模块的方法，包括将至少一个衬底加载到一个或多个移动横向室中，所述移动横向室承载在邻近 两个或更多个处理模块，并且其中每个移动横向室被构造成在输送基板期间保持特定的气体状态。 一个或多个驱动系统被致动以沿着轨道推进一个或多个移动横向室中的至少一个。 所述至少一个移动传送室与所述处理模块中的至少一个对接，并且所述基板从所述移动横向室传送到所述至少一个处理模块。

公开(公告)号：US06517592B2

公开(公告)日：2003-02-11

申请号：US09740120

申请日：2000-12-19

申请人： Salvador P. Umotoy ,  Lawrence Chung-Lai Lei ,  Russell C. Ellwanger ,  Ronald L. Rose ,  Joel Huston ,  James Jin-Long Chen

发明人： Salvador P. Umotoy ,  Lawrence Chung-Lai Lei ,  Russell C. Ellwanger ,  Ronald L. Rose ,  Joel Huston ,  James Jin-Long Chen

IPC分类号： B01D4508

CPC分类号： B01D8/00 ,  C23C16/4412 ,  Y10S55/15 ,  Y10S55/30

摘要： A temperature-controlled exhaust assembly with cold trap capability. One embodiment of the exhaust assembly comprises a multi-heater design which allows for independent multi-zone closed-loop temperature control. Another embodiment comprises a compact multi-valve uni-body design incorporating a single heater for simplified closed-loop temperature control. The cold trap incorporates a heater for temperature control at the inlet of the trap to minimize undesirable deposits. One embodiment also comprises a multi-stage cold trap and a particle trap. As a removable unit, this cold trap provides additional safety in the handling and disposal of the adsorbed condensables.

摘要翻译： 具有冷阱能力的温度控制排气组件。 排气组件的一个实施例包括允许独立的多区域闭环温度控制的多加热器设计。 另一个实施例包括紧凑的多阀单体设计，其包括用于简化闭环温度控制的单个加热器。 冷阱包含一个加热器，用于在陷阱入口进行温度控制，以尽量减少不必要的沉积物。 一个实施例还包括多级冷阱和颗粒捕集器。 作为可拆卸单元，该冷阱在吸附的可冷凝物的处理和处理中提供了额外的安全性。

公开(公告)号：US08367565B2

公开(公告)日：2013-02-05

申请号：US12973736

申请日：2010-12-20

申请人： Lawrence Chung-Lai Lei ,  Alfred Mak ,  Rex Liu ,  Kon Park ,  Samuel S. Pak ,  Tzy-Chung Terry Wu ,  Simon Zhu ,  Ronald L. Rose ,  Gene Shin ,  Xiaoming Wang

发明人： Lawrence Chung-Lai Lei ,  Alfred Mak ,  Rex Liu ,  Kon Park ,  Samuel S. Pak ,  Tzy-Chung Terry Wu ,  Simon Zhu ,  Ronald L. Rose ,  Gene Shin ,  Xiaoming Wang

IPC分类号： H01L21/00

CPC分类号： B05D3/04 ,  C23C16/44 ,  H01L21/673 ,  H01L21/677

摘要： In accordance with some embodiments described herein, a method for transferring a substrate is provided. The method includes loading one or more substrates into a respective mobile chamber of one or more mobile chambers. The mobile chambers are movable on a first rail positioned adjacent to two or more process modules. Each mobile chamber is configured to maintain a specified gas condition. The respective mobile chamber is moved along the first rail. The respective mobile chamber is docked to a respective process module of the two or more process modules. At least one of the one or more substrates is conveyed from the respective mobile chamber to the respective process module.

摘要翻译： 根据本文描述的一些实施例，提供了用于转移衬底的方法。 该方法包括将一个或多个基底装载到一个或多个移动室的相应移动室中。 移动室可在与两个或更多个处理模块相邻定位的第一轨上移动。 每个移动室被构造成维持指定的气体状态。 相应的移动室沿着第一轨道移动。 相应的移动室被对接到两个或更多个处理模块的相应处理模块。 一个或多个基板中的至少一个从相应的移动室传送到相应的处理模块。

公开(公告)号：US20110217469A1

公开(公告)日：2011-09-08

申请号：US12973736

申请日：2010-12-20

申请人： Lawrence Chung-Lai Lei ,  Alfred Mak ,  Rex Liu ,  Kon Park ,  Samuel S. Pak ,  Tzy-Chung Terry Wu ,  Simon Zhu ,  Ronald L. Rose ,  Gene Shin ,  Xiaoming Wang

发明人： Lawrence Chung-Lai Lei ,  Alfred Mak ,  Rex Liu ,  Kon Park ,  Samuel S. Pak ,  Tzy-Chung Terry Wu ,  Simon Zhu ,  Ronald L. Rose ,  Gene Shin ,  Xiaoming Wang

IPC分类号： H01L21/677 ,  H01L21/673 ,  B05D3/04 ,  C23C16/44

CPC分类号： B05D3/04 ,  C23C16/44 ,  H01L21/673 ,  H01L21/677

摘要： In accordance with some embodiments described herein, a method for transferring a substrate is provided. The method includes loading one or more substrates into a respective mobile chamber of one or more mobile chambers. The mobile chambers are movable on a first rail positioned adjacent to two or more process modules. Each mobile chamber is configured to maintain a specified gas condition. The respective mobile chamber is moved along the first rail. The respective mobile chamber is docked to a respective process module of the two or more process modules. At least one of the one or more substrates is conveyed from the respective mobile chamber to the respective process module.

摘要翻译： 根据本文描述的一些实施例，提供了用于转移衬底的方法。 该方法包括将一个或多个基底装载到一个或多个移动室的相应移动室中。 移动室可在与两个或更多个处理模块相邻定位的第一轨上移动。 每个移动室被构造成维持指定的气体状态。 相应的移动室沿着第一轨道移动。 相应的移动室被对接到两个或更多个处理模块的相应处理模块。 一个或多个基板中的至少一个从相应的移动室传送到相应的处理模块。

公开(公告)号：US07897525B2

公开(公告)日：2011-03-01

申请号：US12319231

申请日：2008-12-31

申请人： Lawrence Chung-Lai Lei ,  Alfred Mak ,  Rex Liu ,  Kon Park ,  Samuel S. Pak ,  Tzy-Chung Terry Wu ,  Simon Zhu ,  Ronald L. Rose ,  Gene Shin ,  Xiaoming Wang

发明人： Lawrence Chung-Lai Lei ,  Alfred Mak ,  Rex Liu ,  Kon Park ,  Samuel S. Pak ,  Tzy-Chung Terry Wu ,  Simon Zhu ,  Ronald L. Rose ,  Gene Shin ,  Xiaoming Wang

IPC分类号： H01L21/00

CPC分类号： H01L21/67173 ,  H01L21/6719 ,  H01L21/67706 ,  H01L21/67712 ,  H01L21/67727 ,  H01L21/67736 ,  H01L21/67748 ,  Y10S414/135

摘要： In accordance with some embodiments described herein, a method for transferring a substrate to two or more process modules is provided, comprising loading at least one substrate into one or more mobile transverse chambers, the mobile transverse chambers being carried on a rail positioned adjacent to the two or more process modules, and wherein each mobile transverse chamber is configured to maintain a specified gas condition during conveyance of the substrate. One or more drive systems are actuated to propel at least one of the one or more mobile transverse chambers along the rail. The at least one mobile transfer chamber docks to at least one of the process modules, and the substrate is conveyed from the mobile transverse chamber to the at least one process modules.

摘要翻译： 根据本文描述的一些实施例，提供了一种用于将衬底转移到两个或更多个工艺模块的方法，包括将至少一个衬底加载到一个或多个移动横向室中，所述移动横向室承载在邻近 两个或更多个处理模块，并且其中每个移动横向室被构造成在输送基板期间保持特定的气体状态。 一个或多个驱动系统被致动以沿着轨道推进一个或多个移动横向室中的至少一个。 所述至少一个移动传送室与所述处理模块中的至少一个对接，并且所述基板从所述移动横向室传送到所述至少一个处理模块。