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    Method of patterning metal alloy material layer having hafnium and molybdenum
    1.
    发明授权
    Method of patterning metal alloy material layer having hafnium and molybdenum 有权
    具有铪和钼的金属合金材料层的图形化方法

    公开(公告)号：US08691705B2

    公开(公告)日：2014-04-08

    申请号：US13118604

    申请日：2011-05-31

    申请人： Chih-Wei Huang ,  Chao-Sung Lai ,  Hsing-Kan Peng ,  Chung-Yuan Lee ,  Shian-Jyh Lin

    发明人： Chih-Wei Huang ,  Chao-Sung Lai ,  Hsing-Kan Peng ,  Chung-Yuan Lee ,  Shian-Jyh Lin

    IPC分类号： H01L21/302 ,  H01L21/461

    CPC分类号： C23F1/26 ,  H01L21/32134

    摘要： A method of patterning a metal alloy material layer having hafnium and molybdenum. The method includes forming a patterned mask layer on a metal alloy material layer having hafnium and molybdenum on a substrate. The patterned mask layer is used as a mask and an etching process is performed using an etchant on the metal alloy material layer having hafnium and molybdenum so as to form a metal alloy layer having hafnium and molybdenum. The etchant includes at least nitric acid, hydrofluoric acid and sulfuric acid. The patterned mask layer is removed.

    摘要翻译： 图案化具有铪和钼的金属合金材料层的方法。 该方法包括在基板上的具有铪和钼的金属合金材料层上形成图案化掩模层。 图案化掩模层用作掩模，并且使用具有铪和钼的金属合金材料层上的蚀刻剂进行蚀刻处理，以形成具有铪和钼的金属合金层。 蚀刻剂至少包括硝酸，氢氟酸和硫酸。 去除图案化的掩模层。

    METHOD OF PATTERNING METAL ALLOY MATERIAL LAYER HAVING HAFNIUM AND MOLYBDENUM
    2.
    发明申请
    METHOD OF PATTERNING METAL ALLOY MATERIAL LAYER HAVING HAFNIUM AND MOLYBDENUM 有权
    具有铪和钼的金属合金材料层的方法

    公开(公告)号：US20110226736A1

    公开(公告)日：2011-09-22

    申请号：US13118604

    申请日：2011-05-31

    申请人： Chih-Wei Huang ,  Chao-Sung Lai ,  Hsing-Kan Peng ,  Chung-Yuan Lee ,  Shian-Jyh Lin

    发明人： Chih-Wei Huang ,  Chao-Sung Lai ,  Hsing-Kan Peng ,  Chung-Yuan Lee ,  Shian-Jyh Lin

    IPC分类号： C23F1/02 ,  C23F1/26

    CPC分类号： C23F1/26 ,  H01L21/32134

    摘要： A method of patterning a metal alloy material layer having hafnium and molybdenum. The method includes forming a patterned mask layer on a metal alloy material layer having hafnium and molybdenum on a substrate. The patterned mask layer is used as a mask and an etching process is performed using an etchant on the metal alloy material layer having hafnium and molybdenum so as to form a metal alloy layer having hafnium and molybdenum. The etchant includes at least nitric acid, hydrofluoric acid and sulfuric acid. The patterned mask layer is removed.

    摘要翻译： 图案化具有铪和钼的金属合金材料层的方法。 该方法包括在基板上的具有铪和钼的金属合金材料层上形成图案化掩模层。 图案化掩模层用作掩模，并且使用具有铪和钼的金属合金材料层上的蚀刻剂进行蚀刻处理，以形成具有铪和钼的金属合金层。 蚀刻剂至少包括硝酸，氢氟酸和硫酸。 去除图案化的掩模层。

    Cover for protecting solar cells during fabrication
    6.
    发明授权
    Cover for protecting solar cells during fabrication 有权
    盖子用于在制造过程中保护太阳能电池

    公开(公告)号：US08697478B2

    公开(公告)日：2014-04-15

    申请号：US13604948

    申请日：2012-09-06

    申请人： Chih-Wei Huang ,  Keng-Hsin Chi ,  Chien-Nan Lin ,  Hua-Tso Wei

    发明人： Chih-Wei Huang ,  Keng-Hsin Chi ,  Chien-Nan Lin ,  Hua-Tso Wei

    IPC分类号： H01L21/00

    CPC分类号： H01L31/18 ,  H01L31/048 ,  Y02E10/50 ,  Y10T29/5313

    摘要： A removable cover system for protecting solar cells from exposure to moisture during fabrication processes. The cover system includes a cover having a configuration that complements the configuration of a solar cell substrate to be processed in an apparatus where moisture is present. A resiliently deformable seal member attached to the cover is positionable with the cover to engage and seal the top surface of the substrate. In one embodiment, the cover is dimensioned and arranged so that the seal member engages the peripheral angled edges and corners of the substrate for preventing the ingress of moisture beneath the cover. An apparatus for fabricating a solar cell using the cover and associated method are also disclosed.

    摘要翻译： 一种可拆卸的覆盖系统，用于在制造过程中保护太阳能电池不受湿气侵害。 覆盖系统包括具有与在存在湿气的装置中待处理的太阳能电池基板的构造互补的构造的盖。 附接到盖的可弹性变形的密封构件可与盖定位以接合和密封基板的顶表面。 在一个实施例中，盖的尺寸和布置使得密封构件接合基板的周向成角度的边缘和角部，以防止盖下方的湿气进入。 还公开了一种使用盖子和相关方法制造太阳能电池的装置。

    Microstructure diffuser
    7.
    发明授权
    Microstructure diffuser 有权
    微结构扩散器

    公开(公告)号：US08270082B2

    公开(公告)日：2012-09-18

    申请号：US12457564

    申请日：2009-06-16

    申请人： Chun-Wei Wang ,  Wen-Feng Cheng ,  Chih-Wei Huang ,  Yan-Zuo Chen

    发明人： Chun-Wei Wang ,  Wen-Feng Cheng ,  Chih-Wei Huang ,  Yan-Zuo Chen

    IPC分类号： G02B5/02

    CPC分类号： G02B5/02 ,  G02B3/005

    摘要： A microstructure diffuser includes a light-entering surface, a light-emitting surface, and a plurality of microstructure portions having a first microstructure unit and a second microstructure unit. The first microstructure unit includes a first side surface, a second side surface, a top surface, a first pitch (P1), a second pitch (P2), and a height (H). The second microstructure unit has a curve function shape and is located at the light-emitting surface. The first side surface and the second side surface of the first microstructure unit receive the light beam of the light source to form a first optical path. The top surface of the first microstructure unit receives the light beam of the light source to form a second optical path. The second microstructure unit receives the light beam of the light source to form a third optical path.

    摘要翻译： 微结构扩散器包括光入射表面，发光表面和具有第一微结构单元和第二微结构单元的多个微结构部分。 第一微结构单元包括第一侧表面，第二侧表面，顶表面，第一间距（P1），第二间距（P2）和高度（H）。 第二微结构单元具有曲线函数形状并且位于发光表面。 第一微结构单元的第一侧表面和第二侧表面接收光源的光束以形成第一光路。 第一微结构单元的顶表面接收光源的光束以形成第二光路。 第二微结构单元接收光源的光束以形成第三光路。

    Step edge insert ring for etch chamber
    8.
    发明授权
    Step edge insert ring for etch chamber 有权
    用于蚀刻室的步进边缘插入环

    公开(公告)号：US07338578B2

    公开(公告)日：2008-03-04

    申请号：US10761881

    申请日：2004-01-20

    申请人： Chih-Wei Huang ,  Shiow-Feng Changchien ,  Chia-Hung Tang

    发明人： Chih-Wei Huang ,  Shiow-Feng Changchien ,  Chia-Hung Tang

    IPC分类号： H01L21/00 ,  C23C16/00 ,  C23C14/00

    CPC分类号： H01L21/68735 ,  H01J37/32633 ,  H01L21/67069 ,  Y10S156/915

    摘要： An insert ring for a wafer support inside a processing chamber for the processing, particularly dry etching, of semiconductor wafer substrates. The insert ring has a generally step-shaped cross-sectional configuration which defines a perpendicular gap or flow space between the insert ring and the wafer support. In the etching of substrates on the wafer support, the perpendicular gap or flow space defines a perpendicular flow path for plasma species. Consequently, flow of heavy plasma species against the outer wall of the wafer support is substantially hindered or reduced to reduce accumulation of polymer material on the inner surface of the insert ring and/or the outer wall of the wafer support.

    摘要翻译： 一种用于晶片支撑件的用于处理，特别是干蚀刻的半导体晶片衬底的处理室内的插入环。 插入环具有大致阶梯形的横截面构造，其限定了插入环和晶片支撑件之间的垂直间隙或流动空间。 在对晶片载体上的衬底的蚀刻中，垂直间隙或流动空间限定了用于等离子体物质的垂直流动路径。 因此，重要的等离子体物质流过晶片支架的外壁是基本受阻或减少的，以减少聚合物材料在插入环的内表面和/或晶片支架的外壁上的积聚。

    CONTROL METHOD FOR MARKING LABEL SIDE OF OPTICAL DISC
    9.
    发明申请
    CONTROL METHOD FOR MARKING LABEL SIDE OF OPTICAL DISC 失效
    用于标记光盘标签的控制方法

    公开(公告)号：US20070165102A1

    公开(公告)日：2007-07-19

    申请号：US11616391

    申请日：2006-12-27

    申请人： Chih-Wei Huang ,  Tao-Yen Wei ,  Yi-Shih Wang

    发明人： Chih-Wei Huang ,  Tao-Yen Wei ,  Yi-Shih Wang

    IPC分类号： B41J2/435

    CPC分类号： B41J3/4071 ,  G11B7/0037 ,  G11B7/0053 ,  G11B7/00736

    摘要： An inner ring signal and an outer ring signal according to specific patterns formed on the label side of the optical disc are generated. Timing starts when the outer ring signal reveals the end of a positioning pattern and stops to obtain a timing value when the inner ring signal reveals the start of a square wave defining a specified spoke. A starting spoke is defined according to the inner ring signal and the specified spoke. A deviation bit value is calculated according to the timing value and a bit number of a data to be marked on a certain track of the optical disc. The data is rotated according to the deviation bit value, and then marked on the certain track, starting with the starting spoke.

    摘要翻译： 产生根据形成在光盘的标签侧上的特定图案的内环信号和外环信号。 当外圈信号显示定位图案的结束时，定时开始，当内环信号显示定义指定的辐条的方波的开始时，停止获取定时值。 根据内圈信号和指定的辐条定义起始辐条。 根据定时值和要在光盘的某个轨道上标记的数据的位数来计算偏差比特值。 数据根据偏差位值旋转，然后在起始辐条开始的某一轨迹上标记。

    Testing system and related method for testing an electronic device by determining a power on/off signal
    10.
    发明申请
    Testing system and related method for testing an electronic device by determining a power on/off signal 审中-公开
    通过确定电源开/关信号来测试电子设备的测试系统和相关方法

    公开(公告)号：US20070021848A1

    公开(公告)日：2007-01-25

    申请号：US11363674

    申请日：2006-02-27

    申请人： Chih-Wei Huang

    发明人： Chih-Wei Huang

    IPC分类号： G05B11/01

    CPC分类号： G01R31/40

    摘要： A testing method and related system enables a power management device to power-on or power-off a second electrical device via a first transmission interface of a first electrical device. The first electrical device sets power-on and power off times of the power management device. The first electrical device sends a power-on or a power-off control instruction to the power management device via the first transmission interface based on the set power-on and power-off times to power-on or power-off the power management device, and the first electrical device performs a timing process. The second electrical device executes a corresponding power-on or power-off process based on power statuses of the power management device. The first electrical device determines whether the second electrical device returns with a power-on or a power-off testing signal as a testing result within a predetermined time during the process of timing.

    摘要翻译： 测试方法和相关系统使得电力管理设备能够经由第一电气设备的第一传输接口来接通或关闭第二电气设备。 第一个电气设备设置电源管理设备的上电和关机时间。 第一电气设备基于所设置的开机和断电时间，经由第一传输接口向电力管理设备发送上电或断电控制指令，从而上电或断电电力管理设备 并且第一电气设备执行定时处理。 第二电气设备基于电力管理设备的电力状态来执行相应的上电或断电过程。 第一电气设备在定时处理期间，在预定时间内确定第二电气设备是否以电源接通或断电测试信号作为测试结果返回。