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公开(公告)号:US07110081B2
公开(公告)日:2006-09-19
申请号:US10831370
申请日:2004-04-26
申请人: Christian Alexander Hoogendam , Sjoerd Nicolaas Lambertus Donders , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Alexander Straaijer , Bob Streefkerk
发明人: Christian Alexander Hoogendam , Sjoerd Nicolaas Lambertus Donders , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Alexander Straaijer , Bob Streefkerk
CPC分类号: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要: In a lithographic projection apparatus, there is provided a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, and a closure configured to selectively close and open the aperture. In an embodiment, the shutter may comprise a channel in a surface of the shutter facing the aperture and/or the shutter may be displaced from the liquid supply system when connected to the liquid supply system. Further, in a lithographic apparatus, there is provided a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between a projection system and a substrate and a controller configured to control application to the projection system of a force related to a weight transfer attributable to a member of the liquid supply system.
摘要翻译: 在光刻投影设备中,提供了一种液体供应系统,其包括至少部分地限定投影系统和基板之间的空间的容器,该容器在其中具有可选择的可开启和关闭的孔,以及关闭构造成选择性地关闭和打开 光圈。 在一个实施例中,快门可以包括位于快门面向孔的表面中的通道和/或当连接到液体供应系统时活门可以从液体供应系统移位。 此外,在光刻设备中,提供了一种液体供应系统,其配置为在投影系统和基板之间的空间中提供待投射的光束的液体,以及被配置为控制对投影系统的应用的控制器 与由液体供给系统的构件产生的重量传递有关的力。
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公开(公告)号:US20160274473A1
公开(公告)日:2016-09-22
申请号:US15167357
申请日:2016-05-27
申请人: Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
发明人: Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
IPC分类号: G03F7/20
CPC分类号: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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公开(公告)号:US20130235358A1
公开(公告)日:2013-09-12
申请号:US13866879
申请日:2013-04-19
申请人: Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
发明人: Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
IPC分类号: G03F7/20
CPC分类号: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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公开(公告)号:US08446568B2
公开(公告)日:2013-05-21
申请号:US12796482
申请日:2010-06-08
申请人: Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
发明人: Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
CPC分类号: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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公开(公告)号:US20110122376A1
公开(公告)日:2011-05-26
申请号:US12796482
申请日:2010-06-08
申请人: Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
发明人: Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
CPC分类号: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
摘要翻译: 光刻投影装置包括被配置为保持图案形成装置的支撑结构,所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统,被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统,被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门,被配置为隔离所述基板的空间或被基板占据的空间。
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公开(公告)号:US07932999B2
公开(公告)日:2011-04-26
申请号:US11499780
申请日:2006-08-07
申请人: Christiaan Alexander Hoogendam , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
发明人: Christiaan Alexander Hoogendam , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
CPC分类号: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
摘要翻译: 光刻投影装置包括被配置为保持图案形成装置的支撑结构,所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统,被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统,被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门,被配置为隔离所述基板的空间或被基板占据的空间。
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公开(公告)号:US07379155B2
公开(公告)日:2008-05-27
申请号:US10966108
申请日:2004-10-18
申请人: Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johaannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
发明人: Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johaannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
CPC分类号: G03F7/70716 , G03F7/70341
摘要: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
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公开(公告)号:US20110249246A1
公开(公告)日:2011-10-13
申请号:US13167314
申请日:2011-06-23
申请人: Jeroen Johannes Sophia Maria MERTENS , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
发明人: Jeroen Johannes Sophia Maria MERTENS , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
IPC分类号: G03B27/52
CPC分类号: G03F7/70716 , G03F7/70341
摘要: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
摘要翻译: 公开了一种光刻设备,其包括液体供应系统,该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间,出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物, 液体供应系统和基材,以及构造成通过出口抽出混合物的抽空系统,排气系统具有分离器箱,其布置成将液体与混合物中的气体分离,分离器箱压力控制器连接到非液体 分离罐的填充区域,被构造成在非液体填充区域内保持稳定的压力。
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公开(公告)号:US08934082B2
公开(公告)日:2015-01-13
申请号:US13167314
申请日:2011-06-23
申请人: Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
发明人: Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
CPC分类号: G03F7/70716 , G03F7/70341
摘要: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
摘要翻译: 公开了一种光刻设备,其包括液体供应系统,该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间,出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物, 液体供应系统和基材,以及构造成通过出口抽出混合物的抽空系统,排气系统具有分离器箱,其布置成将液体与混合物中的气体分离,分离器箱压力控制器连接到非液体 分离罐的填充区域,被构造成在非液体填充区域内保持稳定的压力。
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公开(公告)号:US08004652B2
公开(公告)日:2011-08-23
申请号:US12078635
申请日:2008-04-02
申请人: Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
发明人: Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
CPC分类号: G03F7/70716 , G03F7/70341
摘要: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
摘要翻译: 公开了一种光刻设备,其包括液体供应系统,该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间,出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物, 液体供应系统和基材,以及构造成通过出口抽出混合物的抽空系统,排气系统具有分离器箱,其布置成将液体与混合物中的气体分离,分离器箱压力控制器连接到非液体 分离罐的填充区域,被构造成在非液体填充区域内保持稳定的压力。
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