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    Methods of making magnetic write heads with use of a resist channel shrinking solution having corrosion inhibitors
    1.
    发明申请
    Methods of making magnetic write heads with use of a resist channel shrinking solution having corrosion inhibitors 审中-公开
    使用具有腐蚀抑制剂的抗蚀剂通道收缩溶液制造磁性写入头的方法

    公开(公告)号：US20060096081A1

    公开(公告)日：2006-05-11

    申请号：US11312064

    申请日：2005-12-19

    申请人： Christian Bonhote ,  Jila Tabib ,  Dennis McKean ,  Daniel Bedell ,  Jyh-Shuey Lo ,  Hieu Lam ,  Kim Lee

    发明人： Christian Bonhote ,  Jila Tabib ,  Dennis McKean ,  Daniel Bedell ,  Jyh-Shuey Lo ,  Hieu Lam ,  Kim Lee

    IPC分类号： G11B5/127 ,  H04R31/00

    CPC分类号： G11B5/3116 ,  G11B5/3163 ,  Y10T29/49032 ,  Y10T29/49039 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： One preferred method for use in making a magnetic write head with use of the resist channel shrinking solution includes the steps of forming a first pole piece layer of a first pole piece; forming a gap layer over the first pole piece layer; forming a patterned resist over the first pole piece layer and the gap layer; electroplating a first pedestal portion of a second pole piece over the gap layer within a channel of the patterned resist; forming an oxide layer over the first pedestal portion; applying the resist channel shrinking solution comprising the resist channel shrinking film and the corrosion inhibitors over the patterned resist; baking the resist channel shrinking solution over the patterned resist to thereby reduce a width of the channel; removing the resist channel shrinking solution; electroplating a second pedestal portion of the second pole piece within the reduced-width channel of the patterned resist; removing the patterned resist; and milling the structure. Advantageously, the oxide layer and the corrosion inhibitors of the resist channel shrinking solution reduce corrosion in the pole piece during the act of baking the resist channel shrinking solution.

    摘要翻译： 使用抗蚀剂通道收缩溶液制造磁性写入头的一种优选方法包括以下步骤：形成第一极片的第一极片层; 在所述第一极片层上形成间隙层; 在所述第一极片层和所述间隙层上形成图案化的抗蚀剂; 在图案化的抗蚀剂的通道内的间隙层上电镀第二极片的第一基座部分; 在所述第一基座部分上形成氧化物层; 在图案化的抗蚀剂上施加包含抗蚀剂通道收缩膜和腐蚀抑制剂的抗蚀剂通道收缩溶液; 在图案化的抗蚀剂上烘烤抗蚀剂通道收缩溶液，从而减小通道的宽度; 去除抗蚀剂通道收缩溶液; 在所述图案化抗蚀剂的所述减小宽度的通道内电镀所述第二极靴的第二基座部分; 去除图案化的抗蚀剂; 并研磨结构。 有利地，抗蚀剂通道收缩溶液的氧化物层和腐蚀抑制剂在烘烤抗蚀剂通道收缩溶液的作用期间减少极片中的腐蚀。

    Magnetic write head having a self aligned, steep shoulder pole structure and method of manufacture thereof
    3.
    发明申请
    Magnetic write head having a self aligned, steep shoulder pole structure and method of manufacture thereof 失效
    具有自对准陡肩极结构的磁写头及其制造方法

    公开(公告)号：US20070058293A1

    公开(公告)日：2007-03-15

    申请号：US11228783

    申请日：2005-09-15

    申请人： Daniel Bedell ,  Hieu Lam ,  Kim Lee ,  Jyh-Shuey Lo

    发明人： Daniel Bedell ,  Hieu Lam ,  Kim Lee ,  Jyh-Shuey Lo

    IPC分类号： G11B5/147

    CPC分类号： G11B5/3116 ,  G11B5/3163

    摘要： A magnetic write head and method of manufacture thereof that has a first pole structure having a notched structure configured with a steep shoulder portion and a narrow vertical notch portion extending from the top of the steep shoulder portion. The write head also includes a second pole structure (P2) that has a very narrow width (track width) and that is self aligned with the narrow vertical notch structure of the first pole structure. The write head provides excellent magnetic properties including a very narrow track width and minimal side writing, while avoiding magnetic saturation of the poles.

    摘要翻译： 一种磁写头及其制造方法，其具有第一极结构，其具有构造为具有陡峭肩部的切口结构和从陡峭肩部的顶部延伸的窄垂直切口部。 写头还包括具有非常窄的宽度（轨道宽度）并且与第一极结构的窄垂直切口结构自对准的第二极结构（P 2）。 写头提供优异的磁性，包括非常窄的轨道宽度和最小的侧面写入，同时避免极点的磁饱和。

    Methods of making magnetic write heads with use of linewidth shrinkage techniques
    5.
    发明申请
    Methods of making magnetic write heads with use of linewidth shrinkage techniques 失效
    使用线宽收缩技术制造磁头的方法

    公开(公告)号：US20060010684A1

    公开(公告)日：2006-01-19

    申请号：US10881782

    申请日：2004-06-30

    申请人： Kim Lee ,  Jyh-Shuey Lo ,  Dennis McKean

    发明人： Kim Lee ,  Jyh-Shuey Lo ,  Dennis McKean

    IPC分类号： G11B5/127 ,  H04R31/00

    CPC分类号： G11B5/3163 ,  G11B5/3116 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： A method for use in making a magnetic write head includes the steps of forming a first pole piece layer of a first pole piece; forming a patterned resist over the first pole piece layer; electroplating a pedestal over the first pole piece layer within a channel of the patterned resist; electroplating a metal gap layer over the pedestal within the channel of the patterned resist; forming a resist channel shrinking film over the patterned resist; baking the resist channel shrinking film over the patterned to thereby reduce a width of the channel; removing the resist channel shrinking film; electroplating a second pole piece within the reduced-width channel of the patterned resist; removing the patterned resist; and milling the pedestal, using the second pole piece as a mask, to form a central notched pedestal having side walls with angled slopes. Advantageously, the reduction in channel width using the resist channel shrinking film provides for self-alignment of the second pole piece with the pedestal which can be symmetrically notched for improved overwrite (OW) properties and reduced adjacent track interference (ATI).

    摘要翻译： 一种用于制造磁写头的方法包括以下步骤：形成第一极片的第一极片层; 在所述第一极片层上形成图案化抗蚀剂; 在图案化的抗蚀剂的通道内的第一极片层上电镀一个基座; 在图案化的抗蚀剂的通道内的基座上方电镀金属间隙层; 在图案化的抗蚀剂上形成抗蚀剂通道收缩膜; 在图案上烘烤抗蚀剂通道收缩膜，从而减小通道的宽度; 去除抗蚀剂通道收缩膜; 在图案化的抗蚀剂的减小宽度的通道内电镀第二极片; 去除图案化的抗蚀剂; 并使用第二极片作为掩模铣削基座，以形成具有倾斜斜面的侧壁的中心凹口底座。 有利地，使用抗蚀剂通道收缩薄膜的通道宽度的减小提供了第二极靴与基座的自对准，该基座可对称切口以改善覆盖（OW）特性和减小的相邻轨道干涉（ATI）。

    P3 fabrication with NiFe and alumina mask using resist shrinking process
    6.
    发明申请
    P3 fabrication with NiFe and alumina mask using resist shrinking process 失效
    P3使用抗蚀剂收缩工艺制备NiFe和氧化铝掩模

    公开(公告)号：US20060232882A1

    公开(公告)日：2006-10-19

    申请号：US11110534

    申请日：2005-04-19

    申请人： Kim Lee ,  Jyh-Shuey Lo ,  Yi Zheng

    发明人： Kim Lee ,  Jyh-Shuey Lo ,  Yi Zheng

    IPC分类号： G11B5/147

    CPC分类号： G11B5/3163 ,  G11B5/1278 ,  Y10T29/49043 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49071 ,  Y10T29/49073

    摘要： A method for forming a P3 layer with NiFe and alumina mask using resist shrink process for use in perpendicular magnetic write heads. The method includes forming a laminated layer, forming an alumina layer on top of the laminated layer, depositing a conductive layer onto the laminated layer, forming a plating frame on a gap layer. The plating frame has a trench defined by plating track, the alumina, laminated and conductive layers each including an area below the trench. The method further includes shrinking the trench, plating NiFe into a portion of the shrunk trench, stripping the plating frame, removing the conductive layer except the conductive layer formed below the trench, removing the alumina layer except the alumina layer formed below the trench, removing the laminated layer except the laminated layer formed below the trench and patterning the laminated layer formed below the trench.

    摘要翻译： 用于使用用于垂直磁写头的抗蚀剂收缩工艺形成具有NiFe和氧化铝掩模的P3层的方法。 该方法包括形成叠层，在叠层上形成氧化铝层，在层压层上沉积导电层，在间隙层上形成电镀框架。 电镀框架具有由电镀轨道限定的沟槽，氧化铝，层压和导电层各自包括沟槽下方的区域。 该方法还包括收缩沟槽，将NiFe电镀到收缩沟槽的一部分中，剥离电镀框架，除去形成在沟槽下方的导电层以外的导电层，除去形成在沟槽下方的氧化铝层以外的氧化铝层，除去 除了形成在沟槽下方的层压层之外的层压层，并且对形成在沟槽下方的叠层进行图案化。

    Methods of making magnetic write heads using electron beam lithography
    7.
    发明申请
    Methods of making magnetic write heads using electron beam lithography 失效
    使用电子束光刻制作磁写头的方法

    公开(公告)号：US20050241139A1

    公开(公告)日：2005-11-03

    申请号：US10836136

    申请日：2004-04-30

    申请人： Kim Lee ,  Jyh-Shuey Lo

    发明人： Kim Lee ,  Jyh-Shuey Lo

    IPC分类号： G11B5/147 ,  G11B5/187

    CPC分类号： G11B5/1878 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49039 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49052

    摘要： A pedestal is formed over a first pole piece layer and insulator materials are formed to surround it. A gap layer made of a non-magnetic insulator or metal is then formed over the pedestal and the insulator, followed by the optional formation of a seed layer. A second pole piece is formed over the gap layer with or without the seed layer by forming a patterned resist using E-beam lithography and electroplating second pole piece materials within the patterned resist. After milling to remove side portions of the gap layer and the optional seed layer, a chemical etch is performed to remove a top portion of the insulator materials. The pedestal is then notched and trimmed by ion milling using the second pole piece as a mask to form a central notched structure. Since the second pole piece is precisely centered over the pedestal prior to notching, the pedestal is notched symmetrically to form a notched structure having side walls with angled slopes.

    摘要翻译： 在第一极片层上形成基座，并且形成绝缘体材料以围绕它。 然后在基座和绝缘体上形成由非磁性绝缘体或金属制成的间隙层，随后可选地形成种子层。 通过在图案化的抗蚀剂内使用电子束光刻和电镀第二极片材料形成图案化的抗蚀剂，形成具有或不具有种子层的间隙层上的第二极片。 在研磨以除去间隙层和任选种子层的侧面部分之后，进行化学蚀刻以去除绝缘体材料的顶部。 然后通过使用第二极片作为掩模的离子铣削将基座切口并修整以形成中心的切口结构。 由于第二极靴在开槽之前精确地位于基座上方，因此基座被对称地切口以形成具有斜边的侧壁的凹口结构。

    Methods for improving positioning performance of electron beam lithography on magnetic wafers
    8.
    发明申请
    Methods for improving positioning performance of electron beam lithography on magnetic wafers 失效
    改善电子束光刻在磁晶片上的定位性能的方法

    公开(公告)号：US20050252780A1

    公开(公告)日：2005-11-17

    申请号：US10845956

    申请日：2004-05-14

    申请人： Alexander Driskill-Smith ,  Hieu Lam ,  Kim Lee

    发明人： Alexander Driskill-Smith ,  Hieu Lam ,  Kim Lee

    IPC分类号： B05D5/12 ,  C25D3/56 ,  C25D5/02 ,  G11B5/855 ,  G11B5/858

    CPC分类号： G11B5/855 ,  C25D3/562 ,  C25D5/022 ,  G11B5/858

    摘要： The present invention discloses a method for the production of sub-micron structures on magnetic materials using electron beam lithography. A subtractive process is disclosed wherein a portion of a magnetic material layer is removed from the substrate using conventional lithography, and the remaining portion of the magnetic material layer is patterned by e-beam lithography. A additive process is also disclosed wherein a thin magnetic seed layer is deposited on the substrate, a portion of which is removed by conventional lithography and replaced with a non-magnetic conducting layer. The remaining portion of magnetic seed layer is patterned by e-beam lithography and the final magnetic structure produced by electroplating.

    摘要翻译： 本发明公开了一种使用电子束光刻在磁性材料上生产亚微米结构的方法。 公开了一种消减方法，其中使用常规光刻将磁性材料层的一部分从衬底上除去，并且通过电子束光刻将磁性材料层的剩余部分图案化。 还公开了一种添加方法，其中将薄的磁性种子​​层沉积在基底上，其一部分通过常规的光刻法被去除并被非磁性导电层代替。 通过电子束光刻和通过电镀产生的最终磁性结构对磁性种子层的剩余部分进行构图。

    Elimination of write head plating defects using high activation chemically amplified resist
    9.
    发明申请
    Elimination of write head plating defects using high activation chemically amplified resist 失效
    使用高激活化学放大抗蚀剂消除写头电镀缺陷

    公开(公告)号：US20050239001A1

    公开(公告)日：2005-10-27

    申请号：US10831412

    申请日：2004-04-23

    申请人： Kim Lee ,  Dennis McKean

    发明人： Kim Lee ,  Dennis McKean

    IPC分类号： G03F7/039 ,  G03F7/40 ,  G11B5/187 ,  G11B5/31

    CPC分类号： G03F7/405 ,  G03F7/0392 ,  G11B5/3116 ,  G11B5/3163 ,  Y10T29/49021

    摘要： Methods of forming a component of a thin film magnetic head and improving the plating of a component of a thin film magnetic head are provided. The methods include the use of a high activation energy chemically amplified photoresist (CARS) that is contacted with a low pH high saturation magnetic moment plating solution to form a magnetic head component that is essentially free of plating defects. The methods find utility in hard disk drive applications, such as in the manufacture of magnetic poles for the write head of a hard disk drive.

    摘要翻译： 提供了形成薄膜磁头的部件并改善薄膜磁头的部件的电镀的方法。 这些方法包括使用与低pH高饱和磁矩电镀溶液接触的高活化能化学放大光致抗蚀剂（CARS），以形成基本上没有电镀缺陷的磁头组分。 该方法可用于硬盘驱动器应用，例如用于制造用于硬盘驱动器的写头的磁极。