公开(公告)号：US20090262318A1

公开(公告)日：2009-10-22

申请号：US12423528

申请日：2009-04-14

申请人： Clemens Johannes Gerardus VAN DEN DUNGEN ,  Nicolaas Franciscus KOPPELAARS ,  Martinus Hendrikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Johannes Catharinus Hubertus MULKENS ,  Erik Henricus Egidius Catharina EUMMELEN ,  Marcel BECKERS ,  Richard MOERMAN ,  Cedric Desire GROUWSTRA ,  Danny Maria Hubertus PHILIPS ,  Remko Jan Peter VERHEES ,  Pieter MULDER ,  Evert VAN VLIET

发明人： Clemens Johannes Gerardus VAN DEN DUNGEN ,  Nicolaas Franciscus KOPPELAARS ,  Martinus Hendrikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Johannes Catharinus Hubertus MULKENS ,  Erik Henricus Egidius Catharina EUMMELEN ,  Marcel BECKERS ,  Richard MOERMAN ,  Cedric Desire GROUWSTRA ,  Danny Maria Hubertus PHILIPS ,  Remko Jan Peter VERHEES ,  Pieter MULDER ,  Evert VAN VLIET

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。

公开(公告)号：US20110255062A1

公开(公告)日：2011-10-20

申请号：US13085069

申请日：2011-04-12

申请人： Danny Maria Hubertus PHILIPS ,  Daniel Jozef Maria DIRECKS ,  Clemens Johannes Gerardus VAN DEN DUNGEN ,  Maikel Adrianus Cornelis SCHEPERS ,  Paul Petrus Joannes BERKVENS ,  Marcus Johannes VAN DER ZANDEN ,  Pieter MULDER

发明人： Danny Maria Hubertus PHILIPS ,  Daniel Jozef Maria DIRECKS ,  Clemens Johannes Gerardus VAN DEN DUNGEN ,  Maikel Adrianus Cornelis SCHEPERS ,  Paul Petrus Joannes BERKVENS ,  Marcus Johannes VAN DER ZANDEN ,  Pieter MULDER

IPC分类号： G03B27/52 ,  F16K24/00

CPC分类号： G03F7/70341 ,  Y10T137/86292

摘要： A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.

摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应到在投影系统和面对流体处理结构的相对表面之间限定的空间。 流体处理结构的下表面具有供给开口，其构造成朝向相对表面供应流体;多个提取开口，其构造成从流体处理结构和相对表面之间移除流体;以及在供给开口和提取物之间的突起 开口

公开(公告)号：US20120218534A1

公开(公告)日：2012-08-30

申请号：US13403798

申请日：2012-02-23

申请人： Pieter MULDER ,  Jan Willem CROMWIJK ,  Jimmy Matheus Wilhelmus VAN DE WINKEL ,  Marjan Leonardus Catharina HOOFMAN ,  Ferdinand Bernardus Johannus Wilhelmus Maria HENDRIKS

发明人： Pieter MULDER ,  Jan Willem CROMWIJK ,  Jimmy Matheus Wilhelmus VAN DE WINKEL ,  Marjan Leonardus Catharina HOOFMAN ,  Ferdinand Bernardus Johannus Wilhelmus Maria HENDRIKS

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus is disclosed having a projection system configured to direct a patterned beam of radiation onto a substrate and a liquid handling system configured to supply and confine immersion liquid to a space defined between the projection system and a substrate, or a substrate table, or both. A controller is provided to adjust an angle of a lower surface of the liquid handling system relative to the top surface of the substrate during motion of the substrate and/or substrate table relative to the liquid handling system dependent upon a position of the substrate and/or substrate table relative to the liquid handling system and/or a direction of relative movement between the substrate and/or substrate table and the liquid handling system.

摘要翻译： 公开了一种浸没式光刻设备，其具有被配置为将图案化的辐射束引导到衬底上的投影系统，以及液体处理系统，其配置成将浸没液体供应并限制在所述投影系统和衬底或衬底台之间限定的空间中， 或两者。 提供控制器，用于在衬底和/或衬底台相对于液体处理系统的运动期间相对于衬底的顶表面调整液体处理系统的下表面的角度，这取决于衬底的位置和/ 或衬底台相对于液体处理系统和/或衬底和/或衬底台和液体处理系统之间的相对运动的方向。

公开(公告)号：US20090129793A1

公开(公告)日：2009-05-21

申请号：US11944031

申请日：2007-11-21

申请人： Derek John MILTON ,  Stuart John HANDLEY ,  Tim SPINK ,  Julian Derek MORRISON ,  Pieter MULDER

发明人： Derek John MILTON ,  Stuart John HANDLEY ,  Tim SPINK ,  Julian Derek MORRISON ,  Pieter MULDER

IPC分类号： G03G15/00 ,  G03G21/00

CPC分类号： G03G21/0011

摘要： A toner dam maintenance process and system model the amount of toner mass at a toner cleaner blade, and apply a corrective procedure, such as insertion of a paperless copy into the print job mid-job or immediately prior to cycle out, to replenish the toner mass at the cleaner blade to maintain lubrication and reduce cleaning failure. The modeling includes contributing factors toward toner dam input and output, including untransferred toner, cycle-in/cycle-out bands, untransferred background, and leakage of toner from the cleaner blade. One or several threshold can be reached to cause one or more different corrective actions to take place. The action may be adding or skipping a pitch to insert a corrective maintenance pattern without transfer.

摘要翻译： 调色剂坝维护过程和系统对调色剂清洁器刀片上的调色剂质量的量进行建模，并且应用校正过程，例如将中间作业中的无纸复印件插入打印作业或在循环之前，以补充调色剂 清洁刀片上的质量保持润滑并减少清洁失效。 该建模包括对调色剂坝输入和输出的贡献因素，包括未转印的调色剂，循环进/出料带，未转印背景以及来自清洁器叶片的调色剂泄漏。 可以达到一个或多个阈值以导致发生一个或多个不同的校正动作。 该动作可能是添加或跳过音调以插入校正维护模式而无需转移。