Apparatus and method of improving beam shaping and beam homogenization
    1.
    发明授权
    Apparatus and method of improving beam shaping and beam homogenization 有权
    改进光束成形和光束均匀化的装置和方法

    公开(公告)号:US08148663B2

    公开(公告)日:2012-04-03

    申请号:US11888433

    申请日:2007-07-31

    IPC分类号: B23K26/06

    摘要: The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. Typically, the anneal regions may be square or rectangular in shape. Generally, the optical system and methods of the present invention are used to preferentially anneal one or more regions found within the anneal regions by delivering enough energy to cause the one or more regions to re-melt and solidify.

    摘要翻译: 本发明一般涉及一种光学系统,其能够在包含在基板的表面上的退火区域上可靠地传递均匀的能量。 光学系统适于在衬底的表面上的期望区域上传送或投影具有期望的二维形状的均匀量的能量。 通常,退火区域可以是正方形或矩形形状。 通常,本发明的光学系统和方法用于通过递送足够的能量以使一个或多个区域再熔化和固化来优先退火在退火区域内发现的一个或多个区域。

    APPARATUS AND METHOD OF IMPROVING BEAM SHAPING AND BEAM HOMOGENIZATION
    8.
    发明申请
    APPARATUS AND METHOD OF IMPROVING BEAM SHAPING AND BEAM HOMOGENIZATION 有权
    改进光束形成和光束均匀化的装置和方法

    公开(公告)号:US20120148701A1

    公开(公告)日:2012-06-14

    申请号:US13401553

    申请日:2012-02-21

    IPC分类号: B29C35/08

    摘要: The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. Typically, the anneal regions may be square or rectangular in shape. Generally, the optical system and methods of the present invention are used to preferentially anneal one or more regions found within the anneal regions by delivering enough energy to cause the one or more regions to re-melt and solidify.

    摘要翻译: 本发明一般涉及一种光学系统,其能够在包含在基板的表面上的退火区域上可靠地传递均匀的能量。 光学系统适于在衬底的表面上的期望区域上传送或投影具有期望的二维形状的均匀量的能量。 通常,退火区域可以是正方形或矩形形状。 通常,本发明的光学系统和方法用于通过递送足够的能量以使一个或多个区域再熔化和固化来优先退火在退火区域内发现的一个或多个区域。