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公开(公告)号:US20180331349A1
公开(公告)日:2018-11-15
申请号:US15887848
申请日:2018-02-02
申请人: DEMARAY, LLC
发明人: Hongmei Zhang , R. Ernest Demaray
IPC分类号: H01M4/04 , H01M4/66 , C23C14/08 , C23C14/35 , C23C14/58 , H01M10/0585 , H01M10/0562 , H01M10/052 , H01M6/46 , H01M6/18 , H01M4/525 , H01M4/1391 , H01M4/131 , H01M4/02
CPC分类号: H01M4/0426 , C23C14/08 , C23C14/35 , C23C14/5806 , H01M4/0423 , H01M4/0428 , H01M4/0471 , H01M4/131 , H01M4/1391 , H01M4/525 , H01M4/66 , H01M4/661 , H01M4/667 , H01M6/185 , H01M6/188 , H01M6/46 , H01M10/052 , H01M10/0562 , H01M10/0585 , H01M2004/028 , H01M2300/002 , H01M2300/0071 , Y10T29/49115
摘要: In accordance with the present invention, deposition of LiCoO2 layers in a pulsed-dc physical vapor deposition process is presented. Such a deposition can provide a low-temperature, high deposition rate deposition of a crystalline layer of LiCoO2 with a desired or orientation. Some embodiments of the deposition address the need for high rate deposition of LiCoO2 films, which can be utilized as the cathode layer in a solid state rechargeable Li battery, Embodiments of the process according to the present invention can eliminate the high temperature (>700° C.) anneal step that is conventionally needed to crystallize the LiCoO2 layer.