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    LIQUID SAMPLE ANALYSIS CHIP READING SYSTEM, AND ANALYSIS METHOD AND UBIQUITOUS READING SYSTEM USING THE SAME
    1.
    发明申请
    LIQUID SAMPLE ANALYSIS CHIP READING SYSTEM, AND ANALYSIS METHOD AND UBIQUITOUS READING SYSTEM USING THE SAME 审中-公开
    液体样品分析芯片读取系统，分析方法和使用本发明的读取系统

    公开(公告)号：US20100157300A1

    公开(公告)日：2010-06-24

    申请号：US12503755

    申请日：2009-07-15

    申请人： Dae-Sik Lee ,  Yo-Han Choi ,  Hyun-Woo Song ,  Moon-Youn Jung ,  Seon-Hee Park ,  Gun-Yong Sung

    发明人： Dae-Sik Lee ,  Yo-Han Choi ,  Hyun-Woo Song ,  Moon-Youn Jung ,  Seon-Hee Park ,  Gun-Yong Sung

    IPC分类号： G01J3/46

    CPC分类号： G01N21/253 ,  G01N21/8483 ,  G01N2201/0256 ,  G01N2201/0826

    摘要： Provided is a liquid sample analysis chip reading system. The reading system includes an analysis chip, a light emitting part, a plurality of light wave-guides, and a light receiving part. The analysis chip includes a plurality of detecting parts. The light emitting part includes three light sources emitting light having wavelengths (or colors) different from each other. The plurality of light wave-guides irradiate the light emitted from the light emitting part onto the plurality of corresponding detecting parts, respectively. The light receiving part includes a plurality of light receiving devices for receiving the light having a specific color reflected from each of the plurality of corresponding detecting parts of the analysis chip. The three light sources are discontinuously controlled to emit light onto the plurality of light wave-guides.

    摘要翻译： 提供了一种液体样品分析芯片读取系统。 读取系统包括分析芯片，发光部分，多个光波导和光接收部分。 分析芯片包括多个检测部分。 发光部分包括发射具有彼此不同的波长（或颜色）的光的三个光源。 多个光波导将从发光部发射的光分别照射到多个相应的检测部上。 光接收部分包括多个光接收装置，用于接收从分析芯片的多个相应的检测部分中的每一个反射的具有特定颜色的光。 不连续地控制三个光源以将光发射到多个光波导上。

    SENSOR FOR BIOLOGICAL DETECTION
    2.
    发明申请
    SENSOR FOR BIOLOGICAL DETECTION 审中-公开
    生物检测传感器

    公开(公告)号：US20100248352A1

    公开(公告)日：2010-09-30

    申请号：US12746559

    申请日：2008-05-09

    申请人： Hyun-Woo Song ,  Hyeon-Bong Pyo ,  Yo-Han Choi

    发明人： Hyun-Woo Song ,  Hyeon-Bong Pyo ,  Yo-Han Choi

    IPC分类号： C12M1/34 ,  G01B9/02 ,  G01N21/00

    CPC分类号： G01N33/54373 ,  G01N21/77 ,  G01N2021/7776 ,  G01N2021/7779

    摘要： Provided is a sensor for biological detection. The sensor for biological detection includes: a sensing unit including a light generator, an optical coupler, and an optical detector, the optical coupler dividing light incident from the light generator to project divided lights into a bio chip and a reference unit, respectively, and coupling the lights reflected from the respective bio chip and reference unit as one output light, and the optical detector detecting the output light, and the bio chip is independently separated from the sensing unit to be disposed on paths of lights divided by the optical coupler. The sensing unit has a composition of the Michelson interferometer.

    摘要翻译： 提供了用于生物检测的传感器。 用于生物检测的传感器包括：感测单元，包括光发生器，光耦合器和光学检测器，光耦合器分离从光发生器入射的光以将分光投影到生物芯片和参考单元中;以及 将从各个生物芯片和参考单元反射的光耦合为一个输出光，并且光学检测器检测输出光，并且生物芯片独立地与感测单元分离，以被布置在由光耦合器分开的光的路径上。 感测单元具有迈克尔逊干涉仪的组成。

    Method of measuring a critical dimension of a semiconductor device and a related apparatus
    3.
    发明授权
    Method of measuring a critical dimension of a semiconductor device and a related apparatus 失效
    测量半导体器件和相关器件的临界尺寸的方法

    公开(公告)号：US07525089B2

    公开(公告)日：2009-04-28

    申请号：US11434142

    申请日：2006-05-16

    申请人： Yo-Han Choi ,  Hee-Bom Kim

    发明人： Yo-Han Choi ,  Hee-Bom Kim

    IPC分类号： G01N23/00

    CPC分类号： H01J37/265 ,  H01J37/222 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2485 ,  H01J2237/2817

    摘要： A method and apparatus for measuring a critical dimension (CD) are provided. Image data of a measurement pattern are generated. The measurement pattern may include a first surface and a second surface facing each other. The image data may include a first side and a second side corresponding to the first surface and the second surface of the measurement pattern, respectively. The image data may be edited to increase an overlap length of the first and second sides. A measurement window crossing the first and second sides in the edited image data is set. A distance between the first and second sides in the measurement window is measured.

    摘要翻译： 提供了一种用于测量临界尺寸（CD）的方法和装置。 产生测量图案的图像数据。 测量图案可以包括彼此面对的第一表面和第二表面。 图像数据可以分别包括对应于测量图案的第一表面和第二表面的第一侧和第二侧。 可以编辑图像数据以增加第一和第二侧的重叠长度。 设置与编辑图像数据中的第一和第二边交叉的测量窗口。 测量测量窗口中的第一和第二侧之间的距离。

    Methods of measuring critical dimensions and related devices
    4.
    发明申请
    Methods of measuring critical dimensions and related devices 有权
    测量关键尺寸和相关设备的方法

    公开(公告)号：US20070292778A1

    公开(公告)日：2007-12-20

    申请号：US11811979

    申请日：2007-06-13

    申请人： Kyoung-Yoon Bang ,  Hae-Young Jeong ,  Yong-Hoon Kim ,  Yo-Han Choi ,  Hyung-Joo Lee

    发明人： Kyoung-Yoon Bang ,  Hae-Young Jeong ,  Yong-Hoon Kim ,  Yo-Han Choi ,  Hyung-Joo Lee

    IPC分类号： G03C5/00 ,  G06K9/00 ,  G01B11/00

    CPC分类号： G01B11/24 ,  G03F7/70625 ,  G06T7/001 ,  G06T2207/30148

    摘要： A method of measuring a critical dimension may include forming an object pattern on a substrate and forming a plurality of reference patterns on the substrate, wherein each of the plurality of reference patterns has a different critical dimension. An optical property of each of the plurality of reference patterns may be measured to provide a respective measured optical property for each of the reference patterns, and an optical property of the object pattern may be measured to provide a measured optical property of the object pattern. The measured optical property of the object pattern may be compared with the measured optical properties of the reference patterns, and a critical dimension of the object pattern may be determined as being the same as the critical dimension of the reference pattern having the measured optical property that is closest to the measured optical property of the object pattern. Related devices are also discussed.

    摘要翻译： 测量临界尺寸的方法可以包括在衬底上形成对象图案并在衬底上形成多个参考图案，其中多个参考图案中的每一个具有不同的临界尺寸。 可以测量多个参考图案中的每一个的光学特性以为每个参考图案提供相应的测量光学特性，并且可以测量对象图案的光学特性以提供对象图案的测量光学特性。 可以将对象图案的测量光学性质与参考图案的测量光学性质进行比较，并且可以将对象图案的临界尺寸确定为与具有测量的光学性质的参考图案的临界尺寸相同， 最接近被测物体图案的光学特性。 还讨论了相关设备。

    Method of measuring a critical dimension of a semiconductor device and a related apparatus
    5.
    发明申请
    Method of measuring a critical dimension of a semiconductor device and a related apparatus 失效
    测量半导体器件和相关器件的临界尺寸的方法

    公开(公告)号：US20070125948A1

    公开(公告)日：2007-06-07

    申请号：US11434142

    申请日：2006-05-16

    申请人： Yo-Han Choi ,  Hee-Bom Kim

    发明人： Yo-Han Choi ,  Hee-Bom Kim

    IPC分类号： G21K7/00

    CPC分类号： H01J37/265 ,  H01J37/222 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2485 ,  H01J2237/2817

    摘要： A method and apparatus for measuring a critical dimension (CD) are provided. Image data of a measurement pattern are generated. The measurement pattern may include a first surface and a second surface facing each other. The image data may include a first side and a second side corresponding to the first surface and the second surface of the measurement pattern, respectively. The image data may be edited to increase an overlap length of the first and second sides. A measurement window crossing the first and second sides in the edited image data is set. A distance between the first and second sides in the measurement window is measured.

    摘要翻译： 提供了一种用于测量临界尺寸（CD）的方法和装置。 产生测量图案的图像数据。 测量图案可以包括彼此面对的第一表面和第二表面。 图像数据可以分别包括对应于测量图案的第一表面和第二表面的第一侧和第二侧。 可以编辑图像数据以增加第一和第二侧的重叠长度。 设置与编辑图像数据中的第一和第二边交叉的测量窗口。 测量测量窗口中的第一和第二侧之间的距离。

    Methods of measuring critical dimensions and related devices
    6.
    发明授权
    Methods of measuring critical dimensions and related devices 有权
    测量关键尺寸和相关设备的方法

    公开(公告)号：US07803506B2

    公开(公告)日：2010-09-28

    申请号：US11811979

    申请日：2007-06-13

    申请人： Kyoung-Yoon Bang ,  Hae-Young Jeong ,  Yong-Hoon Kim ,  Yo-Han Choi ,  Hyung-Joo Lee

    发明人： Kyoung-Yoon Bang ,  Hae-Young Jeong ,  Yong-Hoon Kim ,  Yo-Han Choi ,  Hyung-Joo Lee

    IPC分类号： G03F9/00 ,  G01B11/08

    CPC分类号： G01B11/24 ,  G03F7/70625 ,  G06T7/001 ,  G06T2207/30148

    摘要： A method of measuring a critical dimension may include forming an object pattern on a substrate and forming a plurality of reference patterns on the substrate, wherein each of the plurality of reference patterns has a different critical dimension. An optical property of each of the plurality of reference patterns may be measured to provide a respective measured optical property for each of the reference patterns, and an optical property of the object pattern may be measured to provide a measured optical property of the object pattern. The measured optical property of the object pattern may be compared with the measured optical properties of the reference patterns, and a critical dimension of the object pattern may be determined as being the same as the critical dimension of the reference pattern having the measured optical property that is closest to the measured optical property of the object pattern. Related devices are also discussed.

    摘要翻译： 测量临界尺寸的方法可以包括在衬底上形成对象图案并在衬底上形成多个参考图案，其中多个参考图案中的每一个具有不同的临界尺寸。 可以测量多个参考图案中的每一个的光学特性以为每个参考图案提供相应的测量光学特性，并且可以测量对象图案的光学特性以提供对象图案的测量光学特性。 可以将对象图案的测量光学性质与参考图案的测量光学性质进行比较，并且可以将对象图案的临界尺寸确定为与具有测量的光学性质的参考图案的临界尺寸相同， 最接近被测物体图案的光学特性。 还讨论了相关设备。

    Method of making a photomask
    8.
    发明授权
    Method of making a photomask 有权
    制作光掩模的方法

    公开(公告)号：US06974651B2

    公开(公告)日：2005-12-13

    申请号：US10438990

    申请日：2003-05-16

    申请人： Yo-Han Choi

    发明人： Yo-Han Choi

    IPC分类号： H01L21/027 ,  G03F1/00

    CPC分类号： G03F1/26 ,  G03F1/80

    摘要： A method of making a photomask ensures that the mask pattern is precisely formed. A mask blank is provided in which an opaque film and a mask film are disposed on a transparent substrate. The mask film and the opaque film are successively etched to form an opaque pattern and a mask pattern. Next, a dimension of the opaque pattern is measured. If the measured dimension of the opaque pattern is smaller than a reference value, the opaque pattern is etched using the mask pattern as an etching mask to attain the desired dimension of the opaque pattern. The mask pattern is then removed.

    摘要翻译： 制造光掩模的方法确保掩模图案被精确地形成。 提供了一种掩模板，其中不透明膜和掩模膜设置在透明基板上。 连续蚀刻掩模膜和不透明膜以形成不透明图案和掩模图案。 接下来，测量不透明图案的尺寸。 如果不透明图案的测量尺寸小于参考值，则使用掩模图案作为蚀刻掩模蚀刻不透明图案，以获得不透明图案的期望尺寸。 然后去除掩模图案。