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公开(公告)号:US06450116B1
公开(公告)日:2002-09-17
申请号:US09439476
申请日:1999-11-12
申请人: David B. Noble , Ravi Jallepally , Nathan D'Astici , Gary Miner , Turgut Sahin , Guangcai Xing , Yashraj Bhatnagar
发明人: David B. Noble , Ravi Jallepally , Nathan D'Astici , Gary Miner , Turgut Sahin , Guangcai Xing , Yashraj Bhatnagar
IPC分类号: C23C1600
CPC分类号: H01J37/32357 , C23C8/36 , C23C16/452 , H01J2237/3387
摘要: An apparatus and method for exposing a substrate to plasma including a first reaction chamber adapted to generate a plasma comprising ions and radicals and a second reaction chamber coupled to the first reaction chamber and adapted to house a substrate at a sight in the second reaction chamber. The second reaction chamber is coupled to the first reaction chamber by an inlet member and radicals of the plasma flow through the inlet member into the second reaction chamber.
摘要翻译: 一种用于将衬底暴露于等离子体的装置和方法,包括适于产生包含离子和自由基的等离子体的第一反应室和耦合到第一反应室的第二反应室,并适于将基板容纳在第二反应室中。 第二反应室通过入口构件连接到第一反应室,等离子体的自由基流过入口构件进入第二反应室。