公开(公告)号：US09563132B2

公开(公告)日：2017-02-07

申请号：US13564210

申请日：2012-08-01

申请人： David Bessems ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Rogier Hendrikus Magdalena Cortie ,  Adrianes Johannes Baeten ,  Cornelius Maria Rops

发明人： David Bessems ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Rogier Hendrikus Magdalena Cortie ,  Adrianes Johannes Baeten ,  Cornelius Maria Rops

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  Y10T137/2931

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening at least partly surrounding and radially outward of the meniscus pinning feature; and optionally a gas recovery opening radially outward of the gas supply opening, wherein the gas supply opening, or the gas recovery opening, or both the gas supply opening and the gas recovery opening, has an open area per meter length which has a variation peripherally around the space.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在被配置为将浸没流体包含在流体处理结构外部的区域的边界处具有：弯液面钉扎特征，以阻止浸没流体径向向外 方向从空间; 至少部分地围绕所述弯液面钉扎特征并径向向外的气体供应开口; 并且可选地，气体供应开口径向向外的气体回收开口，其中气体供应开口或气体回收开口，或气体供应开口和气体回收开口两者具有每米长度的开放面积，其外围具有变化 在空间周围。

公开(公告)号：US09625828B2

公开(公告)日：2017-04-18

申请号：US13022319

申请日：2011-02-07

申请人： Michel Riepen ,  Erik Henricus Egidius Catharina Eummelen ,  Sandra Van Der Graaf ,  Rogier Hendrikus Magdalena Cortie ,  Takeshi Kaneko ,  Nina Vladimirovna Dziomkina ,  Laurentius Johannes Adrianus Van Bokhoven ,  Fabrizio Evangelista ,  David Bessems ,  Cornelius Maria Rops ,  Adrianus Marinus Verdonck ,  Nicolaas Ten Kate

发明人： Michel Riepen ,  Erik Henricus Egidius Catharina Eummelen ,  Sandra Van Der Graaf ,  Rogier Hendrikus Magdalena Cortie ,  Takeshi Kaneko ,  Nina Vladimirovna Dziomkina ,  Laurentius Johannes Adrianus Van Bokhoven ,  Fabrizio Evangelista ,  David Bessems ,  Cornelius Maria Rops ,  Adrianus Marinus Verdonck ,  Nicolaas Ten Kate

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.

公开(公告)号：US20110194084A1

公开(公告)日：2011-08-11

申请号：US13022319

申请日：2011-02-07

申请人： Michel RIEPEN ,  Erik Henricus Egidius Catharina Eummelen ,  Sandra Van Der Graaf ,  Rogier Hendrikus Magdalena Cortie ,  Takeshi Kaneko ,  Nina Vladimirovna Dziomkina ,  Laurentius Johannes Adrianus Van Bokhoven ,  Fabrizio Evangelista ,  David Bessems ,  Cornelius Maria Rops ,  Adrianus Marinus Verdonck ,  Nicolaas Ten Kate

发明人： Michel RIEPEN ,  Erik Henricus Egidius Catharina Eummelen ,  Sandra Van Der Graaf ,  Rogier Hendrikus Magdalena Cortie ,  Takeshi Kaneko ,  Nina Vladimirovna Dziomkina ,  Laurentius Johannes Adrianus Van Bokhoven ,  Fabrizio Evangelista ,  David Bessems ,  Cornelius Maria Rops ,  Adrianus Marinus Verdonck ,  Nicolaas Ten Kate

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在从被构造成包括浸没流体到所述流体处理结构外部的区域的空间的边界处连续地具有：提取器，其具有布置在第一行中的至少一个开口， 在使用中指向基底和/或桌子; 以及在使用中面向基板和/或表的表面上的液体操纵器，以减少表面上的液滴的聚结机会。

公开(公告)号：US08836912B2

公开(公告)日：2014-09-16

申请号：US13273879

申请日：2011-10-14

申请人： David Bessems ,  Erik Henricus Egidius Catharina Eummelen ,  Rogier Hendrikus Magdalena Cortie ,  Marcus Johannes Van Der Zanden ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops ,  Paul Willems

发明人： David Bessems ,  Erik Henricus Egidius Catharina Eummelen ,  Rogier Hendrikus Magdalena Cortie ,  Marcus Johannes Van Der Zanden ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops ,  Paul Willems

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处具有：弯液面锁定特征，以阻止浸没流体在径向向外 方向从空间; 位于弯月面钉扎特征的径向外侧的气体供应开口; 以及位于弯液面钉扎特征的径向外侧并且至少部分地围绕气体供应开口的气体回收开口。

公开(公告)号：US20120120376A1

公开(公告)日：2012-05-17

申请号：US13273879

申请日：2011-10-14

申请人： David Bessems ,  Erik Henricus Egidius Catharina Eummelen ,  Rogier Hendrikus Magdalena Cortie ,  Marcus Johannes Van Der Zanden ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops ,  Paul Willems

发明人： David Bessems ,  Erik Henricus Egidius Catharina Eummelen ,  Rogier Hendrikus Magdalena Cortie ,  Marcus Johannes Van Der Zanden ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops ,  Paul Willems

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处具有：弯液面锁定特征，以阻止浸没流体在径向向外 方向从空间; 位于弯月面钉扎特征的径向外侧的气体供应开口; 以及位于弯液面钉扎特征的径向外侧并且至少部分地围绕气体供应开口的气体回收开口。

公开(公告)号：US20130016332A1

公开(公告)日：2013-01-17

申请号：US13542530

申请日：2012-07-05

申请人： Rogier Hendrikus Magdalena Cortie ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Michel Riepen ,  Henricus Jozef Castelijns ,  Cornelius Maria Rops ,  Jim Vincent Overkamp

发明人： Rogier Hendrikus Magdalena Cortie ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Michel Riepen ,  Henricus Jozef Castelijns ,  Cornelius Maria Rops ,  Jim Vincent Overkamp

IPC分类号： G03B27/52

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处具有：弯液面锁定特征，以阻止浸没流体在径向向外 方向从空间; 以及线性阵列中的至少部分地围绕并径向向外的一个或多个弯液面钉扎特征的多个气体供应开口，其中线性阵列中的多个气体供应开口具有相似或相同的尺寸。

公开(公告)号：US09069262B2

公开(公告)日：2015-06-30

申请号：US13542546

申请日：2012-07-05

申请人： Rogier Hendrikus Magdalena Cortie ,  Michel Riepen ,  Cornelius Maria Rops

发明人： Rogier Hendrikus Magdalena Cortie ,  Michel Riepen ,  Cornelius Maria Rops

IPC分类号： G03F7/20

CPC分类号： G03F7/70483 ,  G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处具有：弯液面锁定特征，以阻止浸没流体在径向向外 方向从空间; 线性阵列中的多个气体供应开口，其至少部分地围绕半月板钉扎特征并且径向向外; 以及以多个气体供给开口径向向外的线性阵列的气体回收开口。

公开(公告)号：US09235138B2

公开(公告)日：2016-01-12

申请号：US13542530

申请日：2012-07-05

申请人： Rogier Hendrikus Magdalena Cortie ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Michel Riepen ,  Henricus Jozef Castelijns ,  Cornelius Maria Rops ,  Jim Vincent Overkamp

发明人： Rogier Hendrikus Magdalena Cortie ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Michel Riepen ,  Henricus Jozef Castelijns ,  Cornelius Maria Rops ,  Jim Vincent Overkamp

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处具有：弯液面锁定特征，以阻止浸没流体在径向向外 方向从空间; 以及线性阵列中的至少部分地围绕并径向向外的一个或多个弯液面钉扎特征的多个气体供应开口，其中线性阵列中的多个气体供应开口具有相似或相同的尺寸。

公开(公告)号：US08780324B2

公开(公告)日：2014-07-15

申请号：US13103479

申请日：2011-05-09

申请人： Rogier Hendrikus Magdalena Cortie ,  Michel Riepen ,  Rob Cornelissen

发明人： Rogier Hendrikus Magdalena Cortie ,  Michel Riepen ,  Rob Cornelissen

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F7/405 ,  G03F7/70341 ,  Y10T29/49401 ,  Y10T137/8593

摘要： A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has, on an undersurface, a liquid supply opening or a plurality of liquid supply openings and a liquid extraction opening or a plurality of liquid extraction openings arranged such that, in use, liquid is provided on and removed from the undersurface of the fluid handling structure.

摘要翻译： 公开了一种用于光刻设备的流体处理结构。 流体处理结构在下表面上具有液体供应开口或多个液体供应开口，以及液体抽取开口或多个液体抽出开口，其布置成使得在使用中，液体被提供在下表面上 流体处理结构。

公开(公告)号：US09256136B2

公开(公告)日：2016-02-09

申请号：US13090311

申请日：2011-04-20

申请人： Rogier Hendrikus Magdalena Cortie ,  Paulus Martinus Maria Liebregts ,  Michel Riepen ,  Fabrizio Evangelista

发明人： Rogier Hendrikus Magdalena Cortie ,  Paulus Martinus Maria Liebregts ,  Michel Riepen ,  Fabrizio Evangelista

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.

摘要翻译： 公开了一种用于光刻设备的流体处理结构，流体处理结构在从被配置为将浸没流体包含在流体处理结构外部区域的空间的边界处依次具有：细长开口或多个开口 在使用中的第一线指向被配置为支撑衬底的衬底和/或衬底台; 气刀设备，其具有在第二线中的细长孔; 以及与气刀装置相邻的细长开口或多个开口。