公开(公告)号：US20070259112A1

公开(公告)日：2007-11-08

申请号：US11697516

申请日：2007-04-06

申请人： David Ishikawa ,  Craig Metzner ,  Ali Zojaji ,  Yihwan Kim ,  Arkadii Samoilov

发明人： David Ishikawa ,  Craig Metzner ,  Ali Zojaji ,  Yihwan Kim ,  Arkadii Samoilov

IPC分类号： C23C16/00 ,  C30B23/00 ,  C30B28/12

CPC分类号： C30B35/00 ,  C23C16/45561 ,  C30B25/14 ,  Y10T117/10

摘要： The present invention provides methods, systems, and apparatus for epitaxial film formation that includes an epitaxial chamber adapted to form an epitaxial layer on a substrate; a deposition gas manifold adapted to supply at least one deposition gas and a carrier gas to the epitaxial chamber; and an etchant gas manifold, separate from the deposition gas manifold, and adapted to supply at least one etchant gas and a carrier gas to the epitaxial chamber. Numerous other aspects are disclosed.

摘要翻译： 本发明提供了用于外延膜形成的方法，系统和装置，其包括适于在衬底上形成外延层的外延腔; 适于将至少一个沉积气体和载气供应到所述外延室的沉积气体歧管; 以及与沉积气体歧管分开的蚀刻剂气体歧管，并且适于向外延室供应至少一种蚀刻剂气体和载气。 公开了许多其他方面。

公开(公告)号：US07674337B2

公开(公告)日：2010-03-09

申请号：US11697516

申请日：2007-04-06

申请人： David Ishikawa ,  Craig R. Metzner ,  Ali Zojaji ,  Yihwan Kim ,  Arkadii V. Samoilov

发明人： David Ishikawa ,  Craig R. Metzner ,  Ali Zojaji ,  Yihwan Kim ,  Arkadii V. Samoilov

IPC分类号： C23C16/00 ,  C30B11/00

CPC分类号： C30B35/00 ,  C23C16/45561 ,  C30B25/14 ,  Y10T117/10

摘要： The present invention provides methods, systems, and apparatus for epitaxial film formation that includes an epitaxial chamber adapted to form an epitaxial layer on a substrate; a deposition gas manifold adapted to supply at least one deposition gas and a carrier gas to the epitaxial chamber; and an etchant gas manifold, separate from the deposition gas manifold, and adapted to supply at least one etchant gas and a carrier gas to the epitaxial chamber. Numerous other aspects are disclosed.

摘要翻译： 本发明提供了用于外延膜形成的方法，系统和装置，其包括适于在衬底上形成外延层的外延腔; 适于将至少一个沉积气体和载气供应到所述外延室的沉积气体歧管; 以及与沉积气体歧管分开的蚀刻剂气体歧管，并且适于向外延室供应至少一种蚀刻剂气体和载气。 公开了许多其他方面。

公开(公告)号：US20080072820A1

公开(公告)日：2008-03-27

申请号：US11767619

申请日：2007-06-25

申请人： Brian Burrows ,  Craig Metzner ,  Dennis Demars ,  Roger Anderson ,  Juan Chacin ,  David Carlson ,  David Ishikawa ,  Jeffrey Campbell ,  Richard Collins ,  Keith Magill ,  Imran Afzal

发明人： Brian Burrows ,  Craig Metzner ,  Dennis Demars ,  Roger Anderson ,  Juan Chacin ,  David Carlson ,  David Ishikawa ,  Jeffrey Campbell ,  Richard Collins ,  Keith Magill ,  Imran Afzal

IPC分类号： B05C11/00

CPC分类号： H01L21/67115 ,  H01L21/67017 ,  H01L21/6719

摘要： The present invention provides methods and apparatus for processing semiconductor substrates. Particularly, the present invention provides a modular processing cell to be used in a cluster tool. The modular semiconductor processing cell of the present invention comprises a chamber having an inject cap, a gas panel module configured to supply one or more processing gas to the chamber through the inject cap, wherein the gas panel module is position adjacent the inject cap. The processing cell further comprises a lamp module positioned below the chamber. The lamp module comprises a plurality of vertically oriented lamps.

摘要翻译： 本发明提供了半导体衬底的处理方法和装置。 特别地，本发明提供了一种在群集工具中使用的模块化处理单元。 本发明的模块化半导体处理单元包括具有注入盖的腔室，配置成通过喷射盖向腔室供应一种或多种处理气体的气体面板模块，其中气体面板模块位于与喷射盖相邻的位置。 处理室还包括位于室下方的灯模块。 灯模块包括多个垂直取向的灯。

公开(公告)号：US09267205B1

公开(公告)日：2016-02-23

申请号：US13483779

申请日：2012-05-30

申请人： David Ishikawa ,  Abril Cabreros ,  Brian Burrows

发明人： David Ishikawa ,  Abril Cabreros ,  Brian Burrows

IPC分类号： C23C16/455 ,  C23C16/18

CPC分类号： C23C16/45572 ,  C23C16/18 ,  C23C16/45563 ,  C23C16/45565

摘要： A fastener system and method for supporting and retaining modular insulating quartz liners with gas apertures in close proximity to corresponding apertures in diffusers of gas showerheads. Tubular fasteners have a head, a tubular shank and a foot that extend through a liner plate nozzle into a diffuser plate. A keyway in the gas diffuser, aligned and coaxial with a diffuser nozzle, allows the foot to reach an arcuate concourse through a keyway where it can be locked by bayonet turning. The keyway is machined into the diffuser by EDM and is an inversion of the fastener tip geometry rotated about the axis of the tubular shank. Each fastener and nozzle set form a coaxial path for distributing processing gas to substrates through liner and diffuser plates from a plenum in showerheads of a MOCVD reactor.

摘要翻译： 一种紧固件系统和方法，用于支撑和保持具有气孔的模块化绝缘石英衬垫，其紧邻气体喷头的扩散器中的相应孔。 管状紧固件具有头部，管状柄和脚，其延伸穿过衬板喷嘴进入扩散板。 与扩散喷嘴对准并同轴的气体扩散器中的键槽允许脚通过键槽到达弧形大厅，在该位置处可通过卡口旋转锁定。 键槽通过EDM加工成扩散器，并且是围绕管状柄的轴线旋转的紧固件尖端几何形状的反转。 每个紧固件和喷嘴组形成同轴路径，用于通过衬套和扩散板将处理气体分配到MOCVD反应器的喷头中的增压室。

公开(公告)号：US09114464B1

公开(公告)日：2015-08-25

申请号：US13420414

申请日：2012-03-14

申请人： David Ishikawa ,  Laila Mattos

发明人： David Ishikawa ,  Laila Mattos

IPC分类号： B26F1/02 ,  B21D22/00 ,  H05K13/02 ,  B23D23/00 ,  B26D7/32

CPC分类号： B23D23/00 ,  B26D1/095 ,  B26D7/26 ,  B26D7/32 ,  B26D2007/2607

摘要： A fixture for cutting thin substrates, such as films, wafers, semiconductor layers and the like, using a blade holder assembly joined to a substrate clamp assembly. Each assembly has a plurality of members with the substrate clamp having a base plate that introduces a vacuum environment and a substrate support plate that uses the vacuum to secure the substrate in place. The blade holder assembly has interlocking projections in interleaving sheet members sandwiched between two bracket members that define slots for supporting a knife. Multiple slots allow the blade to be positioned in different positions and different orientations for cutting thin substrates held with vacuum pressure in the substrate clamp assembly.

摘要翻译： 一种用于切割诸如薄膜，晶片，半导体层等的薄基板的固定装置，其使用连接到基板夹具组件的刀片保持器组件。 每个组件具有多个构件，其中衬底夹具具有引入真空环境的基板和使用真空的衬底支撑板，以将衬底固定就位。 刀片保持器组件具有互锁的突出部，该互锁突起插入夹在两个支架部件之间的片材部件，这两个支架部件限定用于支撑刀具的槽。 多个插槽允许刀片定位在不同的位置和不同的取向，用于切割在衬底夹具组件中以真空压力保持的薄衬底。