摘要:
An ablative plasma gun subassembly is disclosed. The subassembly includes a body, a first pair and a second pair of gun electrodes having distal ends disposed within an interior of the body, and ablative material disposed proximate the distal ends of at least one of the first pair of gun electrodes and the second pair of gun electrodes.
摘要:
An electrical pulse circuit is disclosed. The electrical pulse circuit is in connection with a first pair of electrodes defining a first gap between ends thereof and a second pair of electrodes defining a second gap between ends thereof. The second gap is disposed proximate to the first gap. The circuit includes a controller, a first electrical pulse source in power connection with the first pair of electrodes, and a second electrical pulse source in power connection with the second pair of electrodes. The first electrical pulse source is productive of a high voltage low current arc across the first gap in response to the controller and the second electrical pulse source is productive of a low voltage high current arc across the second gap in response to the controller and the high voltage arc.
摘要:
An electrical pulse circuit is disclosed. The electrical pulse circuit is in connection with a first pair of electrodes defining a first gap between ends thereof and a second pair of electrodes defining a second gap between ends thereof. The second gap is disposed proximate to the first gap. The circuit includes a controller, a first electrical pulse source in power connection with the first pair of electrodes, and a second electrical pulse source in power connection with the second pair of electrodes. The first electrical pulse source is productive of a high voltage low current arc across the first gap in response to the controller and the second electrical pulse source is productive of a low voltage high current arc across the second gap in response to the controller and the high voltage arc.
摘要:
A circuit protection device includes a plasma gun configured to emit an ablative plasma along an axis, and a plurality of electrodes, wherein each electrode is electrically coupled to a respective conductor of a circuit and is arranged substantially along a plane that is substantially perpendicular to the axis such that each electrode is positioned substantially equidistant from the axis.
摘要:
An arc containment device is presented. The arc containment device includes a shock shield further having a multiple apertures for escape of gas, the shock shield configured to surround an arc source. The device further comprises an inner enclosure having a multiple openings generally aligned with the multiple apertures, the inner enclosure configured to provide an electrical insulation base for the arc source. An outer enclosure disposed is provided around the inner enclosure, the outer enclosure configured to direct the gas to the environment outside the device.
摘要:
A circuit protection device includes a plasma gun configured to emit an ablative plasma along an axis, and a plurality of electrodes, wherein each electrode is electrically coupled to a respective conductor of a circuit and is arranged substantially along a plane that is substantially perpendicular to the axis such that each electrode is positioned substantially equidistant from the axis.
摘要:
An arc containment device is presented. The arc containment device includes a shock shield further having a multiple apertures for escape of gas, the shock shield configured to surround an arc source. The device further comprises an inner enclosure having a multiple openings generally aligned with the multiple apertures, the inner enclosure configured to provide an electrical insulation base for the arc source. An outer enclosure disposed is provided around the inner enclosure, the outer enclosure configured to direct the gas to the environment outside the device.
摘要:
A dual power source pulse generator in power connection with a pair of electrodes having a first electrode, a second electrode and an air gap therebetween. The dual power source pulse generator includes a first pulse source producing a high voltage low current pulse across the pair of electrodes to allow dielectric breakdown, and a second pulse source electrically connected in parallel with an output of the first pulse source, and producing a low voltage high current pulse to thereby produce a current flow of high-density plasma between the same electrodes of the pair of electrodes in response to the high voltage low current pulse.
摘要:
An ablative plasma gun having a dual power source pulse generator is configured to generate a high voltage low current pulse and a low voltage high current pulse. A pair of electrodes are disposed and configured to receive the high voltage low current pulse, and to receive the low voltage high current pulse in response to the high voltage low current pulse.
摘要:
A dual power source pulse generator in power connection with a pair of electrodes having a first electrode, a second electrode and an air gap therebetween. The dual power source pulse generator includes a first pulse source producing a high voltage low current pulse across the pair of electrodes to allow dielectric breakdown, and a second pulse source electrically connected in parallel with an output of the first pulse source, and producing a low voltage high current pulse to thereby produce a current flow of high-density plasma between the same electrodes of the pair of electrodes in response to the high voltage low current pulse.