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    Apparatus and method of improving beam shaping and beam homogenization
    5.
    发明授权
    Apparatus and method of improving beam shaping and beam homogenization 有权
    改进光束成形和光束均匀化的装置和方法

    公开(公告)号：US08148663B2

    公开(公告)日：2012-04-03

    申请号：US11888433

    申请日：2007-07-31

    申请人： Bruce E. Adams ,  Samuel C. Howells ,  Dean Jennings ,  Jiping Li ,  Timothy N. Thomas ,  Stephen Moffatt

    发明人： Bruce E. Adams ,  Samuel C. Howells ,  Dean Jennings ,  Jiping Li ,  Timothy N. Thomas ,  Stephen Moffatt

    IPC分类号： B23K26/06

    CPC分类号： B23K26/073 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/067 ,  B23K26/0732 ,  B23K2103/56 ,  G02B27/0961

    摘要： The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. Typically, the anneal regions may be square or rectangular in shape. Generally, the optical system and methods of the present invention are used to preferentially anneal one or more regions found within the anneal regions by delivering enough energy to cause the one or more regions to re-melt and solidify.

    摘要翻译： 本发明一般涉及一种光学系统，其能够在包含在基板的表面上的退火区域上可靠地传递均匀的能量。 光学系统适于在衬底的表面上的期望区域上传送或投影具有期望的二维形状的均匀量的能量。 通常，退火区域可以是正方形或矩形形状。 通常，本发明的光学系统和方法用于通过递送足够的能量以使一个或多个区域再熔化和固化来优先退火在退火区域内发现的一个或多个区域。

    APPARATUS AND METHOD OF IMPROVING BEAM SHAPING AND BEAM HOMOGENIZATION
    7.
    发明申请
    APPARATUS AND METHOD OF IMPROVING BEAM SHAPING AND BEAM HOMOGENIZATION 有权
    改进光束形成和光束均匀化的装置和方法

    公开(公告)号：US20120148701A1

    公开(公告)日：2012-06-14

    申请号：US13401553

    申请日：2012-02-21

    申请人： Bruce E. Adams ,  Samuel C. Howells ,  Dean Jennings ,  Jiping Li ,  Timothy N. Thomas ,  Stephen Moffatt

    发明人： Bruce E. Adams ,  Samuel C. Howells ,  Dean Jennings ,  Jiping Li ,  Timothy N. Thomas ,  Stephen Moffatt

    IPC分类号： B29C35/08

    CPC分类号： B23K26/073 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/067 ,  B23K26/0732 ,  B23K2103/56 ,  G02B27/0961

    摘要： The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. Typically, the anneal regions may be square or rectangular in shape. Generally, the optical system and methods of the present invention are used to preferentially anneal one or more regions found within the anneal regions by delivering enough energy to cause the one or more regions to re-melt and solidify.

    摘要翻译： 本发明一般涉及一种光学系统，其能够在包含在基板的表面上的退火区域上可靠地传递均匀的能量。 光学系统适于在衬底的表面上的期望区域上传送或投影具有期望的二维形状的均匀量的能量。 通常，退火区域可以是正方形或矩形形状。 通常，本发明的光学系统和方法用于通过递送足够的能量以使一个或多个区域再熔化和固化来优先退火在退火区域内发现的一个或多个区域。

    INCREASED NANOSECOND LASER PULSE-TO-PULSE ENERGY REPEATABILITY USING ACTIVE LASER PULSE ENERGY CONTROL
    8.
    发明申请
    INCREASED NANOSECOND LASER PULSE-TO-PULSE ENERGY REPEATABILITY USING ACTIVE LASER PULSE ENERGY CONTROL 审中-公开
    增加激光器激光脉冲能量可重复使用激光脉冲能量控制

    公开(公告)号：US20090046750A1

    公开(公告)日：2009-02-19

    申请号：US11839415

    申请日：2007-08-15

    申请人： JIPING LI ,  Timothy N. Thomas ,  Dean Jennings ,  Bruce E. Adams ,  Aaron Muir Hunter

    发明人： JIPING LI ,  Timothy N. Thomas ,  Dean Jennings ,  Bruce E. Adams ,  Aaron Muir Hunter

    IPC分类号： H01S3/10

    CPC分类号： B23K26/0622 ,  H01L21/02686 ,  H01L21/2026

    摘要： A method and apparatus for reducing the pulse-to-pulse laser energy variation (i.e., increasing the pulse-to-pulse laser energy repeatability) from a pulsed laser source are provided. In this manner, laser pulses impingent on a processing plane, such as the surface of a wafer or other substrate, may have substantially the same energy content leading to a more controlled process when compared to conventional processing. The method may be based on in-situ detection of the pulse energy level and the subsequent active adjustment of the transmitted laser pulse energy in a closed-loop control scheme. Furthermore, the active adjustment of the laser pulse energy may occur within a few nanoseconds after the original laser pulse is generated by a pulsed laser source.

    摘要翻译： 提供了一种用于从脉冲激光源减少脉冲对脉冲激光能量变化（即，增加脉冲到脉冲激光能量重复性）的方法和装置。 以这种方式，与常规处理相比，照射在诸如晶片或其它基板的表面的处理平面上的激光脉冲可具有基本上相同的能量含量，导致更受控制的过程。 该方法可以基于在闭环控制方案中脉冲能级的随机检测和随后的发射激光脉冲能量的主动调节。 此外，在通过脉冲激光源产生原始激光脉冲之后，激光脉冲能量的主动调节可能在几纳秒内发生。

    HIGH SPEED PHASE SCRAMBLING OF A COHERENT BEAM USING PLASMA
    9.
    发明申请
    HIGH SPEED PHASE SCRAMBLING OF A COHERENT BEAM USING PLASMA 有权
    使用等离子体的相干光束的高速相位扫描

    公开(公告)号：US20090091817A1

    公开(公告)日：2009-04-09

    申请号：US11868933

    申请日：2007-10-08

    申请人： Dean Jennings ,  Bruce E. Adams ,  Timothy N. Thomas ,  Stephen Moffatt

    发明人： Dean Jennings ,  Bruce E. Adams ,  Timothy N. Thomas ,  Stephen Moffatt

    IPC分类号： G02B26/08 ,  B23K26/00

    CPC分类号： H01L21/67115

    摘要： A laser beam is modulated at a very high frequency to produce uniform radiant flux densities on substrate surface processing regions during thermal processing. Beam modulation is achieved by passing the laser beam through a plasma which causes phase randomization within the laser beam. This method may be used for any application where intense, uniform illumination is desired, such as pulsed laser annealing, ablating, and wafer stepper illuminating.

    摘要翻译： 激光束以非常高的频率被调制，以在热处理期间在衬底表面处理区域上产生均匀的辐射通量密度。 通过使激光束通过等离子体来实现光束调制，其引起激光束内的相位随机化。 该方法可以用于需要强烈均匀照明的任何应用，例如脉冲激光退火，烧蚀和晶片步进照明。

    High speed phase scrambling of a coherent beam using plasma
    10.
    发明授权
    High speed phase scrambling of a coherent beam using plasma 有权
    使用等离子体的相干光束的高速相位扰乱

    公开(公告)号：US07795816B2

    公开(公告)日：2010-09-14

    申请号：US11868933

    申请日：2007-10-08

    申请人： Dean Jennings ,  Bruce E. Adams ,  Timothy N. Thomas ,  Stephen Moffatt

    发明人： Dean Jennings ,  Bruce E. Adams ,  Timothy N. Thomas ,  Stephen Moffatt

    IPC分类号： H05B31/26

    CPC分类号： H01L21/67115

    摘要： A laser beam is modulated at a very high frequency to produce uniform radiant flux densities on substrate surface processing regions during thermal processing. Beam modulation is achieved by passing the laser beam through a plasma which causes phase randomization within the laser beam. This method may be used for any application where intense, uniform illumination is desired, such as pulsed laser annealing, ablating, and wafer stepper illuminating.

    摘要翻译： 激光束以非常高的频率被调制，以在热处理期间在衬底表面处理区域上产生均匀的辐射通量密度。 通过使激光束通过等离子体来实现光束调制，其引起激光束内的相位随机化。 该方法可以用于需要强烈均匀照明的任何应用，例如脉冲激光退火，烧蚀和晶片步进照明。