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    Method of positioning catalyst nanoparticle and nanowire-based device employing same
    4.
    发明授权
    Method of positioning catalyst nanoparticle and nanowire-based device employing same 失效
    使用其的催化剂纳米颗粒和基于纳米线的装置的定位方法

    公开(公告)号：US08268720B2

    公开(公告)日：2012-09-18

    申请号：US11742310

    申请日：2007-04-30

    申请人： Theodore I. Kamins ,  Zhiyong Li ,  Duncan R. Stewart

    发明人： Theodore I. Kamins ,  Zhiyong Li ,  Duncan R. Stewart

    IPC分类号： H01L21/4763

    CPC分类号： H01L29/0665 ,  B81B2201/0271 ,  B81C1/00142 ,  B82Y10/00 ,  B82Y30/00 ,  H01L23/53276 ,  H01L29/0673 ,  H01L29/0676 ,  H01L2221/1094 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A method of positioning a catalyst nanoparticle that facilitates nanowire growth for nanowire-based device fabrication employs a structure having a vertical sidewall formed on a substrate. The methods include forming the structure, forming a targeted region in a surface of either the structure or the substrate, and forming a catalyst nanoparticle in the targeted region using one of a variety of techniques. The techniques control the position of the catalyst nanoparticle for subsequent nanowire growth. A resonant sensor system includes a nanowire-based resonant sensor and means for accessing the nanowire. The sensor includes an electrode and a nanowire resonator. The electrode is electrically isolated from the substrate. One or more of the substrate is electrically conductive, the nanowire resonator is electrically conductive, and the sensor further comprises another electrode. The nanowire resonator responds to an environmental change by displaying a change in oscillatory behavior.

    摘要翻译： 定位促进用于纳米线的器件制造的纳米线生长的催化剂纳米颗粒的方法采用具有形成在衬底上的垂直侧壁的结构。 所述方法包括形成结构，在结构或基底的表面中形成目标区域，并使用各种技术之一在目标区域中形成催化剂纳米颗粒。 该技术控制催化剂纳米颗粒在随后的纳米线生长中的位置。 谐振传感器系统包括基于纳米线的谐振传感器和用于访问纳米线的装置。 传感器包括电极和纳米线谐振器。 电极与衬底电隔离。 衬底中的一个或多个是导电的，纳米线谐振器是导电的，并且传感器还包括另一个电极。 纳米线谐振器通过显示振荡行为的变化来响应环境变化。

    Method of Positioning Catalyst Nanoparticle and Nanowire-Based Device Employing Same
    5.
    发明申请
    Method of Positioning Catalyst Nanoparticle and Nanowire-Based Device Employing Same 失效
    定位催化剂纳米颗粒和基于纳米线的装置使用方法

    公开(公告)号：US20100109101A1

    公开(公告)日：2010-05-06

    申请号：US11742310

    申请日：2007-04-30

    申请人： Theodore I. Kamins ,  Zhiyong Li ,  Duncan R. Stewart

    发明人： Theodore I. Kamins ,  Zhiyong Li ,  Duncan R. Stewart

    IPC分类号： H01L29/84 ,  H01L21/62

    CPC分类号： H01L29/0665 ,  B81B2201/0271 ,  B81C1/00142 ,  B82Y10/00 ,  B82Y30/00 ,  H01L23/53276 ,  H01L29/0673 ,  H01L29/0676 ,  H01L2221/1094 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A method of positioning a catalyst nanoparticle that facilitates nanowire growth for nanowire-based device fabrication employs a structure having a vertical sidewall formed on a substrate. The methods include forming the structure, forming a targeted region in a surface of either the structure or the substrate, and forming a catalyst nanoparticle in the targeted region using one of a variety of techniques. The techniques control the position of the catalyst nanoparticle for subsequent nanowire growth. A resonant sensor system includes a nanowire-based resonant sensor and means for accessing the nanowire. The sensor includes an electrode and a nanowire resonator. The electrode is electrically isolated from the substrate. One or more of the substrate is electrically conductive, the nanowire resonator is electrically conductive, and the sensor further comprises another electrode. The nanowire resonator responds to an environmental change by displaying a change in oscillatory behavior.

    摘要翻译： 定位促进用于纳米线的器件制造的纳米线生长的催化剂纳米颗粒的方法采用具有形成在衬底上的垂直侧壁的结构。 所述方法包括形成结构，在结构或基底的表面中形成目标区域，并使用各种技术之一在目标区域中形成催化剂纳米颗粒。 该技术控制催化剂纳米颗粒在随后的纳米线生长中的位置。 谐振传感器系统包括基于纳米线的谐振传感器和用于访问纳米线的装置。 传感器包括电极和纳米线谐振器。 电极与衬底电隔离。 衬底中的一个或多个是导电的，纳米线谐振器是导电的，并且传感器还包括另一个电极。 纳米线谐振器通过显示振荡行为的变化来响应环境变化。

    Contact lithography apparatus and method
    10.
    发明授权
    Contact lithography apparatus and method 失效
    接触光刻设备和方法

    公开(公告)号：US07768628B2

    公开(公告)日：2010-08-03

    申请号：US11548823

    申请日：2006-10-12

    申请人： Wei Wu ,  Shih-Yuan Wang ,  Duncan R. Stewart ,  R. Stanley Williams ,  Zhaoning Yu ,  Inkyu Park

    发明人： Wei Wu ,  Shih-Yuan Wang ,  Duncan R. Stewart ,  R. Stanley Williams ,  Zhaoning Yu ,  Inkyu Park

    IPC分类号： G03B27/02 ,  G03B27/42 ,  G03B27/58 ,  G03B27/20 ,  G03B27/22 ,  H01L21/00

    CPC分类号： G03F7/7035

    摘要： A contact lithography apparatus and a method use one or both of spacers and a mesa to facilitate pattern transfer. The apparatus and the method include one or both of a spacer that provides a spaced apart orientation of lithographic elements, such as a patterning tool and a substrate, when in mutual contact with the spacer and a mesa between the patterning tool and the substrate. The mesa supports a contact surface of one or both of the mold and the substrate. One or both of the spacers and the mesa may be non-uniform. One or more of the patterning tool, the substrate and the spacer is deformable, such that deformation thereof facilitates the pattern transfer.

    摘要翻译： 接触式光刻设备和方法使用间隔物和台面中的一个或两个以便于图案转印。 该装置和方法包括当与间隔物相互接触并且在图案形成工具和衬底之间的台面时提供间隔开的光刻元件取向的间隔物中的一个或两个，诸如图案形成工具和衬底。 台面支撑模具和基板之一或两者的接触表面。 间隔物和台面中的一个或两个可能是不均匀的。 图案形成工具，衬底和间隔件中的一个或多个可变形，使得其变形有利于图案转印。