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    Phase-Modulated RF Power for Plasma Chamber Electrode
    1.
    发明申请
    Phase-Modulated RF Power for Plasma Chamber Electrode 审中-公开
    等离子室电极的相位调制RF功率

    公开(公告)号：US20110192349A1

    公开(公告)日：2011-08-11

    申请号：US13005526

    申请日：2011-01-12

    申请人： Edward P. Hammond, IV ,  Tsutomu Tanaka ,  Christopher Boitnott ,  Jozef Kudela

    发明人： Edward P. Hammond, IV ,  Tsutomu Tanaka ,  Christopher Boitnott ,  Jozef Kudela

    IPC分类号： C23C16/509

    CPC分类号： H05H1/46 ,  C23C16/509 ,  H01J37/32082 ,  H01J37/32091

    摘要： A plurality of RF power signals have the same RF frequency as a reference RF signal and are coupled to respective RF connection points on an electrode of a plasma chamber. At least three of the RF connection points are not collinear. At least two of the RF power signals have time-varying phase offsets relative to the reference RF signal that are distinct functions of time. Such time-varying phase offsets can produce a spatial distribution of plasma in the plasma chamber having better time-averaged uniformity than the uniformity of the spatial distribution at any instant in time.

    摘要翻译： 多个RF功率信号具有与参考RF信号相同的RF频率，并且耦合到等离子体室的电极上的相应RF连接点。 至少三个RF连接点不共线。 RF功率信号中的至少两个具有相对于参考RF信号的时变相位偏移，该参考RF信号是时间的不同功能。 这种时变相位偏移可以在等离子体室中产生等离子体的空间分布，其具有比在任何时刻的空间分布的均匀性更好的时间均匀度。

    Offset magnet compensation for non-uniform plasma
    3.
    发明授权
    Offset magnet compensation for non-uniform plasma 有权
    用于不均匀等离子体的偏移磁体补偿

    公开(公告)号：US08920613B2

    公开(公告)日：2014-12-30

    申请号：US11669763

    申请日：2007-01-31

    申请人： Christopher Boitnott ,  Keith A. Miller

    发明人： Christopher Boitnott ,  Keith A. Miller

    IPC分类号： C23C14/34 ,  C23C14/35 ,  C23C14/04 ,  H01J37/34

    CPC分类号： C23C14/35 ,  C23C14/046 ,  H01J37/3408 ,  H01J37/3452 ,  H01J37/3458

    摘要： A non-axisymmetric electromagnet coil used in plasma processing in which at least one electromagnet coil is not symmetric with the central axis of the plasma processing chamber with which it is used but is symmetric with an axis offset from the central axis. When placed radially outside of an RF coil, it may reduce the azimuthal asymmetry in the plasma produced by the RF coil. Axisymmetric magnet arrays may include additional axisymmetric electromagnet coils. One axisymmetric coil is advantageously placed radially inside of the non-axisymmetric coil to carry opposed currents. The multiple electromagnet coils may be embedded in a molded encapsulant having a central bore about a central axis providing the axisymmetry of the coils.

    摘要翻译： 用于等离子体处理的非轴对称电磁线圈，其中至少一个电磁线圈与其使用的等离子体处理室的中心轴不对称，但是与轴偏离中心轴对称。 当径向放置在RF线圈外部时，可以减小由RF线圈产生的等离子体的方位不对称性。 轴对称磁体阵列可以包括附加的轴对称电磁体线圈。 一个轴对称线圈有利地放置在非轴对称线圈的内侧以承载相对的电流。 多个电磁体线圈可以嵌入模制的密封剂中，其具有围绕中心轴线的中心孔，从而提供线圈的轴对称性。

    Ring assembly for substrate processing chamber
    4.
    发明申请
    Ring assembly for substrate processing chamber 审中-公开
    基板处理室的环组件

    公开(公告)号：US20070283884A1

    公开(公告)日：2007-12-13

    申请号：US11444175

    申请日：2006-05-30

    申请人： Jennifer Tiller ,  Allen K. Lau ,  Marc O'Donnell Schweitzer ,  Steven V. Sansoni ,  Keith A. Miller ,  Christopher Boitnott

    发明人： Jennifer Tiller ,  Allen K. Lau ,  Marc O'Donnell Schweitzer ,  Steven V. Sansoni ,  Keith A. Miller ,  Christopher Boitnott

    IPC分类号： C23C16/00 ,  C23F1/00

    CPC分类号： C23C14/564 ,  H01J37/32623 ,  H01J37/32642 ,  H01L21/68735

    摘要： A ring assembly is provided for a substrate support used in a substrate processing chamber, the substrate support comprising an annular ledge and an inner perimeter sidewall. In one version, the ring assembly comprises (i) an L-shaped isolator ring comprising a horizontal leg resting on the annular ledge of the support, and a vertical leg abutting the inner perimeter sidewall of the support, and (ii) a deposition ring comprising an annular band having an overlap ledge that overlaps the horizontal leg of the isolator ring. In another version, the deposition ring comprises a dielectric annular band that surrounds and overlaps the annular ledge of the support, and a bracket and fastener.

    摘要翻译： 提供了用于衬底处理室中的衬底支撑件的环组件，衬底支撑件包括环形凸缘和内周边侧壁。 在一个版本中，环组件包括（i）包括搁置在支撑件的环形凸缘上的水平腿的L形隔离器环和邻接支撑件的内周侧壁的垂直腿，以及（ii）沉积环 包括具有与隔离环的水平支腿重叠的重叠壁架的环形带。 在另一个版本中，沉积环包括围绕和重叠支撑件的环形凸缘的电介质环形带，以及支架和紧固件。