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公开(公告)号：US07675606B2
公开(公告)日：2010-03-09
申请号：US11418453
申请日：2006-05-05
申请人： Enno Van Den Brink , Henricus Wilhelmus Maria Van Buel , Joseph Consolini , Gerardus Johannes Joseph Keijsers , Klaus Simon , Johannes Theodoor De Smit , Richard Joseph Travers , Maurice Anton Jaques Teuwen , Arnout Johannes Meester , Frederick William Hafner , Vinyu Greenlee , Hubertus Antonius Marinus Baijens
发明人： Enno Van Den Brink , Henricus Wilhelmus Maria Van Buel , Joseph Consolini , Gerardus Johannes Joseph Keijsers , Klaus Simon , Johannes Theodoor De Smit , Richard Joseph Travers , Maurice Anton Jaques Teuwen , Arnout Johannes Meester , Frederick William Hafner , Vinyu Greenlee , Hubertus Antonius Marinus Baijens
CPC分类号： G03F7/70691
摘要： According to one of the aspects of the present invention there is provided a substrate carrier arranged to hold a substrate in position using a vacuum, the vacuum being established in a sealed space created between the substrate carrier and the substrate.
摘要翻译： 根据本发明的一个方面，提供了一种用于使用真空将衬底保持在适当位置的衬底载体，真空建立在衬底载体和衬底之间形成的密封空间中。
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公开(公告)号：US07570342B2
公开(公告)日：2009-08-04
申请号：US11294348
申请日：2005-12-06
申请人： Klaus Simon , Enno Van Den Brink , Gerardus Johannes Joseph Keijsers , Adrianus Hubertus Henricus Van Dijk , Hubertus Antonius Marinus Baijens
发明人： Klaus Simon , Enno Van Den Brink , Gerardus Johannes Joseph Keijsers , Adrianus Hubertus Henricus Van Dijk , Hubertus Antonius Marinus Baijens
CPC分类号： G03F7/70933
摘要： An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for removing gas from an area between the projection system and the substrate.
摘要翻译： 曝光装置设置有用于从投影系统和基板之间的区域去除气体的辐射源，图案形成结构，投影系统，基板和气体冲洗系统。
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公开(公告)号：US07562686B2
公开(公告)日：2009-07-21
申请号：US11317241
申请日：2005-12-27
申请人： Keith Frank Best , Geoffrey Norman Phillipps , Franciscus Godefridus Casper Bijnen , Enno Van Den Brink , Henricus Wilhelmus Maria Van Buel , Joseph J. Consolini , Peter Ten Berge
发明人： Keith Frank Best , Geoffrey Norman Phillipps , Franciscus Godefridus Casper Bijnen , Enno Van Den Brink , Henricus Wilhelmus Maria Van Buel , Joseph J. Consolini , Peter Ten Berge
CPC分类号： H01L25/50 , B81C3/001 , G03F9/7084 , H01L24/26 , H01L24/83 , H01L2224/8385 , H01L2924/01005 , H01L2924/01006 , H01L2924/0102 , H01L2924/01023 , H01L2924/01027 , H01L2924/01033 , H01L2924/01041 , H01L2924/01061 , H01L2924/01074 , H01L2924/01076 , H01L2924/01082 , H01L2924/01087 , H01L2924/07802 , H01L2924/12042 , H01L2924/14 , H01L2924/19041 , H01L2924/30105 , H01L2924/00
摘要： A substrate bonding system has a first and a second substrate table for holding a first substrate and a second substrate, respectively, and a controller. The first substrate includes a first device having first contact pads and the second substrate a second device having second contact pads. The wafer bonding system is arranged to bond the first and second device in such a way that a circuit may be formed by the first and second device. The first and second substrate tables each include a position sensor arranged to measure an optical signal generated on an alignment marker of the first and second substrate, respectively. The first and second substrate tables include a first and second actuator respectively that is arranged to alter a position and orientation of the respective substrate table.
摘要翻译： 基板接合系统具有用于分别保持第一基板和第二基板的第一和第二基板台，以及控制器。 第一衬底包括具有第一接触焊盘的第一器件，而第二衬底具有第二接触焊盘的第二器件。 晶片接合系统布置成以第一和第二器件形成电路的方式结合第一和第二器件。 第一和第二衬底台各自包括位置传感器，其布置成分别测量在第一和第二衬底的对准标记上产生的光信号。 第一和第二衬底台包括分别设置成改变相应衬底台的位置和取向的第一和第二致动器。
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公开(公告)号：US20060146300A1
公开(公告)日：2006-07-06
申请号：US11294348
申请日：2005-12-06
IPC分类号： G03B27/52
CPC分类号： G03F7/70933
摘要： An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for removing gas from an area between the projection system and the substrate.
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公开(公告)号：US07567340B2
公开(公告)日：2009-07-28
申请号：US11529732
申请日：2006-09-29
CPC分类号： G03F7/70333 , G03F7/703
摘要： A device manufacturing method is disclosed that includes providing a substrate on a substrate table, the substrate having a target region comprising a plurality of generally planar surfaces, each surface having a different height relative to the substrate table, determining the relative heights of each generally planar surface, projecting a patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of one of the generally planar surfaces, moving the substrate table in a direction substantially parallel to the axis of the beam, and projecting the patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of another of the generally planar surfaces.
摘要翻译： 公开了一种器件制造方法，其包括在衬底台上提供衬底，所述衬底具有包括多个大体上平坦的表面的目标区域，每个表面相对于衬底台具有不同的高度，确定每个大致平面的相对高度 将图案化的辐射束投影到基板的目标区域上，使得光束的焦平面基本上与大体上平坦的表面之一的平面重合，使基板台沿基本上平行于基板平面的方向移动 并且将所述图案化的辐射束投影到所述基板的目标区域上，使得所述光束的焦平面基本上与所述大体上平坦的表面中的另一个的平面重合。
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公开(公告)号：US20080085462A1
公开(公告)日：2008-04-10
申请号：US11529732
申请日：2006-09-29
IPC分类号： G03C5/00
CPC分类号： G03F7/70333 , G03F7/703
摘要： A device manufacturing method is disclosed that includes providing a substrate on a substrate table, the substrate having a target region comprising a plurality of generally planar surfaces, each surface having a different height relative to the substrate table, determining the relative heights of each generally planar surface, projecting a patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of one of the generally planar surfaces, moving the substrate table in a direction substantially parallel to the axis of the beam, and projecting the patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of another of the generally planar surfaces.
摘要翻译： 公开了一种器件制造方法，其包括在衬底台上提供衬底，所述衬底具有包括多个大体上平坦的表面的目标区域，每个表面相对于衬底台具有不同的高度，确定每个大致平面的相对高度 将图案化的辐射束投影到基板的目标区域上，使得光束的焦平面基本上与大体上平坦的表面之一的平面重合，使基板台沿基本上平行于基板平面的方向移动 并且将所述图案化的辐射束投影到所述基板的目标区域上，使得所述光束的焦平面基本上与所述大体上平坦的表面中的另一个的平面重合。
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7.发明授权Lithographic apparatus, a device manufacturing method and a device manufactured thereby 有权光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US07844131B2
公开(公告)日：2010-11-30
申请号：US11509073
申请日：2006-08-24
IPC分类号： G06K9/36
CPC分类号： G03F7/70475 , G03F7/70425 , G03F7/70433 , G03F7/70466 , G03F7/70508
摘要： A method of forming images on a lithographic substrate is disclosed, the method including grouping a plurality of image regions together to form a combined image, determining or receiving a location at which the combined image is to be positioned on the substrate, calculating locations at which the image regions forming the combined image are to be positioned on the substrate, and using a lithographic apparatus to project the image regions at the calculated locations onto the substrate.
摘要翻译： 公开了一种在光刻基板上形成图像的方法，该方法包括将多个图像区域组合在一起以形成组合图像，确定或接收组合图像将被放置在基板上的位置，计算位置 形成组合图像的图像区域将被定位在基板上，并且使用光刻设备将计算的位置处的图像区域投影到基板上。
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8.发明申请Lithographic apparatus, a device manufacturing method and a device manufactured thereby 有权光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US20080050040A1
公开(公告)日：2008-02-28
申请号：US11509073
申请日：2006-08-24
CPC分类号： G03F7/70475 , G03F7/70425 , G03F7/70433 , G03F7/70466 , G03F7/70508
摘要： A method of forming images on a lithographic substrate is disclosed, the method including grouping a plurality of image regions together to form a combined image, determining or receiving a location at which the combined image is to be positioned on the substrate, calculating locations at which the image regions forming the combined image are to be positioned on the substrate, and using a lithographic apparatus to project the image regions at the calculated locations onto the substrate.
摘要翻译： 公开了一种在光刻基板上形成图像的方法，该方法包括将多个图像区域组合在一起以形成组合图像，确定或接收组合图像将被放置在基板上的位置，计算位置 形成组合图像的图像区域将被定位在基板上，并且使用光刻设备将计算的位置处的图像区域投影到基板上。
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