公开(公告)号：US08300208B2

公开(公告)日：2012-10-30

申请号：US12616312

申请日：2009-11-11

申请人： Erik Roelof Loopstra ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Adrianus Hendrik Koevoets

发明人： Erik Roelof Loopstra ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Adrianus Hendrik Koevoets

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/709 ,  G03F7/70525 ,  G03F7/70758 ,  G03F7/70766

摘要： Embodiments of the invention provide a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an active air mount to support the projection system, the active air mount including at least one actuator, and a feed-forward device, the feed-forward device being configured to provide on the basis of a set-point signal of a movable object, a feed-forward signal to the at least one actuator, wherein the feed-forward signal is designed to decrease a disturbance effect on the projection system due to movement of the movable object.

摘要翻译： 本发明的实施例提供了一种光刻设备，其包括配置成调节辐射束的照明系统，构造成支撑图案形成装置的图案形成装置支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成 图案化的辐射束，被构造成保持衬底的衬底台，配置成将图案化的辐射束投影到衬底的目标部分上的投影系统，用于支撑投影系统的主动空气支架，主动空气支架包括至少一个 致动器和前馈装置，所述前馈装置被配置为基于可移动物体的设定点信号提供到所述至少一个致动器的前馈信号，其中所述前馈信号 被设计成由于可移动物体的移动而减小对投影系统的干扰效应。

公开(公告)号：US20100149516A1

公开(公告)日：2010-06-17

申请号：US12616312

申请日：2009-11-11

申请人： Erik Roelof LOOPSTRA ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Adrianus Hendrik Koevoets

发明人： Erik Roelof LOOPSTRA ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Adrianus Hendrik Koevoets

IPC分类号： G03B27/58

CPC分类号： G03F7/709 ,  G03F7/70525 ,  G03F7/70758 ,  G03F7/70766

摘要： Embodiments of the invention provide a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an active air mount to support the projection system, the active air mount including at least one actuator, and a feed-forward device, the feed-forward device being configured to provide on the basis of a set-point signal of a movable object, a feed-forward signal to the at least one actuator, wherein the feed-forward signal is designed to decrease a disturbance effect on the projection system due to movement of the movable object.

摘要翻译： 本发明的实施例提供了一种光刻设备，其包括配置成调节辐射束的照明系统，构造成支撑图案形成装置的图案形成装置支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成 图案化的辐射束，被构造成保持衬底的衬底台，配置成将图案化的辐射束投影到衬底的目标部分上的投影系统，用于支撑投影系统的主动空气支架，主动空气支架包括至少一个 致动器和前馈装置，所述前馈装置被配置为基于可移动物体的设定点信号提供到所述至少一个致动器的前馈信号，其中所述前馈信号 被设计成由于可移动物体的移动而减小对投影系统的干扰效应。

公开(公告)号：US09122173B2

公开(公告)日：2015-09-01

申请号：US13398890

申请日：2012-02-17

申请人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

发明人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

IPC分类号： G03B27/58 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/709 ,  G03F7/70758 ,  G03F7/70766

摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.

摘要翻译： 一种定位系统，用于将平台定位在光刻设备的基架内，所述定位系统包括第一和第二致动器以及控制器。 第一执行器在桌子上施加致动力。 第一致动器连接到构造和布置成吸收第一致动器的反作用力的平衡块。 控制器和第二致动器构造和布置成施加补偿力和/或扭矩以补偿由第​​一致动器施加在平衡块上的致动力引起的扭矩。

公开(公告)号：US08144310B2

公开(公告)日：2012-03-27

申请号：US12409919

申请日：2009-03-24

申请人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

发明人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/709 ,  G03F7/70758 ,  G03F7/70766

摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.

摘要翻译： 一种定位系统，用于将平台定位在光刻设备的基架内，所述定位系统包括第一和第二致动器以及控制器。 第一执行器在桌子上施加致动力。 第一致动器连接到构造和布置成吸收第一致动器的反作用力的平衡块。 控制器和第二致动器构造和布置成施加补偿力和/或扭矩以补偿由第​​一致动器施加在平衡块上的致动力引起的扭矩。

公开(公告)号：US08289498B2

公开(公告)日：2012-10-16

申请号：US12483703

申请日：2009-06-12

申请人： Erik Roelof Loopstra ,  Petrus Rutgerus Bartray ,  Leon Martin Levasier ,  Bernardus Antonius Johannes Luttikhuis ,  Josephus Jacobus Smits ,  Anthonie Aantjes ,  Maurice Willem Jozef Etiënne Wijckmans ,  Johannes Bernardus Ridder ,  Andre Schreuder ,  Dennis Jozef Maria Paulussen ,  Peter Gerardus Jonkers ,  Hugues Poincelin ,  Fransiscus Theresia Noel Heusschen

发明人： Erik Roelof Loopstra ,  Petrus Rutgerus Bartray ,  Leon Martin Levasier ,  Bernardus Antonius Johannes Luttikhuis ,  Josephus Jacobus Smits ,  Anthonie Aantjes ,  Maurice Willem Jozef Etiënne Wijckmans ,  Johannes Bernardus Ridder ,  Andre Schreuder ,  Dennis Jozef Maria Paulussen ,  Peter Gerardus Jonkers ,  Hugues Poincelin ,  Fransiscus Theresia Noel Heusschen

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/709 ,  G03F7/70808

摘要： A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.

摘要翻译： 光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。 该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。 中间框架构造成分离第一室和第二室。 该装置包括耦合到第一框架的支撑件。 支撑构造成通过中间框架和第二室中的联接开口支撑第一室。

公开(公告)号：US20110170078A1

公开(公告)日：2011-07-14

申请号：US13061792

申请日：2009-07-17

申请人： Erik Roelof Loopstra ,  Wilhelmus Petrus De Boeij ,  Hans Butler ,  Robertus Johannes Marinus ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Maurice Willem Jozef Etiënne Wijckmans ,  Franciscus Johannes Joseph Janssen

发明人： Erik Roelof Loopstra ,  Wilhelmus Petrus De Boeij ,  Hans Butler ,  Robertus Johannes Marinus ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Maurice Willem Jozef Etiënne Wijckmans ,  Franciscus Johannes Joseph Janssen

IPC分类号： G03B27/54

CPC分类号： G03F7/70891 ,  G03F7/70258 ,  G03F7/70825

摘要： A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.

摘要翻译： 提供了一种投影系统（PS），在一个实施例中包括两个帧。 投影系统的光学元件安装在第一框架（200）上。 使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。 第二测量系统（920）用于测量与第二帧的变形相关联的参数。 由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。 通常，框架的变形是由于共振振荡和热膨胀。 具有两个框架使得投影系统的光学元件能够以高精确度定位。 可选地，可以提供温度控制系统（780,790）以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

公开(公告)号：US09164401B2

公开(公告)日：2015-10-20

申请号：US13061792

申请日：2009-07-17

申请人： Erik Roelof Loopstra ,  Wilhelmus Petrus De Boeij ,  Hans Butler ,  Robertus Johannes Marinus De Jongh ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Maurice Willem Jozef Etiënne Wijckmans ,  Franciscus Johannes Joseph Janssen

发明人： Erik Roelof Loopstra ,  Wilhelmus Petrus De Boeij ,  Hans Butler ,  Robertus Johannes Marinus De Jongh ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Maurice Willem Jozef Etiënne Wijckmans ,  Franciscus Johannes Joseph Janssen

IPC分类号： G03F7/20

CPC分类号： G03F7/70891 ,  G03F7/70258 ,  G03F7/70825

摘要： A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.

摘要翻译： 提供了一种投影系统（PS），在一个实施例中包括两个帧。 投影系统的光学元件安装在第一框架（200）上。 使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。 第二测量系统（920）用于测量与第二帧的变形相关联的参数。 由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。 通常，框架的变形是由于共振振荡和热膨胀。 具有两个框架使得投影系统的光学元件能够以高精确度定位。 可选地，可以提供温度控制系统（780,790）以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

公开(公告)号：US08908144B2

公开(公告)日：2014-12-09

申请号：US11527729

申请日：2006-09-27

申请人： Rogier Herman Mathijs Groeneveld ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bastiaan Stephanus Hendricus Jansen ,  Robertus Johannes Marinus De Jongh ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans

发明人： Rogier Herman Mathijs Groeneveld ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bastiaan Stephanus Hendricus Jansen ,  Robertus Johannes Marinus De Jongh ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/709 ,  G03F7/70833

摘要： A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.

摘要翻译： 公开了一种光刻设备，其包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，以及构造成保持衬底的衬底台。 此外，光刻设备包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上，投影系统通过弹性安装件安装到光刻设备的参考元件，以减少高频振动从 投影系统的参考元件和用于抵消衬底台和支撑件相对于投影系统的位置误差的控制系统。