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公开(公告)号:US08289498B2
公开(公告)日:2012-10-16
申请号:US12483703
申请日:2009-06-12
申请人: Erik Roelof Loopstra , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etiënne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
发明人: Erik Roelof Loopstra , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etiënne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
CPC分类号: G03F7/709 , G03F7/70808
摘要: A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
摘要翻译: 光刻设备包括:投影系统,被配置为将图像投影到基板上;衬底台,其被配置为支撑所述基板;第一室,其至少部分地围绕所述投影系统;以及第二室,其至少部分地围绕所述基板台; 第一帧。 该装置包括被配置为支撑第二室的基座框架,以及耦合到该底座框架的中间框架。 中间框架构造成分离第一室和第二室。 该装置包括耦合到第一框架的支撑件。 支撑构造成通过中间框架和第二室中的联接开口支撑第一室。
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公开(公告)号:US20100002207A1
公开(公告)日:2010-01-07
申请号:US12483703
申请日:2009-06-12
申请人: Erik Roelof LOOPSTRA , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etienne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
发明人: Erik Roelof LOOPSTRA , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etienne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
IPC分类号: G03B27/52
CPC分类号: G03F7/709 , G03F7/70808
摘要: A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
摘要翻译: 光刻设备包括:投影系统,被配置为将图像投影到基板上;衬底台,其被配置为支撑所述基板;第一室,其至少部分地围绕所述投影系统;以及第二室,其至少部分地围绕所述基板台; 第一帧。 该装置包括被配置为支撑第二室的基座框架,以及耦合到该底座框架的中间框架。 中间框架构造成分离第一室和第二室。 该装置包括耦合到第一框架的支撑件。 支撑构造成通过中间框架和第二室中的联接开口支撑第一室。
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公开(公告)号:US07767989B2
公开(公告)日:2010-08-03
申请号:US11527728
申请日:2006-09-27
申请人: Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Harm-Jan Voorma , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Carolus Ida Maria Antonius Spee , Klaas Timmer , Johannes Bernardus Ridder
发明人: Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Harm-Jan Voorma , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Carolus Ida Maria Antonius Spee , Klaas Timmer , Johannes Bernardus Ridder
IPC分类号: G03B7/20
CPC分类号: G03B7/20 , B08B7/00 , G01J1/0271 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G03F7/70975
摘要: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
摘要翻译: 提供了一种具有辐射收集器,盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁,这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件:设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口,其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。
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公开(公告)号:US08598550B2
公开(公告)日:2013-12-03
申请号:US13365758
申请日:2012-02-03
申请人: Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Johannes Bernardus Ridder , Harm-Jan Voorma , Carolus Ida Maria Antonius Spee , Klaas Timmer
发明人: Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Johannes Bernardus Ridder , Harm-Jan Voorma , Carolus Ida Maria Antonius Spee , Klaas Timmer
IPC分类号: G03B7/20
CPC分类号: G03B7/20 , B08B7/00 , G01J1/0271 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G03F7/70975
摘要: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
摘要翻译: 提供了一种具有辐射收集器,盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁,这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件:设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口,其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。
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公开(公告)号:US20100290015A1
公开(公告)日:2010-11-18
申请号:US12821033
申请日:2010-06-22
申请人: Vadim Yevgenyevich BANINE , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Harm-Jan Voorma , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Carolus Ida Maria Antonius Spee , Klaas Timmer , Johannes Bernardus Ridder
发明人: Vadim Yevgenyevich BANINE , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Harm-Jan Voorma , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Carolus Ida Maria Antonius Spee , Klaas Timmer , Johannes Bernardus Ridder
CPC分类号: G03B7/20 , B08B7/00 , G01J1/0271 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G03F7/70975
摘要: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
摘要翻译: 提供了一种具有辐射收集器,盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁,这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件:设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口,其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。
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公开(公告)号:US20120140196A1
公开(公告)日:2012-06-07
申请号:US13365758
申请日:2012-02-03
申请人: Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Harm-Jan Voorma , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Carolus Ida Maria Antonius Spee , Klaas Timmer , Johannes Bernardus Ridder
发明人: Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Harm-Jan Voorma , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Carolus Ida Maria Antonius Spee , Klaas Timmer , Johannes Bernardus Ridder
CPC分类号: G03B7/20 , B08B7/00 , G01J1/0271 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G03F7/70975
摘要: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
摘要翻译: 提供了一种具有辐射收集器,盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁,这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件:设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口,其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。
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公开(公告)号:US08134136B2
公开(公告)日:2012-03-13
申请号:US12821033
申请日:2010-06-22
申请人: Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Johannes Bernardus Ridder , Harm-Jan Voorma , Carolus Ida Maria Antonius Spee , Klaas Timmer
发明人: Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Johannes Bernardus Ridder , Harm-Jan Voorma , Carolus Ida Maria Antonius Spee , Klaas Timmer
IPC分类号: G03B7/20
CPC分类号: G03B7/20 , B08B7/00 , G01J1/0271 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G03F7/70975
摘要: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
摘要翻译: 提供了一种具有辐射收集器,盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁,这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件:设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口,其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。
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公开(公告)号:US07372058B2
公开(公告)日:2008-05-13
申请号:US11235547
申请日:2005-09-27
申请人: Vadim Yevgenyevich Banine , Lambertus Adrianus Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Johannes Bernardus Ridder , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits
发明人: Vadim Yevgenyevich Banine , Lambertus Adrianus Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Johannes Bernardus Ridder , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits
IPC分类号: G03B7/20
CPC分类号: G03B7/20 , B08B7/00 , G01J1/0271 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G03F7/70975
摘要: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
摘要翻译: 提供了一种具有辐射收集器,盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁,这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件:设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口,其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。
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