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公开(公告)号：US08706442B2
公开(公告)日：2014-04-22
申请号：US13000443
申请日：2009-07-03
申请人： Everhardus Cornelis Mos , Henricus Johannes Lambertus Megens , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons , Scott Anderson Middlebrooks
发明人： Everhardus Cornelis Mos , Henricus Johannes Lambertus Megens , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons , Scott Anderson Middlebrooks
CPC分类号： G03F9/7003 , G03F7/705 , G03F7/70633
摘要： A lithographic system includes a lithographic apparatus comprising a projection system which projects a patterned radiation beam onto a target portion of a substrate and an alignment system which measures the position of a feature of the pattern on the substrate at a number of locations over the substrate. A controller compares the measured positions with points on a grid of values and extrapolates values for intermediate positions on the substrate based on values of corresponding intermediate points on the grid, so as to provide an indication of the intermediate positions on the substrate and their displacements relative to the grid. The grid is based on at least one orthogonal basis function, the measurement on the substrate being performed at positions corresponding to the root values of the at least one orthogonal basis function.
摘要翻译： 光刻系统包括光刻设备，其包括投影系统，该投影系统将图案化的辐射束投影到基板的目标部分上;以及对准系统，该对准系统在衬底上的多个位置处测量衬底上的图案的特征的位置。 控制器将测量位置与值网格上的点进行比较，并基于栅格上对应的中间点的值来外推基板上的中间位置的值，以便提供基板上的中间位置及其相对位移的指示 到电网。 网格基于至少一个正交基函数，基板上的测量在对应于至少一个正交基函数的根值的位置处执行。
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2.发明授权Lithographic apparatus, device manufacturing method and device for correcting overlay errors between overlapping patterns 有权平版印刷设备，装置制造方法和用于校正重叠图案之间的重叠误差的装置公开(公告)号：US08248579B2
公开(公告)日：2012-08-21
申请号：US11948801
申请日：2007-11-30
IPC分类号： G03B27/68
CPC分类号： G03F7/70725 , G03F7/70258 , G03F7/70358 , G03F7/70458 , G03F7/70525 , G03F7/70633 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support for a patterning device, a substrate table for a substrate, a projection system, and a control system. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The projection system is configured to project the patterned radiation beam as an image onto a target portion of the substrate along a scan path. The scan path is defined by a trajectory in a scanning direction of an exposure field of the lithographic apparatus. The control system is coupled to the support, the substrate table and the projection system for controlling an action of the support, the substrate table and the projection system, respectively. The control system is configured to correct a local distortion of the image in a region along the scan path by a temporal adjustment of the image in that region.
摘要翻译： 光刻设备包括配置成调节辐射束的照明系统，图案形成装置的支撑件，用于衬底的衬底台，投影系统和控制系统。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 投影系统被配置为沿着扫描路径将图案化的辐射束作为图像投影到基板的目标部分上。 扫描路径由光刻设备的曝光场的扫描方向上的轨迹限定。 控制系统耦合到支撑件，基板台和投影系统，用于分别控制支撑件，基板台和投影系统的作用。 控制系统被配置为通过在该区域中的图像的时间调整来校正沿着扫描路径的区域中的图像的局部失真。
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公开(公告)号：US20080165332A1
公开(公告)日：2008-07-10
申请号：US11948801
申请日：2007-11-30
IPC分类号： G03B27/68
CPC分类号： G03F7/70725 , G03F7/70258 , G03F7/70358 , G03F7/70458 , G03F7/70525 , G03F7/70633 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support for a patterning device, a substrate table for a substrate, a projection system, and a control system. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The projection system is configured to project the patterned radiation beam as an image onto a target portion of the substrate along a scan path. The scan path is defined by a trajectory in a scanning direction of an exposure field of the lithographic apparatus. The control system is coupled to the support, the substrate table and the projection system for controlling an action of the support, the substrate table and the projection system, respectively. The control system is configured to correct a local distortion of the image in a region along the scan path by a temporal adjustment of the image in that region.
摘要翻译： 光刻设备包括配置成调节辐射束的照明系统，图案形成装置的支撑件，用于衬底的衬底台，投影系统和控制系统。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 投影系统被配置为沿着扫描路径将图案化的辐射束作为图像投影到基板的目标部分上。 扫描路径由光刻设备的曝光场的扫描方向上的轨迹限定。 控制系统耦合到支撑件，基板台和投影系统，用于分别控制支撑件，基板台和投影系统的作用。 控制系统被配置为通过在该区域中的图像的时间调整来校正沿着扫描路径的区域中的图像的局部失真。
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4.发明授权Process, apparatus, and device for determining intra-field correction to correct overlay errors between overlapping patterns 有权用于确定场内校正以校正重叠图案之间的重叠误差的过程，装置和设备公开(公告)号：US08237914B2
公开(公告)日：2012-08-07
申请号：US12516909
申请日：2007-12-03
IPC分类号： G03B27/68
CPC分类号： G03F7/70725 , G03F7/70258 , G03F7/70358 , G03F7/70458 , G03F7/70525 , G03F7/70633 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support for a patterning device, a substrate table for a substrate, a projection system, and a control system. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The projection system is configured to project the patterned radiation beam as an image onto a target portion of the substrate along a scan path. The scan path is defined by a trajectory in a scanning direction of an exposure field of the lithographic apparatus. The control system is coupled to the support, the substrate table and the projection system for controlling an action of the support, the substrate table and the projection system, respectively. The control system is configured to correct a local distortion of the image in a region along the scan path by a temporal adjustment of the image in that region, hereby reducing the intra-field overlay errors.
摘要翻译： 光刻设备包括配置成调节辐射束的照明系统，图案形成装置的支撑件，用于衬底的衬底台，投影系统和控制系统。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 投影系统被配置为沿着扫描路径将图案化的辐射束作为图像投影到基板的目标部分上。 扫描路径由光刻设备的曝光场的扫描方向上的轨迹限定。 控制系统耦合到支撑件，基板台和投影系统，用于分别控制支撑件，基板台和投影系统的作用。 控制系统被配置为通过在该区域中的图像的时间调整来校正沿着扫描路径的区域中的图像的局部失真，从而减少了场内重叠误差。
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公开(公告)号：US20080128642A1
公开(公告)日：2008-06-05
申请号：US11607098
申请日：2006-12-01
IPC分类号： G21K5/00
CPC分类号： G03F7/70725 , G03F7/70258 , G03F7/70358 , G03F7/70458 , G03F7/70525 , G03F7/70633 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support for a patterning device, a substrate table for a substrate, a projection system, and a control system. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The projection system is configured to project the patterned radiation beam as an image onto a target portion of the substrate along a scan path. The scan path is defined by a trajectory in a scanning direction of an exposure field of the lithographic apparatus. The control system is coupled to the support, the substrate table and the projection system for controlling an action of the support, the substrate table and the projection system, respectively. The control system is configured to correct a local distortion of the image in a region along the scan path by a temporal adjustment of the image in that region.
摘要翻译： 光刻设备包括配置成调节辐射束的照明系统，图案形成装置的支撑件，用于衬底的衬底台，投影系统和控制系统。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 投影系统被配置为沿着扫描路径将图案化的辐射束作为图像投影到基板的目标部分上。 扫描路径由光刻设备的曝光场的扫描方向的轨迹限定。 控制系统耦合到支撑件，基板台和投影系统，用于分别控制支撑件，基板台和投影系统的作用。 控制系统被配置为通过在该区域中的图像的时间调整来校正沿着扫描路径的区域中的图像的局部失真。
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公开(公告)号：US07683351B2
公开(公告)日：2010-03-23
申请号：US11607098
申请日：2006-12-01
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/70258 , G03F7/70358 , G03F7/70458 , G03F7/70525 , G03F7/70633 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support for a patterning device, a substrate table for a substrate, a projection system, and a control system. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The projection system is configured to project the patterned radiation beam as an image onto a target portion of the substrate along a scan path. The scan path is defined by a trajectory in a scanning direction of an exposure field of the lithographic apparatus. The control system is coupled to the support, the substrate table and the projection system for controlling an action of the support, the substrate table and the projection system, respectively. The control system is configured to correct a local distortion of the image in a region along the scan path by a temporal adjustment of the image in that region.
摘要翻译： 光刻设备包括配置成调节辐射束的照明系统，图案形成装置的支撑件，用于衬底的衬底台，投影系统和控制系统。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 投影系统被配置为沿着扫描路径将图案化的辐射束作为图像投影到基板的目标部分上。 扫描路径由光刻设备的曝光场的扫描方向上的轨迹限定。 控制系统耦合到支撑件，基板台和投影系统，用于分别控制支撑件，基板台和投影系统的作用。 控制系统被配置为通过在该区域中的图像的时间调整来校正沿着扫描路径的区域中的图像的局部失真。
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公开(公告)号：US20110196646A1
公开(公告)日：2011-08-11
申请号：US13000443
申请日：2009-07-03
申请人： Everhardus Mos , Henricus Johannes Lamberttus Megens , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons , Scott Anderson Middlebrooks
发明人： Everhardus Mos , Henricus Johannes Lamberttus Megens , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons , Scott Anderson Middlebrooks
CPC分类号： G03F9/7003 , G03F7/705 , G03F7/70633
摘要： A lithographic system includes a lithographic apparatus comprising a projection system which projects a patterned radiation beam onto a target portion of a substrate and an alignment system which measures the position of a feature of the pattern on the substrate at a number of locations over the substrate. A controller compares the measured positions with points on a grid of values and extrapolates values for intermediate positions on the substrate based on values of corresponding intermediate points on the grid, so as to provide an indication of the intermediate positions on the substrate and their displacements relative to the grid. The grid is based on at least one orthogonal basis function, the measurement on the substrate being performed at positions corresponding to the root values of the at least one orthogonal basis function.
摘要翻译： 光刻系统包括光刻设备，其包括投影系统，该投影系统将图案化的辐射束投影到基板的目标部分上;以及对准系统，该对准系统在衬底上的多个位置处测量衬底上的图案的特征的位置。 控制器将测量位置与值网格上的点进行比较，并基于栅格上对应的中间点的值来外推基板上的中间位置的值，以便提供基板上的中间位置及其相对位移的指示 到电网。 网格基于至少一个正交基函数，基板上的测量在对应于至少一个正交基函数的根值的位置处执行。
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公开(公告)号：US09632430B2
公开(公告)日：2017-04-25
申请号：US13120495
申请日：2009-09-17
CPC分类号： G03F7/70625 , G03F7/70525
摘要： A lithographic system includes a lithographic apparatus and a scatterometer. In an embodiment, the lithographic apparatus includes an illumination optical system arranged to illuminate a pattern and a projection optical system arranged to project an image of the pattern on to a substrate. In an embodiment, the scatterometer includes a measurement system arranged to direct a beam of radiation onto a target pattern on said substrate and to obtain an image of a pupil plane representative of radiation scattered from the target pattern. A computational arrangement represents the pupil plane by moment functions calculated from a pair of orthogonal basis function and correlates the moment function to lithographic feature parameters to build a lithographic system identification. A control arrangement uses the system identification to control subsequent lithographic processes performed by the lithographic apparatus.
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9.发明申请公开(公告)号：US20110299050A1
公开(公告)日：2011-12-08
申请号：US13120495
申请日：2009-09-17
IPC分类号： G03B27/54
CPC分类号： G03F7/70625 , G03F7/70525
摘要： A lithographic system includes a lithographic apparatus and a scatterometer. In an embodiment, the lithographic apparatus includes an illumination optical system arranged to illuminate a pattern and a projection optical system arranged to project an image of the pattern on to a substrate. In an embodiment, the scatterometer includes a measurement system arranged to direct a beam of radiation onto a target pattern on said substrate and to obtain an image of a pupil plane representative of radiation scattered from the target pattern. A computational arrangement represents the pupil plane by moment functions calculated from a pair of orthogonal basis function and correlates the moment function to lithographic feature parameters to build a lithographic system identification. A control arrangement uses the system identification to control subsequent lithographic processes performed by the lithographic apparatus.
摘要翻译： 光刻系统包括光刻设备和散射仪。 在一个实施例中，光刻设备包括布置成照亮图案的照明光学系统和布置成将图案的图像投影到基板上的投影光学系统。 在一个实施例中，散射仪包括测量系统，其布置成将辐射束引导到所述基板上的目标图案上，并且获得代表从目标图案散射的辐射的光瞳平面的图像。 计算装置表示由一对正交基函数计算的瞳面平面，并将力矩函数与光刻特征参数相关联以构建光刻系统识别。 控制装置使用系统识别来控制由光刻设备执行的后续光刻处理。
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10.发明授权Method and apparatus for angular-resolved spectroscopic lithography characterization 有权用于角分辨光谱光刻特征的方法和装置公开(公告)号：US07564555B2
公开(公告)日：2009-07-21
申请号：US11504106
申请日：2006-08-15
申请人： Arie Jeffrey Den Boef , Mircea Dusa , Everhardus Cornelis Mos , Maurits Van Der Schaar , Stefan Carolus Jacobus Antonius Keij
发明人： Arie Jeffrey Den Boef , Mircea Dusa , Everhardus Cornelis Mos , Maurits Van Der Schaar , Stefan Carolus Jacobus Antonius Keij
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： An inspection system is arranged to measure an overlay error by projecting a plurality of radiation beams, differing in wavelength and/or polarization, onto two targets. A first radiation beam is projected onto a first target and the reflected radiation A1+ is detected. The first target comprises two gratings having a bias +d with respect to each other. The first radiation beam is also projected on to a second target, which comprises two gratings having a bias −d with respect to each other, and the reflected radiation A1− is detected. A second radiation beam, having a different wavelength and/or polarization from the first radiation beam, is projected onto the first target and reflected radiation A2+ is detected and projected onto the second target and reflected radiation A2− is detected. Detected radiations A1+, A1−, A2+, and A2− is used to determine the overlay error.
摘要翻译： 检查系统被布置成通过将不同波长和/或极化的多个辐射束投影到两个目标上来测量覆盖误差。 将第一辐射束投射到第一靶上并检测反射辐射A1 +。 第一个目标包括两个相对于彼此具有偏压+ d的光栅。 第一辐射束也被投射到第二靶上，第二靶被包括相对于彼此具有偏压-d的两个光栅，并且检测到反射辐射A1-。 具有与第一辐射束不同的波长和/或极化的第二辐射束被投影到第一目标上，并且检测反射辐射A2 +并将其投影到第二目标上，并检测反射辐射A2-。 检测到的辐射A1 +，A1-，A2 +和A2-用于确定覆盖误差。
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