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    Alignment System, Lithographic System and Method
    1.
    发明申请
    Alignment System, Lithographic System and Method 有权
    对准系统，光刻系统和方法

    公开(公告)号：US20110196646A1

    公开(公告)日：2011-08-11

    申请号：US13000443

    申请日：2009-07-03

    申请人： Everhardus Mos ,  Henricus Johannes Lamberttus Megens ,  Maurits Van Der Schaar ,  Hubertus Johannes Gertrudus Simons ,  Scott Anderson Middlebrooks

    发明人： Everhardus Mos ,  Henricus Johannes Lamberttus Megens ,  Maurits Van Der Schaar ,  Hubertus Johannes Gertrudus Simons ,  Scott Anderson Middlebrooks

    IPC分类号： G06F15/00 ,  G03B27/54

    CPC分类号： G03F9/7003 ,  G03F7/705 ,  G03F7/70633

    摘要： A lithographic system includes a lithographic apparatus comprising a projection system which projects a patterned radiation beam onto a target portion of a substrate and an alignment system which measures the position of a feature of the pattern on the substrate at a number of locations over the substrate. A controller compares the measured positions with points on a grid of values and extrapolates values for intermediate positions on the substrate based on values of corresponding intermediate points on the grid, so as to provide an indication of the intermediate positions on the substrate and their displacements relative to the grid. The grid is based on at least one orthogonal basis function, the measurement on the substrate being performed at positions corresponding to the root values of the at least one orthogonal basis function.

    摘要翻译： 光刻系统包括光刻设备，其包括投影系统，该投影系统将图案化的辐射束投影到基板的目标部分上;以及对准系统，该对准系统在衬底上的多个位置处测量衬底上的图案的特征的位置。 控制器将测量位置与值网格上的点进行比较，并基于栅格上对应的中间点的值来外推基板上的中间位置的值，以便提供基板上的中间位置及其相对位移的指示 到电网。 网格基于至少一个正交基函数，基板上的测量在对应于至少一个正交基函数的根值的位置处执行。

    Lithographic apparatus and device manufacturing method using overlay measurement
    4.
    发明申请
    Lithographic apparatus and device manufacturing method using overlay measurement 有权
    平版印刷设备和使用重叠测量的设备制造方法

    公开(公告)号：US20070229785A1

    公开(公告)日：2007-10-04

    申请号：US11390416

    申请日：2006-03-28

    申请人： Arie Den Boef ,  Everhardus Mos ,  Maurits Schaar ,  Stefan Carolus Keij

    发明人： Arie Den Boef ,  Everhardus Mos ,  Maurits Schaar ,  Stefan Carolus Keij

    IPC分类号： G03B27/68

    CPC分类号： G03B27/42 ,  G03F7/70633

    摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes a reference set of gratings provided in the substrate, the reference set including two reference gratings having line elements in a first direction and one reference grating having line elements in a second, perpendicular, direction. A measurement set of gratings is provided on top of the reference set of gratings, the measurement set comprising three measurement gratings similar to the reference gratings. Two of the measurement gratings are oppositely biased in the second direction relative to the respective reference gratings. An overlay measurement device is provided to measure asymmetry of the three gratings in the reference set and the measurement set, and to derive from the measured asymmetry the overlay in both the first and second direction.

    摘要翻译： 布置成将图案从图案形成装置转印到衬底上的光刻设备包括设置在衬底中的参考光栅组，该参考组包括在第一方向上具有线元件的两个参考光栅和在第二方向上具有线元件的一个参考光栅 ，垂直，方向。 光栅的测量组提供在参考光栅组的顶部，测量组包括与参考光栅相似的三个测量光栅。 两个测量光栅相对于各个参考光栅在第二方向上相反地偏置。 提供覆盖测量装置以测量参考组和测量组中的三个光栅的不对称性，并且从第一和第二方向上的测量的不对称性导出覆盖。

    Lithographic apparatus and device manufacturing method
    5.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20070233305A1

    公开(公告)日：2007-10-04

    申请号：US11396912

    申请日：2006-04-04

    申请人： Roy Werkman ,  Everhardus Mos

    发明人： Roy Werkman ,  Everhardus Mos

    IPC分类号： G06F19/00

    CPC分类号： G03F7/70633 ,  G03F9/7092

    摘要： Correcting for misalignment of a substrate before it is exposed is performed using offset corrections and process corrections that are calculated based on alignment offset measurements of alignment marks and overlay measurements of overlay targets on substrates in previous batches.

    摘要翻译： 使用基于对准标记的对准偏移测量和先前批次中的基板上的覆盖目标的覆盖测量计算的偏移校正和过程校正来进行基板暴露之前的未对准的校正。

    Lithographic apparatus and device manufacturing method using overlay measurement quality indication
    6.
    发明申请
    Lithographic apparatus and device manufacturing method using overlay measurement quality indication 有权
    平版印刷设备和设备制造方法使用覆盖测量质量指示

    公开(公告)号：US20070229837A1

    公开(公告)日：2007-10-04

    申请号：US11391690

    申请日：2006-03-29

    申请人： Maurits Schaar ,  Arie Den Boef ,  Everhardus Mos ,  Stefan Antonius Keij

    发明人： Maurits Schaar ,  Arie Den Boef ,  Everhardus Mos ,  Stefan Antonius Keij

    IPC分类号： G01B9/02

    CPC分类号： G03F7/70633 ,  G03F7/70483

    摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes two reference gratings provided in the substrate and two measurement gratings on top of the reference gratings, the measurement gratings being similar to the reference gratings, and oppositely biased in a single direction relative to the respective reference gratings. An overlay measurement device with an image sensor is used for obtaining pixel data of a measurement spot in each of the two measurement gratings. Asymmetry for each pixel in the measurement spot is measured, and from the pixel asymmetry measurements in associated pixels of each of the two measurement gratings an overlay value and a process dependent value is determined, as well as a quality indicator for the overlay value and the process dependent value.

    摘要翻译： 布置成将图案从图案形成装置转移到基板上的光刻设备包括设置在基板中的两个参考光栅和在参考光栅顶部的两个测量光栅，测量光栅类似于参考光栅，并且相反地偏置在单个 相对于各个参考光栅的方向。 使用具有图像传感器的覆盖测量装置来获得两个测量光栅中的每一个中的测量点的像素数据。 测量测量点中每个像素的不对称性，并且从两个测量光栅中的每一个的相关像素中的像素不对称测量结果确定覆盖值和过程相关值，以及重叠值的质量指示符和 过程依赖值。