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    Alignment System, Lithographic System and Method
    1.
    发明申请
    Alignment System, Lithographic System and Method 有权
    对准系统，光刻系统和方法

    公开(公告)号：US20110196646A1

    公开(公告)日：2011-08-11

    申请号：US13000443

    申请日：2009-07-03

    申请人： Everhardus Mos ,  Henricus Johannes Lamberttus Megens ,  Maurits Van Der Schaar ,  Hubertus Johannes Gertrudus Simons ,  Scott Anderson Middlebrooks

    发明人： Everhardus Mos ,  Henricus Johannes Lamberttus Megens ,  Maurits Van Der Schaar ,  Hubertus Johannes Gertrudus Simons ,  Scott Anderson Middlebrooks

    IPC分类号： G06F15/00 ,  G03B27/54

    CPC分类号： G03F9/7003 ,  G03F7/705 ,  G03F7/70633

    摘要： A lithographic system includes a lithographic apparatus comprising a projection system which projects a patterned radiation beam onto a target portion of a substrate and an alignment system which measures the position of a feature of the pattern on the substrate at a number of locations over the substrate. A controller compares the measured positions with points on a grid of values and extrapolates values for intermediate positions on the substrate based on values of corresponding intermediate points on the grid, so as to provide an indication of the intermediate positions on the substrate and their displacements relative to the grid. The grid is based on at least one orthogonal basis function, the measurement on the substrate being performed at positions corresponding to the root values of the at least one orthogonal basis function.

    摘要翻译： 光刻系统包括光刻设备，其包括投影系统，该投影系统将图案化的辐射束投影到基板的目标部分上;以及对准系统，该对准系统在衬底上的多个位置处测量衬底上的图案的特征的位置。 控制器将测量位置与值网格上的点进行比较，并基于栅格上对应的中间点的值来外推基板上的中间位置的值，以便提供基板上的中间位置及其相对位移的指示 到电网。 网格基于至少一个正交基函数，基板上的测量在对应于至少一个正交基函数的根值的位置处执行。

    Alignment system, lithographic system and method
    2.
    发明授权
    Alignment system, lithographic system and method 有权
    对准系统，光刻系统和方法

    公开(公告)号：US08706442B2

    公开(公告)日：2014-04-22

    申请号：US13000443

    申请日：2009-07-03

    申请人： Everhardus Cornelis Mos ,  Henricus Johannes Lambertus Megens ,  Maurits Van Der Schaar ,  Hubertus Johannes Gertrudus Simons ,  Scott Anderson Middlebrooks

    发明人： Everhardus Cornelis Mos ,  Henricus Johannes Lambertus Megens ,  Maurits Van Der Schaar ,  Hubertus Johannes Gertrudus Simons ,  Scott Anderson Middlebrooks

    IPC分类号： G06F15/00 ,  G03B27/54

    CPC分类号： G03F9/7003 ,  G03F7/705 ,  G03F7/70633

    摘要： A lithographic system includes a lithographic apparatus comprising a projection system which projects a patterned radiation beam onto a target portion of a substrate and an alignment system which measures the position of a feature of the pattern on the substrate at a number of locations over the substrate. A controller compares the measured positions with points on a grid of values and extrapolates values for intermediate positions on the substrate based on values of corresponding intermediate points on the grid, so as to provide an indication of the intermediate positions on the substrate and their displacements relative to the grid. The grid is based on at least one orthogonal basis function, the measurement on the substrate being performed at positions corresponding to the root values of the at least one orthogonal basis function.

    摘要翻译： 光刻系统包括光刻设备，其包括投影系统，该投影系统将图案化的辐射束投影到基板的目标部分上;以及对准系统，该对准系统在衬底上的多个位置处测量衬底上的图案的特征的位置。 控制器将测量位置与值网格上的点进行比较，并基于栅格上对应的中间点的值来外推基板上的中间位置的值，以便提供基板上的中间位置及其相对位移的指示 到电网。 网格基于至少一个正交基函数，基板上的测量在对应于至少一个正交基函数的根值的位置处执行。

    Lithographic system, lithographic method and device manufacturing method
    6.
    发明授权
    Lithographic system, lithographic method and device manufacturing method 有权

    公开(公告)号：US09632430B2

    公开(公告)日：2017-04-25

    申请号：US13120495

    申请日：2009-09-17

    申请人： Everhardus Cornelis Mos ,  Maurits Van Der Schaar ,  Scott Anderson Middlebrooks

    发明人： Everhardus Cornelis Mos ,  Maurits Van Der Schaar ,  Scott Anderson Middlebrooks

    IPC分类号： G03B27/52 ,  G03F7/20

    CPC分类号： G03F7/70625 ,  G03F7/70525

    摘要： A lithographic system includes a lithographic apparatus and a scatterometer. In an embodiment, the lithographic apparatus includes an illumination optical system arranged to illuminate a pattern and a projection optical system arranged to project an image of the pattern on to a substrate. In an embodiment, the scatterometer includes a measurement system arranged to direct a beam of radiation onto a target pattern on said substrate and to obtain an image of a pupil plane representative of radiation scattered from the target pattern. A computational arrangement represents the pupil plane by moment functions calculated from a pair of orthogonal basis function and correlates the moment function to lithographic feature parameters to build a lithographic system identification. A control arrangement uses the system identification to control subsequent lithographic processes performed by the lithographic apparatus.

    Inspection method and apparatus, and corresponding lithographic apparatus
    7.
    发明授权
    Inspection method and apparatus, and corresponding lithographic apparatus 有权
    检验方法和装置，以及相应的光刻设备

    公开(公告)号：US08749786B2

    公开(公告)日：2014-06-10

    申请号：US12902341

    申请日：2010-10-12

    申请人： Andreas Fuchs ,  Maurits Van Der Schaar ,  Scott Anderson Middlebrooks ,  Panagiotis Pieter Bintevinos

    发明人： Andreas Fuchs ,  Maurits Van Der Schaar ,  Scott Anderson Middlebrooks ,  Panagiotis Pieter Bintevinos

    IPC分类号： G01B11/00

    CPC分类号： G03F7/70633 ,  G01N21/956

    摘要： A method and associated apparatus determine an overlay error on a substrate. A beam is projected onto three or more targets. Each target includes first and second overlapping patterns with predetermined overlay offsets on the substrate. The asymmetry of the radiation reflected from each target on the substrate is measured. The overlay error not resultant from the predetermined overlay offsets is determined. The function that enables calculation of overlay from asymmetry for other points on the wafer is determined by limiting the effect of linearity error when determining the overlay error from the function.

    摘要翻译： 方法和相关设备确定衬底上的覆盖误差。 光束投影到三个或更多个目标上。 每个目标包括在衬底上具有预定覆盖偏移的第一和第二重叠图案。 测量从基板上的每个目标反射的辐射的不对称性。 确定不是从预定的覆盖偏移产生的覆盖误差。 通过限制从功能确定覆盖误差时线性误差的影响，可以确定能够计算晶片上其他点不对称的叠加的功能。

    Lithographic System, Lithographic Method And Device Manufacturing Method
    8.
    发明申请
    Lithographic System, Lithographic Method And Device Manufacturing Method 有权
    平版印刷系统，平版印刷方法和器件制造方法

    公开(公告)号：US20110299050A1

    公开(公告)日：2011-12-08

    申请号：US13120495

    申请日：2009-09-17

    申请人： Everhardus Cornelis Mos ,  Maurits Van Der Schaar ,  Scott Anderson Middlebrooks

    发明人： Everhardus Cornelis Mos ,  Maurits Van Der Schaar ,  Scott Anderson Middlebrooks

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70625 ,  G03F7/70525

    摘要： A lithographic system includes a lithographic apparatus and a scatterometer. In an embodiment, the lithographic apparatus includes an illumination optical system arranged to illuminate a pattern and a projection optical system arranged to project an image of the pattern on to a substrate. In an embodiment, the scatterometer includes a measurement system arranged to direct a beam of radiation onto a target pattern on said substrate and to obtain an image of a pupil plane representative of radiation scattered from the target pattern. A computational arrangement represents the pupil plane by moment functions calculated from a pair of orthogonal basis function and correlates the moment function to lithographic feature parameters to build a lithographic system identification. A control arrangement uses the system identification to control subsequent lithographic processes performed by the lithographic apparatus.

    摘要翻译： 光刻系统包括光刻设备和散射仪。 在一个实施例中，光刻设备包括布置成照亮图案的照明光学系统和布置成将图案的图像投影到基板上的投影光学系统。 在一个实施例中，散射仪包括测量系统，其布置成将辐射束引导到所述基板上的目标图案上，并且获得代表从目标图案散射的辐射的光瞳平面的图像。 计算装置表示由一对正交基函数计算的瞳面平面，并将力矩函数与光刻特征参数相关联以构建光刻系统识别。 控制装置使用系统识别来控制由光刻设备执行的后续光刻处理。