PHOTOSENSITIVE COMPOSITION
    10.
    发明申请

    公开(公告)号:US20200341374A1

    公开(公告)日:2020-10-29

    申请号:US16923564

    申请日:2020-07-08

    IPC分类号: G03F7/004 G03F7/00 G03F7/075

    摘要: Provided is a photosensitive composition for pulse exposure including: a coloring material A; a photoinitiator B; and a compound C that is cured by reacting with an active species generated from the photoinitiator B, in which the photoinitiator B includes a photoinitiator b1 that satisfies the following condition 1.Condition 1: after a propylene glycol monomethyl ether acetate solution including 0.035 mmol/L of the photoinitiator b1 is exposed to pulses of light having a wavelength of 355 nm under conditions of maximum instantaneous illuminance: 375000000 W/m2, pulse duration: 8 nanoseconds, and frequency: 10 Hz, a quantum yield q355 is 0.05 or higher.