-
公开(公告)号：US20080248213A1
公开(公告)日：2008-10-09
申请号：US12061010
申请日：2008-04-02
申请人： Robert D. Allen , Mark W. Hart , Frances Houle , Hiroshi Ito
发明人： Robert D. Allen , Mark W. Hart , Frances Houle , Hiroshi Ito
IPC分类号： C08J7/18
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： An imprint process comprising coating a selected surface of a micropatterned template with a release composition having a basic reactive moiety; wherein the template is transparent to UV radiation; imprinting the template onto a photocationically curable composition; curing the UV curable composition to form an imprinted composition, wherein the release composition having a basic reactive moiety is effective to locally inhibit curing of the composition at an interface between the template and the imprinted composition; and releasing the template from the imprinted composition.
摘要翻译： 一种压印方法，包括用具有碱性反应性部分的释放组合物涂布微图案化模板的选定表面; 其中所述模板对UV辐射是透明的; 将模板印刷在光固化组合物上; 固化可UV固化组合物以形成印迹组合物，其中具有碱性反应性部分的释放组合物有效地局部抑制组合物在模板和印迹组合物之间的界面处的固化; 并从印迹组合物释放模板。
-
公开(公告)号：US20070051697A1
公开(公告)日：2007-03-08
申请号：US11219095
申请日：2005-09-02
申请人： Richard DiPietro , Mark Hart , Frances Houle , Hiroshi Ito
发明人： Richard DiPietro , Mark Hart , Frances Houle , Hiroshi Ito
IPC分类号： B44C1/22
CPC分类号： G03F7/0755 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0045
摘要： A method of forming an image. The method includes: a transfer layer on a substrate; forming on the transfer layer, an etch barrier layer; pressing a template having a relief pattern into the etch barrier layer; exposing the etch barrier layer to actinic radiation forming a cured etch barrier layer having thick and thin regions corresponding to the relief pattern; removing the template; removing the thin regions of the cured etch barrier layer; removing regions of the transfer layer not protected by the etch barrier layer; removing regions of the substrate not protected by the transfer layer and any remaining etch barrier layer; and removing remaining transfer layer. The transfer layer may be removed using a solvent, the etch barrier layer may include a release agent and an adhesion layer may be formed between the transfer layer and the etch barrier layer. A reverse tone process is also described.
摘要翻译： 一种形成图像的方法。 该方法包括：在基板上的转印层; 在转印层上形成蚀刻阻挡层; 将具有浮雕图案的模板压入蚀刻阻挡层中; 将蚀刻阻挡层暴露于形成具有对应于浮雕图案的厚和薄区域的固化蚀刻阻挡层的光化辐射; 删除模板; 去除固化的蚀刻阻挡层的薄区域; 除去未被蚀刻阻挡层保护的转移层的区域; 除去未被转移层保护的衬底的区域和任何剩余的蚀刻阻挡层; 并去除剩余的转移层。 可以使用溶剂去除转移层，蚀刻阻挡层可以包括脱模剂，并且可以在转移层和蚀刻阻挡层之间形成粘合层。 还描述了反向色调处理。
-
公开(公告)号：US20080241418A1
公开(公告)日：2008-10-02
申请号：US11694117
申请日：2007-03-30
申请人： Robert D. Allen , Mark W. Hart , Frances Houle , Hiroshi Ito
发明人： Robert D. Allen , Mark W. Hart , Frances Houle , Hiroshi Ito
IPC分类号： B05D3/06
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： An imprint process comprising coating a selected surface of a micropatterned template with a release composition having a basic reactive moiety; wherein the template is transparent to UV radiation; imprinting the template onto a photocationically curable composition; curing the UV curable composition to form an imprinted composition, wherein the release composition having a basic reactive moiety is effective to locally inhibit curing of the composition at an interface between the template and the imprinted composition; and releasing the template from the imprinted composition.
摘要翻译： 一种压印方法，包括用具有碱性反应性部分的释放组合物涂布微图案化模板的选定表面; 其中所述模板对UV辐射是透明的; 将模板印刷在光固化组合物上; 固化可UV固化组合物以形成印迹组合物，其中具有碱性反应性部分的释放组合物有效地局部抑制组合物在模板和印迹组合物之间的界面处的固化; 并从印迹组合物释放模板。
-
公开(公告)号：US07749422B2
公开(公告)日：2010-07-06
申请号：US11694117
申请日：2007-03-30
申请人： Robert D. Allen , Mark W. Hart , Frances Houle , Hiroshi Ito
发明人： Robert D. Allen , Mark W. Hart , Frances Houle , Hiroshi Ito
IPC分类号： B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： An imprint process comprising coating a selected surface of a micropatterned template with a release composition having a basic reactive moiety; wherein the template is transparent to UV radiation; imprinting the template onto a photocationically curable composition; curing the UV curable composition to form an imprinted composition, wherein the release composition having a basic reactive moiety is effective to locally inhibit curing of the composition at an interface between the template and the imprinted composition; and releasing the template from the imprinted composition.
摘要翻译： 一种压印方法，包括用具有碱性反应性部分的释放组合物涂布微图案化模板的选定表面; 其中所述模板对UV辐射是透明的; 将模板印刷在光固化组合物上; 固化可UV固化组合物以形成印迹组合物，其中具有碱性反应性部分的释放组合物有效地局部抑制组合物在模板和印迹组合物之间的界面处的固化; 并从印迹组合物释放模板。
-
公开(公告)号：US20070066750A1
公开(公告)日：2007-03-22
申请号：US11219218
申请日：2005-09-02
申请人： Frances Houle , Hiroshi Ito
发明人： Frances Houle , Hiroshi Ito
CPC分类号： G03F7/027 , B29C59/002 , C09D4/00 , G03F7/0041 , G03F7/0755 , C08F216/125
摘要： A stable viscosity coating composition, a method of forming the stable viscosity coating composition and a method for using the stable viscosity coating composition in a micro-molding imprint lithographic process, such as Step and Flash Imprint Lithography is disclosed. The stable viscosity coating composition may include at least one vinyl ether having at least one vinyl ether group (—OCR═CR2), and a stabilizer, wherein the stabilizer may be 9-anthracenemethanol, a substituted 9-anthracenemethanol, phenothiazine, or a substituted phenothiazine. The coating composition may include a radiation sensitive photoacid generator (PAG). The method of forming the coating composition comprises combining at least one vinyl ether having at least one vinyl ether group (—OCR═CR2), and at least one stabilizer.
摘要翻译： 公开了稳定粘度涂料组合物，形成稳定粘度涂料组合物的方法和在微型成型压印光刻工艺中使用稳定粘度涂料组合物的方法，例如步骤和闪光印记平版印刷术。 稳定粘度涂料组合物可以包括至少一种具有至少一个乙烯基醚基的乙烯基醚（-OCR-CR 2 H 2）和稳定剂，其中稳定剂可以是9-蒽甲醇，取代的9 - 蒽基甲醇，吩噻嗪或取代的吩噻嗪。 涂料组合物可以包括辐射敏感光致酸产生剂（PAG）。 形成涂料组合物的方法包括组合至少一种具有至少一个乙烯基醚基团（-OCR-CR 2 H 2）的乙烯基醚和至少一种稳定剂。
-
6.发明申请公开(公告)号：US20050168717A1
公开(公告)日：2005-08-04
申请号：US10769132
申请日：2004-01-29
CPC分类号： G03F7/70108 , G03F7/70608 , Y10S430/143
摘要： An optical apparatus used for the efficient characterization of photoresist material includes at least one grating interferometer having at least two gratings that together define an optical recombination plane. An optical stop blocks any zeroth order beam from propagating through the apparatus. A reticle positioned at the recombination plane has at least one fiducial marking therein. A lithographic imaging optical tool is positioned so that its input optical plane is substantially coincident with the optical recombination plane and its output imaging plane is substantially coincident with photoresist on a wafer. The apparatus writes in the photoresist latent, sinusoidal grating patterns, preferably of different spatial frequencies, as well as at least one fiducial mark whose pattern is determined by the marking in the reticle. After the photoresist is developed, its intrinsic spatial resolution may be determined by automated means.
摘要翻译： 用于光致抗蚀剂材料的有效表征的光学装置包括至少一个具有至少两个光栅的光栅干涉仪，其一起限定光学复合平面。 光学阻挡块阻止任何零级光束传播通过设备。 位于复合平面处的掩模版在其中具有至少一个基准标记。 光刻成像光学工具被定位成使得其输入光学平面与光学复合平面基本一致，并且其输出成像平面与晶片上的光致抗蚀剂基本一致。 该装置写入光阻潜在正弦光栅图案，优选地具有不同的空间频率，以及至少一个基准标记，其图案由标线中的标记确定。 在光致抗蚀剂显影之后，其固有空间分辨率可以通过自动化方式确定。
-
公开(公告)号：US20060126053A1
公开(公告)日：2006-06-15
申请号：US11351578
申请日：2006-02-09
IPC分类号： G03B27/62
CPC分类号： G03F7/70108 , G03F7/70608 , Y10S430/143
摘要： An optical apparatus used for the efficient characterization of photoresist material includes at least one grating interferometer having at least two gratings that together define an optical recombination plane. An optical stop blocks any zeroth order beam from propagating through the apparatus. A reticle positioned at the recombination plane has at least one fiducial marking therein. A lithographic imaging optical tool is positioned so that its input optical plane is substantially coincident with the optical recombination plane and its output imaging plane is substantially coincident with photoresist on a wafer. The apparatus writes in the photoresist latent, sinusoidal grating patterns, preferably of different spatial frequencies, as well as at least one fiducial mark whose pattern is determined by the marking in the reticle. After the photoresist is developed, its intrinsic spatial resolution may be determined by automated means.
-
公开(公告)号：US20050185159A1
公开(公告)日：2005-08-25
申请号：US10783938
申请日：2004-02-20
申请人： Alan Rosenbluth , Gregg Gallatin , Ronald Gordon , Nakgeuon Seong , Alexey Lvov , William Hinsberg , John Hoffnagle , Frances Houle , Martha Sanchez
发明人： Alan Rosenbluth , Gregg Gallatin , Ronald Gordon , Nakgeuon Seong , Alexey Lvov , William Hinsberg , John Hoffnagle , Frances Houle , Martha Sanchez
CPC分类号： G03F7/705 , G03F1/36 , G03F7/70441
摘要： An efficient method and system is provided for computing lithographic images that takes into account vector effects such as lens birefringence, resist stack effects and tailored source polarizations, and may also include blur effects of the mask and the resist. These effects are included by forming a generalized bilinear kernel, which is independent of the mask transmission function, which can then be treated using a decomposition to allow rapid computation of an image that includes such non-scalar effects. Dominant eigenfunctions of the generalized bilinear kernel can be used to pre-compute convolutions with possible polygon sectors. A mask transmission function can then be decomposed into polygon sectors, and weighted pre-images may be formed from a coherent sum of the pre-computed convolutions for the appropriate mask polygon sectors. The image at a point may be formed from the incoherent sum of the weighted pre-images over all of the dominant eigenfunctions of the generalized bilinear kernel. The resulting image can then be used to perform model-based optical proximity correction (MBOPC).
摘要翻译： 提供了一种有效的方法和系统，用于计算光学图像，其考虑了诸如透镜双折射，抗蚀剂堆叠效应和定制的源极化的矢量效应，并且还可以包括掩模和抗蚀剂的模糊效果。 这些效果包括通过形成广义双线性核，其独立于掩模传递函数，其然后可以使用分解来处理，以允许快速计算包括这种非标量效应的图像。 广义双线性核的主要特征函数可用于预先计算可能的多边形扇区的卷积。 然后，掩模传输功能可以被分解成多边形扇区，并且加权预图像可以由针对适当的屏蔽多边形扇区的预先计算的卷积的相干和形成。 一点上的图像可以由广义双线性核的所有主要特征函数上的加权预图像的非相干和形成。 然后，所得到的图像可用于执行基于模型的光学邻近校正（MBOPC）。
-
公开(公告)号：US06770419B2
公开(公告)日：2004-08-03
申请号：US10241937
申请日：2002-09-11
申请人： Mahmoud M. Khojasteh , Ranee W. Kwong , Kuang-Jung Chen , Pushkara Rao Varanasi , Robert D. Allen , Phillip Brock , Frances Houle , Ratnam Sooriyakumaran
发明人： Mahmoud M. Khojasteh , Ranee W. Kwong , Kuang-Jung Chen , Pushkara Rao Varanasi , Robert D. Allen , Phillip Brock , Frances Houle , Ratnam Sooriyakumaran
IPC分类号： G03C173
CPC分类号： G03F7/094 , G03F7/0397 , G03F7/0758 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： The silicon-containing resist compositions which have low silicon outgassing and high resolution lithographic performance, especially in bilayer or multilayer lithographic applications using 193 nm or shorter wavelength imaging radiation are enabled by the presence of an imaging polymer having silicon-containing, non-acid-labile pendant groups. The resist compositions of the invention are preferably further characterized by the substantial absence of silicon-containing acid-labile moieties.
-
10.发明授权Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging 失效用化学放大抗蚀剂成像形成50nm或更小半间距特征的方法公开(公告)号：US07090963B2
公开(公告)日：2006-08-15
申请号：US10604082
申请日：2003-06-25
IPC分类号： G03C5/00
摘要： Lithographic imaging of 50 nm (or less) half-pitch features in chemically amplified resists (commonly used in the manufacture of integrated circuits) is enabled by the use of reduced temperature post-exposure processing and low activation energy chemically amplified resists. The post-exposure processing preferably involves ambient to moderately elevated temperature and the presence of a deprotection reaction-dependent co-reactant (e.g., water).
摘要翻译： 通过使用降低温度的曝光后处理和低活化能的化学放大抗蚀剂，能够实现化学放大抗蚀剂中50nm（或更少）半间距特征的平版印刷成像（通常用于集成电路的制造）。 曝光后处理优选包括环境温度至适度升高的温度和脱保护反应依赖性共反应物（例如水）的存在。
-
-
-
-
-
-
-
-
-
搜索结果
10 条记录 (耗时 0.014 秒)