Method of fabricating semiconductor cleaners
    1.
    发明授权
    Method of fabricating semiconductor cleaners 有权
    制造半导体清洁剂的方法

    公开(公告)号:US08409363B2

    公开(公告)日:2013-04-02

    申请号:US13408796

    申请日:2012-02-29

    申请人: Frank Weber

    发明人: Frank Weber

    IPC分类号: B08B3/00

    摘要: A method of manufacturing cleaning solvents is provided. The method includes selecting a small plurality of test solvents from a large plurality of perspective solvents. The equilibrium composition of a multi-component solution is preferably described by the Hansen solubility model. A small plurality of test solvents is applied to solute samples and the degree of dissolution or swelling recorded. Based on the degree of dissolution or swelling, at least one solvent is selected from the large plurality of perspective solvents based on the Hansen parameters.

    摘要翻译: 提供了制造清洗溶剂的方法。 该方法包括从大量多种透视溶剂中选择少量的测试溶剂。 多组分溶液的平衡组成优选用Hansen溶解度模型描述。 施用少量测试溶剂来溶解样品,记录溶解或溶胀度。 基于溶解或溶胀的程度,基于Hansen参数从至少一种溶剂中选择大量的透视溶剂。

    Droplet-free coating systems manufactured by arc-evaporation method
    2.
    发明授权
    Droplet-free coating systems manufactured by arc-evaporation method 失效
    通过电弧蒸发法制造无液滴涂料体系

    公开(公告)号:US08382963B2

    公开(公告)日:2013-02-26

    申请号:US12059116

    申请日:2008-03-31

    IPC分类号: C23C30/00

    摘要: A droplet-free wear-resistant coating is manufactured by depositing a wear resistant nitride coating containing a nitride layer which contains at least one metal or metal compound of a metal selected from the group consisting of Ti, Cr, Al, Si and combinations thereof, on a surface of a substrate by cathodic-arc evaporation using a Venetian blind filter system in front of an arc cathode; to reduce metal microdroplets and/or metal microparticles in the wear resistant coating compared to an wear resistant coating obtained without a Venetian blind filter system.

    摘要翻译: 通过沉积包含含有选自Ti,Cr,Al,Si及其组合的金属的金属或金属化合物的至少一种金属或金属化合物,沉积含有氮化物层的耐磨氮化物涂层,制造无滴粒耐磨涂层, 通过阴极电弧蒸发使用在电弧阴极前面的威尼斯盲滤波器系统在基板的表面上; 以减少耐磨涂层中的金属微滴和/或金属微粒与不使用百叶帘系统的耐磨涂层相比。

    Method of degasification in semiconductor cleaning
    4.
    发明授权
    Method of degasification in semiconductor cleaning 有权
    半导体清洗中的脱气方法

    公开(公告)号:US07718012B2

    公开(公告)日:2010-05-18

    申请号:US11026835

    申请日:2004-12-30

    申请人: Frank Weber

    发明人: Frank Weber

    IPC分类号: B08B3/00

    摘要: A method of improving the effectiveness of semiconductor cleaning solvents is provided. Insoluble gas bubbles, typically air, hinder wet chemical cleaning methods. Preferred embodiments include purging a first, insoluble gas from the cleaning system and replacing it with a second, soluble gas. After replacing the first gas with the second gas, the wafer is rinsed in the cleaning solvent. Any gas bubbles trapped within narrow, recessed features during cleaning rapidly dissolve due to the second gas's solubility. Temperature adjustments during the process may further enhance cleaning.

    摘要翻译: 提供了提高半导体清洗溶剂有效性的方法。 不溶性气泡(通常为空气)阻碍湿化学清洗方法。 优选的实施方案包括从清洁系统中吹扫第一种不溶性气体并用第二种可溶性气体代替它。 在用第二气体替换第一气体之后,在清洗溶剂中冲洗晶片。 由于第二气体的溶解度,在清洁过程中捕获在狭窄凹陷部分内的任何气泡都会迅速溶解。 该过程中的温度调节可进一步增强清洁。

    Adjusting mechanism and vehicle seat
    5.
    发明授权
    Adjusting mechanism and vehicle seat 有权
    调整机构和车辆座椅

    公开(公告)号:US07604297B2

    公开(公告)日:2009-10-20

    申请号:US11664315

    申请日:2005-09-21

    申请人: Frank Weber

    发明人: Frank Weber

    IPC分类号: B60N2/02

    CPC分类号: B60N2/20 B60N2/2352 B60N2/433

    摘要: An adjusting mechanism includes a first sub-assembly, a bolt disposed on the first sub-assembly and a second sub-assembly. The bolt is configured to receive a force in a radial direction relative to an axis of the bolt. The second sub-assembly is mounted so as to be rotatable relative to the first sub-assembly by means of the bolt. The rotatability of the second sub-assembly relative to the first sub-assembly is configured to be reduced by a positive connection created using plastic deformation between the bolt and at least one of the first sub-assembly and the second sub-assembly.

    摘要翻译: 调节机构包括第一子组件,布置在第一子组件上的螺栓和第二子组件。 螺栓被配置为相对于螺栓的轴线在径向方向上接收力。 第二子组件被安装成可以通过螺栓相对于第一子组件旋转。 第二子组件相对于第一子组件的可旋转性被构造为通过在螺栓和第一子组件和第二子组件中的至少一个之间的塑性变形产生的正连接来减小。

    Adjusting Mechanism and Vehicle Seat
    6.
    发明申请
    Adjusting Mechanism and Vehicle Seat 有权
    调整机构和车辆座椅

    公开(公告)号:US20080122281A1

    公开(公告)日:2008-05-29

    申请号:US11664315

    申请日:2005-09-21

    申请人: Frank Weber

    发明人: Frank Weber

    IPC分类号: B60N2/235

    CPC分类号: B60N2/20 B60N2/2352 B60N2/433

    摘要: An adjusting mechanism includes a first sub-assembly, a bolt disposed on the first sub-assembly and a second sub-assembly. The bolt is configured to receive a force in a radial direction relative to an axis of the bolt. The second sub-assembly is mounted so as to be rotatable relative to the first sub-assembly by means of the bolt. The rotatability of the second sub-assembly relative to the first sub-assembly is configured to be reduced by a positive connection created using plastic deformation between the bolt and at least one of the first sub-assembly and the second sub-assembly.

    摘要翻译: 调节机构包括第一子组件,布置在第一子组件上的螺栓和第二子组件。 螺栓被配置为相对于螺栓的轴线在径向方向上接收力。 第二子组件被安装成可以通过螺栓相对于第一子组件旋转。 第二子组件相对于第一子组件的可旋转性被构造为通过在螺栓和第一子组件和第二子组件中的至少一个之间的塑性变形产生的正连接来减小。

    Repair of carbon depletion in low-k dielectric films
    7.
    发明申请
    Repair of carbon depletion in low-k dielectric films 有权
    修复低k电介质薄膜的碳耗竭

    公开(公告)号:US20060046516A1

    公开(公告)日:2006-03-02

    申请号:US10927899

    申请日:2004-08-27

    申请人: Frank Weber

    发明人: Frank Weber

    IPC分类号: H01L21/31

    摘要: A method of repairing damaged low-k dielectric materials is disclosed. Plasma-based processes, which are commonly used in semiconductor device manufacturing, frequently damage carbon-containing, low-k dielectric materials. Upon exposure to moisture, the damaged dielectric material may form silanol groups. In preferred embodiments, a two-step approach converts the silanol to a suitable organic group. The first step includes using a halogenating reagent to convert the silanol to a silicon halide. The second step includes using a derivatization reagent, preferably an organometallic compound, to replace the halide with the suitable organic group. In a preferred embodiment, the halogenating agent includes thionyl chloride and the organometallic compound includes an alkyllithium, preferably methyllithium. In another preferred embodiment, the organometallic compound comprises a Grignard reagent. Embodiments disclosed herein advantageously enable the manufacturer to engineer the density, polarization, and ionization properties of the low-k dielectric material by selective incorporation of the organic group.

    摘要翻译: 公开了修复损坏的低k电介质材料的方法。 通常用于半导体器件制造的基于等离子体的工艺常常损坏含碳低k电介质材料。 暴露于水分时,损坏的介电材料可能形成硅烷醇基团。 在优选的实施方案中,两步法将硅烷醇转化为合适的有机基团。 第一步包括使用卤化试剂将硅烷醇转化为卤化硅。 第二步包括使用衍生化试剂,优选有机金属化合物,用合适的有机基团代替卤化物。 在优选的实施方案中,卤化剂包括亚硫酰氯,有机金属化合物包括烷基锂,优选甲基锂。 在另一个优选的实施方案中,有机金属化合物包括格氏试剂。 本文公开的实施方式有利地使制造商能够通过选择性掺入有机基团来设计低k电介质材料的密度,极化和电离特性。

    Circuit configuration for burn-in systems for testing modules by using a board
    8.
    发明授权
    Circuit configuration for burn-in systems for testing modules by using a board 有权
    用于使用电路板测试模块的老化系统的电路配置

    公开(公告)号:US06292008B1

    公开(公告)日:2001-09-18

    申请号:US09322717

    申请日:1999-05-28

    IPC分类号: G01R3126

    CPC分类号: G01R31/318572

    摘要: A burn-in system uses a board for testing modules disposed like a matrix in the board. A circuit configuration includes module terminals for the modules in the board. Input/output channels are each connected to a respective one of the module terminals. Diodes are each connected to a respective one of the input/output channels. A scan signal terminal is connected to the diodes for activating the module terminals in groups with scan signals.

    摘要翻译: 老化系统使用板来测试板上放置的矩阵。 电路配置包括板上模块的模块端子。 输入/输出通道各自连接到相应的一个模块端子。 二极管各自连接到相应的一个输入/输出通道。 扫描信号端子连接到二极管,用于以扫描信号分组激活模块端子。

    Method of fabricating semiconductor cleaners
    10.
    发明授权
    Method of fabricating semiconductor cleaners 有权
    制造半导体清洁剂的方法

    公开(公告)号:US08147615B2

    公开(公告)日:2012-04-03

    申请号:US11126424

    申请日:2005-05-11

    申请人: Frank Weber

    发明人: Frank Weber

    IPC分类号: C25F3/30

    摘要: A method of manufacturing cleaning solvents is provided. The method includes selecting a small plurality of test solvents from a large plurality of perspective solvents. The equilibrium composition of a multi-component solution is preferably described by the Hansen solubility model. A small plurality of test solvents is applied to solute samples and the degree of dissolution or swelling recorded. Based on the degree of dissolution or swelling, at least one solvent is selected from the large plurality of perspective solvents based on the Hansen parameters. In other embodiments, the three-parameter Hansen solubility model includes additional parameters that enable more accurate solubility predictions. In one embodiment, an additional parameter accounts for oxidizing solution components. In an alternative embodiment, an additional parameter accounts for the acidic/basic property of the solution. Still another embodiment accounts for temperature effects.

    摘要翻译: 提供了制造清洗溶剂的方法。 该方法包括从大量多个透视溶剂中选择少量的测试溶剂。 多组分溶液的平衡组成优选用Hansen溶解度模型描述。 施用少量测试溶剂来溶解样品,记录溶解或溶胀度。 基于溶解或溶胀的程度,基于Hansen参数从至少一种溶剂中选择大量的透视溶剂。 在其他实施例中,三参数汉森溶解度模型包括能够更准确地溶解度预测的附加参数。 在一个实施方案中,附加参数考虑氧化溶液组分。 在替代实施例中,附加参数解决了溶液的酸性/碱性。 另一个实施例解释了温度效应。