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公开(公告)号：US5954177A
公开(公告)日：1999-09-21
申请号：US997397
申请日：1997-12-23
申请人： Fumitomo Yokoyama , Kazuhisa Ozaki , Masanori Kadotani , Mikio Iwase , Harumichi Tsuboi , Makoto Hijikata , Yasuo Hojo , Atsushi Tabata , Yasunori Nakawaki , Yasunari Nakamura , Nobuaki Takahashi , Hideki Miyata , Kagenori Fukumura , Koji Tsukamoto
发明人： Fumitomo Yokoyama , Kazuhisa Ozaki , Masanori Kadotani , Mikio Iwase , Harumichi Tsuboi , Makoto Hijikata , Yasuo Hojo , Atsushi Tabata , Yasunori Nakawaki , Yasunari Nakamura , Nobuaki Takahashi , Hideki Miyata , Kagenori Fukumura , Koji Tsukamoto
IPC分类号： F16H57/028 , F16H57/029 , F16H57/03 , F16H57/04 , F16H61/00 , F16H63/30 , F16D25/0638 , F16J15/16
CPC分类号： F16H57/0469 , F16H61/0009 , F16H63/3026
摘要： An oil seal member is compressed between a connecting pipe for supplying oil to an oil chamber of a hydraulic servo and the cylinder drum of the hydraulic servo. The cylinder drum has an interior oil chamber and turns through a predetermined angle upon operation of a frictional engagement element by the hydraulic servo. The end of the seal member pressed against the cylindrical drum surrounds an oil hole 73 formed in the cylindrical drum, and oil pressure is supplied to the oil chamber through an oil passage in which the seal member is mounted and through the oil hole. A recess is formed in the outer surface of the cylindrical drum around the oil hole and the end of the seal member is received in the recess. When the cylindrical member turns within the predetermined angular range, the end of the seal member is protected by the recess. As a result, the end of the seal member is not damaged and the integrity of the seal is protected.
摘要翻译： 油密封构件在用于将油供给到液压伺服机构的油室的连接管与液压伺服的气缸滚筒之间被压缩。 气缸滚筒具有内部油室，并且通过液压伺服器在摩擦接合元件操作时转过预定角度。 按压在圆筒形滚筒上的密封件的端部包围形成在圆筒形滚筒中的油孔73，并且通过安装密封件的油通道和油孔将油压供给到油室。 在圆筒形鼓的外表面上形成有一个凹槽，围绕着油孔，密封件的端部被容纳在凹槽中。 当圆柱形构件在预定角度范围内转动时，密封构件的端部被凹部保护。 结果，密封构件的端部不被损坏并且密封件的完整性受到保护。
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公开(公告)号：US5267917A
公开(公告)日：1993-12-07
申请号：US964634
申请日：1992-10-23
申请人： Masanori Kadotani , Masahiro Haybuchi , Takashi Morimoto , Kazumasa Tsukamoto , Yasuo Hojo , Hidehiro Oba , Yutaka Taga
发明人： Masanori Kadotani , Masahiro Haybuchi , Takashi Morimoto , Kazumasa Tsukamoto , Yasuo Hojo , Hidehiro Oba , Yutaka Taga
CPC分类号： F16H57/08
摘要： A rotary element engaging device of an automatic transmission includes a stationary member, a planetary gear set having rotary elements, a frictionally engaging element interposed between the stationary member and one of the rotary elements, a one-way clutch interposed between the stationary member and the one rotary element, and an operating member for engaging and disengaging the frictionally engaging element. The rotary element is adapted to be selectively engaged with the stationary member through two paths formed of the frictionally engaging element and the one-way clutch. The one-way clutch is disposed between the frictionally engaging element and the operating member. The one-way clutch includes an inner race connected to the one rotary element and an outer race fixed to the stationary member. The operating member is adapted to act on the frictionally engaging element through the outer race.
摘要翻译： 自动变速器的旋转元件接合装置包括固定构件，具有旋转元件的行星齿轮组，设置在静止构件和其中一个旋转元件之间的摩擦接合元件，插入在静止构件和静止构件之间的单向离合器 一个旋转元件和用于接合和分离摩擦接合元件的操作构件。 旋转元件适于通过由摩擦接合元件和单向离合器形成的两个路径选择性地与固定构件接合。 单向离合器设置在摩擦接合元件和操作构件之间。 单向离合器包括连接到一个旋转元件的内圈和固定到静止构件的外圈。 操作构件适于通过外圈作用在摩擦接合元件上。
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公开(公告)号：US5254053A
公开(公告)日：1993-10-19
申请号：US964631
申请日：1992-10-23
申请人： Takao Taniguchi , Kazumasa Tsukamoto , Masahiro Hayabuchi , Masanori Kadotani , Masahiko Ando , Yasuo Hojo , Seitoku Kubo , Yutaka Taga , Hidehiro Oba
发明人： Takao Taniguchi , Kazumasa Tsukamoto , Masahiro Hayabuchi , Masanori Kadotani , Masahiko Ando , Yasuo Hojo , Seitoku Kubo , Yutaka Taga , Hidehiro Oba
CPC分类号： F16H3/66 , F16H2200/0047
摘要： A five-speed automatic transmission includes a main transmission and an over-drive transmission of a front disposition type. The main transmission includes three sets of planetary gears, a clutch for engaging and disengaging speed-change elements of the planetary gear sets, and a brake for fixing and releasing the speed change elements, and provides for four forward speed ranges and one reverse speed range. In the over-drive transmission of a front disposition type, a speed change element of an over-drive planetary gear set connected to an input element of the main transmission is adapted to be engaged, disengaged and fixed for achieving either a directly coupled stage or an over-drive stage. The over-drive transmission releases the direct coupling for reverse driving operation. One of the clutches of the main transmission for achieving the directly coupled stage and one of the brakes for achieving the low speed stage are engageable in the reverse driving operation.
摘要翻译： 五速自动变速器包括主变速器和前部配置型的过驱动变速器。 主变速器包括三组行星齿轮，用于接合和分离行星齿轮组的变速元件的离合器和用于固定和释放变速元件的制动器，并且提供四个前进速度范围和一个倒档速度范围 。 在前部配置型的过驱动传动中，连接到主变速器的输入元件的过驱动行星齿轮组的变速元件适于接合，分离和固定，以实现直接耦合的级或 过驱动阶段。 过驱动传动释放用于反向驱动操作的直接联接。 用于实现直接耦合级的主变速器的离合器之一和用于实现低速级的制动器之一可接合于反向驱动操作。
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公开(公告)号：US06897403B2
公开(公告)日：2005-05-24
申请号：US10378601
申请日：2003-03-05
IPC分类号： H01J37/32 , H01L21/00 , H01L21/683 , H01L21/687 , B23K9/00
CPC分类号： H01L21/6875 , H01J37/32431 , H01J2237/2001 , H01L21/67109 , H01L21/6831
摘要： A plasma processing apparatus capable of processing the surface of a workpiece more precisely is provided. The plasma processing apparatus for supplying a gas between a sample and a sample table to generate plasma for processing the sample, comprises an adjusting device for changing a pressure supplied to a central side of the sample and a pressure of the gas supplied to an outer peripheral side as processing of the sample progresses.
摘要翻译： 提供了能够更精确地处理工件的表面的等离子体处理装置。 用于在样品和样品台之间提供气体以产生用于处理样品的等离子体的等离子体处理装置包括调节装置，用于改变供给到样品的中心侧的压力和供给到外周的气体的压力 作为样品进行的处理。
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公开(公告)号：US20050051089A1
公开(公告)日：2005-03-10
申请号：US10968249
申请日：2004-10-20
CPC分类号： H01J37/32458 , C23C16/4404 , H01J37/32477
摘要： It is required for the conventional plasma processing apparatus used for plasma processing in a reduced pressure atmosphere to replace the component parts such as earth member frequently as the expendable supplies because an insulation-processed layer and the substrate itself are thinned due to plasma and impurities contained in these thinned materials diffuse into plasma to result in adverse effect on a sample such as wafer, and thinning of the insulation-processed layer due to plasma and resultant electrical effect of the thinning of the insulation-processed layer cause the change of the state of plasma. The invention solves the problem by using electrically conductive ceramic that is formed of a baked material mainly composed of alumina for component parts of the apparatus in the plasma processing apparatus used for plasma processing of an sample to be processed such as wafer in a reduced pressure atmosphere.
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6.发明申请公开(公告)号：US20060121195A1
公开(公告)日：2006-06-08
申请号：US11327447
申请日：2006-01-09
申请人： Ryujiro Udo , Masatsugu Arai , Masanori Kadotani
发明人： Ryujiro Udo , Masatsugu Arai , Masanori Kadotani
CPC分类号： H01L21/67069 , C25D11/005 , C25D11/026 , C25D11/04 , H01J37/32082 , H01L21/6831 , H01L21/6833
摘要： An electrostatic chuck comprising an insulating base 6, a plurality of conductive aluminum thin films 4a, 4b deposited on the surface of the base, and alumite films 2a, 2b formed by anodizing the surfaces of the conductive thin films 4a, 4b, wherein the conductive thin films 4a, 4b are each provided with a DC voltage of a different polarity so that a surface chucking a wafer 7 is electrostatically bipolar.
摘要翻译： 一种静电卡盘，其包括绝缘基体6，沉积在基底表面上的多个导电铝薄膜4a，4b和通过阳极氧化导电薄膜4a的表面形成的耐酸铝膜2a， 如图4b所示，其中导电薄膜4a，4b分别具有不同极性的DC电压，使得夹持晶片7的表面是静电双极的。
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公开(公告)号：US06838833B2
公开(公告)日：2005-01-04
申请号：US10670288
申请日：2003-09-26
IPC分类号： H01J37/32 , H01L21/00 , H01L21/683 , H01J7/24
CPC分类号： H01L21/67109 , H01J37/32724 , H01J2237/2001 , H01L21/6833
摘要： A plasma processing apparatus provided with a holding stage of a system in which a temperature of an electrode block is controlled so as to control the temperature of a semiconductor wafer. The electrode block is provided with at least first and second independent temperature controllers on inner and outer sides thereof, and a slit for suppressing heat transfer is provided in the electrode block between the first and second temperature controllers.
摘要翻译： 一种等离子体处理装置，其具有控制电极块的温度以控制半导体晶片的温度的系统的保持台。 电极块在其内侧和外侧设置有至少第一和第二独立温度控制器，并且在第一和第二温度控制器之间的电极块中设置用于抑制热传递的狭缝。
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8.发明申请Plasma etching apparatus and method for forming inner wall of plasma processing chamber 审中-公开等离子体蚀刻装置及等离子体处理室内壁形成方法公开(公告)号：US20070215278A1
公开(公告)日：2007-09-20
申请号：US11367597
申请日：2006-03-06
IPC分类号： H01L21/306
CPC分类号： H01J37/32504 , H01J37/32477
摘要： A plasma etching apparatus is provided which can prevent corrosion of an aluminum substrate constituting an etching processing chamber or an inside component thereof, thereby avoiding a reduction in productivity due to scattering of a sprayed coating. In the plasma etching apparatus, an anodic oxide film is disposed between a ceramic sprayed coating with excellent resistance to plasma, and the etching processing chamber and the inside component thereof made of aluminum alloy. The anodic oxide film has a thickness of 5 μm or less to have heat resistance.
摘要翻译： 提供一种等离子体蚀刻装置，其可以防止构成蚀刻处理室或其内部组分的铝基板的腐蚀，从而避免由于喷涂涂层的飞散而导致的生产率降低。 在等离子体蚀刻装置中，阳极氧化膜设置在耐等离子体性优异的陶瓷喷涂涂层之间，蚀刻处理室及其内部由铝合金制成。 阳极氧化膜的厚度为5μm以下，具有耐热性。
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公开(公告)号：US20050193951A1
公开(公告)日：2005-09-08
申请号：US10793782
申请日：2004-03-08
申请人： Muneo Furuse , Masanori Kadotani , Masatsugu Arai , Hiroho Kitada
发明人： Muneo Furuse , Masanori Kadotani , Masatsugu Arai , Hiroho Kitada
CPC分类号： H01L21/68757 , H01J37/32559
摘要： The object of the present invention is to provide a plasma processing apparatus capable of processing a substrate stably for a long period of time. The plasma processing apparatus has a substrate holder disposed in a processing chamber and an electrode cover for protecting a support stage of said substrate holder, for processing a wafer placed on said support stage using a plasma generated in the processing chamber, wherein at least a surface of said electrode cover that is positioned directly below an edge of the wafer, or at least a surface of said electrode cover that comes into contact with plasma, is coated with a material having resistance to plasma and comprising Y2O3, Yb2O3 or YF3, or a mixture thereof, as its main component.
摘要翻译： 本发明的目的是提供能够长时间稳定地处理基板的等离子体处理装置。 等离子体处理装置具有设置在处理室中的基板保持器和用于保护所述基板保持器的支撑台的电极盖，用于使用在处理室中产生的等离子体来处理放置在所述支撑台上的晶片，其中至少一个表面 位于晶片边缘正下方的至少一个与等离子体接触的电极盖的表面的电极盖被涂覆有耐等离子体的材料并且包括Y 2 或其混合物作为其主要组分，其中R 1，R 2，R 3，R 3，R 3，R 3，
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公开(公告)号：US5579883A
公开(公告)日：1996-12-03
申请号：US437314
申请日：1995-05-09
CPC分类号： F16D25/0638 , F16D25/10 , F16H63/3026 , F16H2200/0047 , F16H2200/2012
摘要： First and second hydraulic servo units operate respective frictional engagement elements in a transmission and each includes first and second cylinders, each having a side wall portion interposed between the two frictional engagement elements. The first cylinder has first outer and inner cylinder portions and the first hydraulic servo unit further includes a first piston having inner and outer cylindrical surfaces slidably supported by the first outer and first inner cylinder portions of the first cylinder for reciprocating axial motion into and out of engagement with one frictional engagement element. First return springs are arranged radially inward of the one frictional engagement element for returning the first piston. The second cylinder includes second outer and inner cylinder portions and the second hydraulic servo unit further includes a second piston having a larger diameter portion and a smaller diameter portion, slidably supported by the inner cylindrical surfaces of the second outer cylinder portion and the first inner cylinder portion, for reciprocating axial motion into and out of engagement with the second frictional engagement element. Second return springs are arranged around the inner circumference of the one frictional engagement element for returning the second piston.
摘要翻译： 第一和第二液压伺服单元在变速器中操作相应的摩擦接合元件，并且每个包括第一和第二缸，每个具有插入在两个摩擦接合元件之间的侧壁部分。 第一气缸具有第一外筒部和内筒部，第一液压伺服单元还包括第一活塞，其具有由第一气缸的第一外筒体部和第一内筒部可滑动地支撑的内筒体和外筒体， 与一个摩擦接合元件接合。 第一复位弹簧布置在一个摩擦接合元件的径向内侧，用于使第一活塞返回。 第二气缸包括第二外筒部分和第二内筒部分，第二液压伺服单元还包括具有较大直径部分和较小直径部分的第二活塞，其可滑动地由第二外筒部分和第一内筒部分的内圆柱表面支撑 部分，用于往复运动的轴向运动进入和离开与第二摩擦接合元件的接合。 第二复位弹簧布置在一个摩擦接合元件的内圆周周围，用于使第二活塞返回。
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