公开(公告)号：US20100311895A1

公开(公告)日：2010-12-09

申请号：US12857633

申请日：2010-08-17

申请人： Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Muthumanickam Sankarapandian ,  Linda Karin Sundberg ,  Willi Volksen

发明人： Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Muthumanickam Sankarapandian ,  Linda Karin Sundberg ,  Willi Volksen

IPC分类号： C08L83/06 ,  C08L83/04

CPC分类号： C08L101/12 ,  H01L21/02118 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/31695 ,  H01L21/76807 ,  H01L21/7682 ,  H01L2221/1047

摘要： A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.

摘要翻译： 使用该组合物制造的物质组成和结构。 所述组合物包含：树脂; 分散在树脂中的聚合物纳米颗粒，每个聚合纳米颗粒包含多臂芯聚合物和连接到多臂芯聚合物的悬置聚合物，与树脂不混溶的多臂芯聚合物和可混溶的侧链聚合物 与树脂; 和溶剂，所述溶剂在第一温度下挥发，所述树脂在第二温度下可交联，所述聚合物纳米颗粒在第三温度下可分解，所述第三温度高于所述第二温度，所述第二温度高于所述第一温度 ，其中在从第二温度到第三温度的层之间加热组合物的层的厚度收缩小于约3.5％。

公开(公告)号：US07931829B2

公开(公告)日：2011-04-26

申请号：US12857633

申请日：2010-08-17

申请人： Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Muthumanickam Sankarapandian ,  Linda Karin Sundberg ,  Willi Volksen

发明人： Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Muthumanickam Sankarapandian ,  Linda Karin Sundberg ,  Willi Volksen

IPC分类号： H01B1/12

CPC分类号： C08L101/12 ,  H01L21/02118 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/31695 ,  H01L21/76807 ,  H01L21/7682 ,  H01L2221/1047

摘要： A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.

摘要翻译： 使用该组合物制造的物质组成和结构。 所述组合物包含：树脂; 分散在树脂中的聚合物纳米颗粒，每个聚合纳米颗粒包含多臂芯聚合物和连接到多臂芯聚合物的悬置聚合物，与树脂不混溶的多臂芯聚合物和可混溶的侧链聚合物 与树脂; 和溶剂，所述溶剂在第一温度下挥发，所述树脂在第二温度下可交联，所述聚合物纳米颗粒在第三温度下可分解，所述第三温度高于所述第二温度，所述第二温度高于所述第一温度 ，其中在从第二温度到第三温度的层之间加热组合物的层的厚度收缩小于约3.5％。

公开(公告)号：US07459183B2

公开(公告)日：2008-12-02

申请号：US11190644

申请日：2005-07-27

申请人： Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Muthumanickam Sankarapandian ,  Linda Karin Sundberg ,  Willi Volksen

发明人： Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Muthumanickam Sankarapandian ,  Linda Karin Sundberg ,  Willi Volksen

IPC分类号： B05D3/02 ,  B05D3/06

CPC分类号： C08L101/12 ,  H01L21/02118 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/31695 ,  H01L21/76807 ,  H01L21/7682 ,  H01L2221/1047

摘要： A method of forming a structure. The method including: forming a precursor layer on a substarte, the precursor layer including a resin and, polymeric nano-particles dispersed in the resin, and a solvent, each the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the milti-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscuble with the resin; heating the precursor layer to cross-link at least about 90% of the resin thereby converting the pre-baked precursor layer to a dielectric layer; forming trenches in the dielectric layer and filling the trenches with an electrical conductor; heating the dielectric layer to thermally decompose at least acout 99.5% of the polymeric nano-particles into decomposition products and to drive the decomposition products out of the dielectric layer.

摘要翻译： 一种形成结构的方法。 该方法包括：在基体上形成前体层，前体层包括树脂和分散在树脂中的聚合物纳米颗粒和溶剂，每个聚合物纳米颗粒包含多臂核聚合物和附着的悬置聚合物 连接到多臂芯聚合物的多芯聚合物和附着的聚合物，与树脂不混溶的多臂芯聚合物和与该树脂不相容的侧链聚合物; 加热前体层以交联至少约90％的树脂，从而将预烘烤的前体层转化为电介质层; 在电介质层中形成沟槽并用电导体填充沟槽; 加热电介质层以将至少99.5％的聚合物纳米颗粒的热量分解成分解产物并将分解产物驱出电介质层。

公开(公告)号：US07820242B2

公开(公告)日：2010-10-26

申请号：US12053721

申请日：2008-03-24

申请人： Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Muthumanickam Sankarapandian ,  Linda Karin Sundberg ,  Willi Volksen

发明人： Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Muthumanickam Sankarapandian ,  Linda Karin Sundberg ,  Willi Volksen

IPC分类号： B05D3/02

CPC分类号： C08L101/12 ,  H01L21/02118 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/31695 ,  H01L21/76807 ,  H01L21/7682 ,  H01L2221/1047

摘要： A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.

摘要翻译： 使用该组合物制造的物质组成和结构。 所述组合物包含：树脂; 分散在树脂中的聚合物纳米颗粒，每个聚合纳米颗粒包含多臂芯聚合物和连接到多臂芯聚合物的悬置聚合物，与树脂不混溶的多臂芯聚合物和可混溶的侧链聚合物 与树脂; 和溶剂，所述溶剂在第一温度下挥发，所述树脂在第二温度下可交联，所述聚合物纳米颗粒在第三温度下可分解，所述第三温度高于所述第二温度，所述第二温度高于所述第一温度 ，其中在从第二温度到第三温度的层之间加热组合物的层的厚度收缩小于约3.5％。

公开(公告)号：US20080171136A1

公开(公告)日：2008-07-17

申请号：US12053721

申请日：2008-03-24

申请人： Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Muthumanickam Sankarapandian ,  Linda Karin Sundberg ,  Willi Volksen

发明人： Geraud Jean-Michel Dubois ,  James Lupton Hedrick ,  Ho-Cheol Kim ,  Victor Yee-Way Lee ,  Teddie Peregrino Magbitang ,  Robert Dennis Miller ,  Muthumanickam Sankarapandian ,  Linda Karin Sundberg ,  Willi Volksen

IPC分类号： H01B3/20 ,  B05D5/12

CPC分类号： C08L101/12 ,  H01L21/02118 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/31695 ,  H01L21/76807 ,  H01L21/7682 ,  H01L2221/1047

摘要： A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.

摘要翻译： 使用该组合物制造的物质组成和结构。 所述组合物包含：树脂; 分散在树脂中的聚合物纳米颗粒，每个聚合纳米颗粒包含多臂芯聚合物和连接到多臂芯聚合物的悬置聚合物，与树脂不混溶的多臂芯聚合物和可混溶的侧链聚合物 与树脂; 和溶剂，所述溶剂在第一温度下挥发，所述树脂在第二温度下可交联，所述聚合物纳米颗粒在第三温度下可分解，所述第三温度高于所述第二温度，所述第二温度高于所述第一温度 ，其中在从第二温度到第三温度的层之间加热组合物的层的厚度收缩小于约3.5％。

公开(公告)号：US08703386B2

公开(公告)日：2014-04-22

申请号：US13405587

申请日：2012-02-27

申请人： John David Bass ,  Ho-Cheol Kim ,  Robert Dennis Miller ,  Qing Song ,  Linda Karin Sundberg ,  Gregory Michael Wallraff

发明人： John David Bass ,  Ho-Cheol Kim ,  Robert Dennis Miller ,  Qing Song ,  Linda Karin Sundberg ,  Gregory Michael Wallraff

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/029 ,  C07C49/92 ,  C07C7/00

CPC分类号： G03F7/0042

摘要： Compositions are disclosed having the formula (3): [C′]k[Ta(O2)x(L′)y]  (3), wherein x is an integer of 1 to 4, y is an integer of 1 to 4, Ta(O2)x(L′)y has a charge of 0 to −3, C′ is a counterion having a charge of +1 to +3, k is an integer of 0 to 3, L′ is an oxidatively stable organic ligand having a charge of 0 to −4, and L′ comprises an electron donating functional group selected from the group consisting of carboxylates, alkoxides, amines, amine oxides, phosphines, phosphine oxides, arsine oxides, and combinations thereof. The compositions have utility as high resolution photoresists.

摘要翻译： 公开了具有式（3）的组合物：[C'] k [Ta（O 2）x（L'）y]（3）其中x是1至4的整数，y是1至4的整数， Ta（O 2）x（L'）y具有0至-3的电荷，C'是具有+1至+3的电荷的抗衡离子，k是0至3的整数，L'是氧化稳定的有机物 配体的电荷为0至-4，L'包括选自羧酸盐，醇盐，胺，氧化胺，膦，氧化膦，胂氧化物及其组合的给电子官能团。 该组合物具有作为高分辨率光致抗蚀剂的作用。

公开(公告)号：US20130224652A1

公开(公告)日：2013-08-29

申请号：US13405587

申请日：2012-02-27

申请人： John David Bass ,  Ho-Cheol Kim ,  Robert Dennis Miller ,  Qing Song ,  Linda Karin Sundberg ,  Gregory Michael Wallraff

发明人： John David Bass ,  Ho-Cheol Kim ,  Robert Dennis Miller ,  Qing Song ,  Linda Karin Sundberg ,  Gregory Michael Wallraff

IPC分类号： G03F7/20 ,  C07F9/00 ,  C07F7/28 ,  G03F7/004

CPC分类号： G03F7/0042

摘要： Compositions are disclosed having the formula (3): [C′]k[Ta(O2)x(L′)y]  (3), wherein x is an integer of 1 to 4, y is an integer of 1 to 4, Ta(O2)x(L′)y has a charge of 0 to −3, C′ is a counterion having a charge of +1 to +3, k is an integer of 0 to 3, L′ is an oxidatively stable organic ligand having a charge of 0 to −4, and L′ comprises an electron donating functional group selected from the group consisting of carboxylates, alkoxides, amines, amine oxides, phosphines, phosphine oxides, arsine oxides, and combinations thereof. The compositions have utility as high resolution photoresists.

摘要翻译： 公开了具有式（3）的组合物：[C'] k [Ta（O 2）x（L'）y]（3）其中x是1至4的整数，y是1至4的整数， Ta（O 2）x（L'）y具有0至-3的电荷，C'是具有+1至+3的电荷的抗衡离子，k是0至3的整数，L'是氧化稳定的有机物 具有0至-4电荷的配体，L'包括选自羧酸盐，醇盐，胺，氧化胺，膦，氧化膦，胂氧化物及其组合的给电子官能团。 该组合物具有作为高分辨率光致抗蚀剂的作用。

公开(公告)号：US08821978B2

公开(公告)日：2014-09-02

申请号：US12641959

申请日：2009-12-18

申请人： Joy Cheng ,  William D. Hinsberg ,  Ho-Cheol Kim ,  Young-Hye Na ,  Daniel Paul Sanders ,  Linda Karin Sundberg ,  Hoa D. Truong ,  Gregory Michael Wallraff ,  Atsuko Ito

发明人： Joy Cheng ,  William D. Hinsberg ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Young-Hye Na ,  Daniel Paul Sanders ,  Linda Karin Sundberg ,  Hoa D. Truong ,  Gregory Michael Wallraff

IPC分类号： B32B3/10 ,  G03F7/16 ,  G03F7/38 ,  G03F7/40 ,  G03F7/30

CPC分类号： B82Y40/00 ,  B81C1/00031 ,  B81C2201/0149 ,  G03F7/0392 ,  G03F7/09 ,  G03F7/091 ,  G03F7/165 ,  G03F7/325 ,  G03F7/327 ,  G03F7/40

摘要： A method of forming a layered structure comprising a domain pattern of a self-assembled material utilizes a negative-tone patterned photoresist layer comprising non-crosslinked developed photoresist. The developed photoresist is not soluble in an organic casting solvent for a material capable of self-assembly. The developed photoresist is soluble in an aqueous alkaline developer and/or a second organic solvent. A solution comprising the material capable of self-assembly and the organic casting solvent is casted on the patterned photoresist layer. Upon removal of the organic casting solvent, the material self-assembles, thereby forming the layered structure.

摘要翻译： 形成包括自组装材料的畴图案的分层结构的方法利用包含非交联显影光致抗蚀剂的负色调图案化光致抗蚀剂层。 显影的光致抗蚀剂不溶于用于能够自组装的材料的有机浇铸溶剂中。 显影的光致抗蚀剂可溶于含水碱性显影剂和/或第二有机溶剂。 将包含能够自组装的材料和有机浇铸溶剂的溶液浇铸在图案化的光致抗蚀剂层上。 在去除有机浇注溶剂时，材料自组装，从而形成层状结构。

公开(公告)号：US07910290B2

公开(公告)日：2011-03-22

申请号：US12128129

申请日：2008-05-28

申请人： Robert David Allen ,  Ratnam Sooriyakumaran ,  Linda Karin Sundberg

发明人： Robert David Allen ,  Ratnam Sooriyakumaran ,  Linda Karin Sundberg

IPC分类号： G03F7/20 ,  G03F7/30 ,  G03F7/38 ,  G03F7/40 ,  G03F7/11

CPC分类号： C08G77/04 ,  C08G77/045 ,  G03F7/0752 ,  G03F7/11 ,  G03F7/2041

摘要： A method of forming an image using a topcoat composition. A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.

摘要翻译： 使用面漆组合物形成图像的方法。 提供了式TmR3的官能化多面体低聚倍半硅氧烷衍生物，其中m等于8,10或12，QnMnR1，R2，R3其中n等于8,10或12的组合物。 官能团包括碱水溶性部分。 官能化多面体低聚倍半硅氧烷衍生物的混合物非常适合用作光刻和浸没光刻应用中的光致抗蚀剂的顶涂层。

公开(公告)号：US20090142714A1

公开(公告)日：2009-06-04

申请号：US12336922

申请日：2008-12-17

申请人： Hiroshi Ito ,  Linda Karin Sundberg

发明人： Hiroshi Ito ,  Linda Karin Sundberg

IPC分类号： G03F7/20 ,  C08G63/66

CPC分类号： G03F7/2041 ,  G03F7/0046 ,  G03F7/11

摘要： A method of forming an image on a photoresist. The method includes: forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation of a topcoat material over the photoresist; exposing the photoresist to radiation, the radiation changing a chemical composition of the regions of the photoresist exposed to the radiation, forming exposed and unexposed regions in the photoresist; and removing i) the topcoat material and ii) the exposed regions of the photoresist or the unexposed regions of the photoresist.

摘要翻译： 在光致抗蚀剂上形成图像的方法。 该方法包括：在衬底上形成光致抗蚀剂; 将面漆组合物，包含至少一种含氟聚合物和浇铸溶剂的面漆组合物涂覆到光致抗蚀剂上; 除去顶涂层组合物的浇铸溶剂，导致在光致抗蚀剂上形成顶涂层材料; 将光致抗蚀剂暴露于辐射，辐射改变暴露于辐射的光刻胶的区域的化学组成，在光致抗蚀剂中形成暴露和未曝光的区域; 并去除i）面漆材料和ii）光致抗蚀剂的曝光区域或光致抗蚀剂的未曝光区域。