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1.发明授权Transfer method for a mask or substrate, storage box, apparatus adapted for use in such method, and device manufacturing method including such a transfer method 有权用于掩模或基材的转移方法，储存盒，适用于这种方法的装置以及包括这种转印方法的装置制造方法公开(公告)号：US06753945B2
公开(公告)日：2004-06-22
申请号：US10374511
申请日：2003-02-27
申请人： Gert-Jan Heerens , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Robert Gabriel Maria Lansbergen , Erik Leonardus Ham
发明人： Gert-Jan Heerens , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Robert Gabriel Maria Lansbergen , Erik Leonardus Ham
IPC分类号： G03B2742
CPC分类号： G03F1/66 , G03F7/70741 , G03F7/7075 , G03F7/70916 , G03F7/70991 , Y10S414/139
摘要： A method for transferring one or more substrates or masks in a storage box to an apparatus for handling, processing or using the substrates or masks or vice versa, the storage box including a cover having an openable cover part. The method includes providing the storage box onto an openable wall part of a wall of an enclosed protective environment of the apparatus such that the openable cover part overlaps the openable wall part, the protective environment being adapted to be filled with an inert gas or to be evacuated; opening the openable cover part and the openable wall part, whereby the cover of the storage box forms part of the wall of the protective environment and an inside of the storage box becomes part of the protective environment; and transferring at least one of the substrates or masks from an inside space of the storage box to an inside space of the protective environment, or vice versa.
摘要翻译： 一种用于将存储箱中的一个或多个衬底或掩模转移到用于处理，处理或使用衬底或掩模的装置或反之亦然的方法，所述存储盒包括具有可打开的盖部分的盖。 该方法包括将存放箱设置在设备的封闭保护环境的壁的可打开的壁部分上，使得可打开的盖部分与可开启的壁部分重叠，保护环境适于填充惰性气体，或者为 疏散 打开可打开的盖部分和可打开的壁部分，由此存储箱的盖形成保护环境的壁的一部分，并且存储箱的内部成为保护环境的一部分; 以及将所述基板或掩模中的至少一个从所述存储箱的内部空间传送到所述保护环境的内部空间，反之亦然。
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公开(公告)号：US07053980B2
公开(公告)日：2006-05-30
申请号：US10762568
申请日：2004-01-23
CPC分类号： G03F9/7096 , G03F7/70741 , G03F7/7075 , G03F7/70858 , G03F9/7011 , G03F9/7015
摘要： A lithographic apparatus equipped with an alignment system is presented herein. In one embodiment, the lithographic apparatus includes an illumination system that provides a beam of radiation, a patterning device that imparts the beam of radiation with a desired pattern in its cross-section and is supported by a support structure, a substrate holder that holds a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a conditioned chamber. The apparatus also includes an actuator that introduces either the patterning device or the substrate into the conditioned chamber and an alignment system, which is disposed outside the conditioned chamber, that positions the patterning device or the substrate in alignment with the projected patterned beam of radiation.
摘要翻译： 本文介绍了配备有对准系统的光刻设备。 在一个实施例中，光刻设备包括提供辐射束的照明系统，在其横截面中赋予所需图案的辐射束并由支撑结构支撑的图案形成装置， 基板，将图案化的光束投射到基板的目标部分上的投影系统和调节室。 该装置还包括将图案形成装置或基板引入调节室的致动器以及设置在调节室外部的对准系统，其使图案形成装置或基板与投影的图案化的辐射束对准。
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3.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby with docking system for positioning a patterning device 失效平版印刷设备，器件制造方法和由此制造的器件具有用于定位图案形成装置的对接系统公开(公告)号：US07423733B2
公开(公告)日：2008-09-09
申请号：US10894367
申请日：2004-07-20
申请人： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Gert-Jan Heerens , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra
发明人： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Gert-Jan Heerens , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra
IPC分类号： G03B27/62
CPC分类号： G03F7/707 , G03F7/70716 , G03F7/70741 , G03F7/70783 , G03F7/70825 , G03F7/709
摘要： The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.
摘要翻译： 本发明涉及一种光刻设备，其包括用于相对于标线片台定位图案形成装置（例如掩模版）的对接系统。 光刻投影设备具有包括投影相的操作周期，其中标线片载物台承载图案形成装置和交换相，其中图案形成装置被更换，并且对接系统相对于掩模版台定位图案形成装置。 对接系统被配置为在投影阶段与图案形成装置间隔开，以便确保获得更高的投影图像精度。
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公开(公告)号：US20050134830A1
公开(公告)日：2005-06-23
申请号：US10740822
申请日：2003-12-22
CPC分类号： G03F7/707 , G03F7/70741 , G03F7/70825
摘要： A lithographic apparatus equipped with a patterning device safety mechanism, is presented herein. In one embodiment, the apparatus comprises an illumination system for providing a beam of radiation, a support structure for supporting a patterning device that serves to impart the beam of radiation with a pattern in its cross-section, a substrate holder for holding a substrate having a plurality of target portions, a projection system for projecting the patterned beam onto the substrate target portions, a connector for securing the patterning device relative to the support structure; and a safety mechanism configured to reduce uncontrolled displacement of the patterning device in case of failure of the connector.
摘要翻译： 本文介绍了一种配有图案形成装置安全机构的光刻设备。 在一个实施例中，该装置包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，其用于使辐射束在其横截面上具有图案;衬底保持器，用于保持具有 多个目标部分，用于将图案化光束投影到基板目标部分上的投影系统，用于将图案形成装置相对于支撑结构固定的连接器; 以及安全机构，其构造成在连接器故障的情况下减少图案形成装置的不受控制的位移。
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公开(公告)号：US07839489B2
公开(公告)日：2010-11-23
申请号：US11812166
申请日：2007-06-15
CPC分类号： G03B27/42 , G03B27/62 , G03F7/707 , G03F7/70741 , G03F9/7003 , G03F9/7011 , G03F9/7088 , G03F9/7096
摘要： A system for use in a lithographic apparatus includes an assembly of a reticle and a reticle holder. The reticle includes a marker. The system also includes a position detector arranged to detect the reticle marker to position the reticle with respect to the reticle holder, and a storage container constructed and arranged to store the assembly during the positioning of the reticle with respect to the reticle holder. The reticle holder and the detector are arranged to be kinematically aligned with respect to each other.
摘要翻译： 用于光刻设备的系统包括光罩和光罩保持器的组件。 标线包括标记。 该系统还包括位置检测器，其布置成检测掩模版标记物以相对于光罩保持器定位光罩;以及存储容器，其被构造和布置成在掩模版相对于光罩保持器定位期间存储组件。 掩模版保持器和检测器被布置成相对于彼此以运动方式对准。
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公开(公告)号：US07466397B2
公开(公告)日：2008-12-16
申请号：US10894361
申请日：2004-07-20
CPC分类号： G03F7/707 , G03F7/70716 , G03F7/70741 , G03F7/70783 , G03F7/70825 , G03F7/709
摘要： A lithographic apparatus equipped with a patterning device safety mechanism, is presented herein. In one embodiment, the apparatus comprises an illumination system for providing a beam of radiation, a support structure for supporting a patterning device that serves to impart the beam of radiation with a pattern in its cross-section, a substrate holder for holding a substrate having a plurality of target portions, a projection system for projecting the patterned beam onto the substrate target portions, a connector for securing the patterning device relative to the support structure, and a safety mechanism configured to reduce uncontrolled displacement of the patterning device in case of failure of the connector.
摘要翻译： 本文介绍了一种配有图案形成装置安全机构的光刻设备。 在一个实施例中，该装置包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，其用于使辐射束在其横截面上具有图案;衬底保持器，用于保持具有 多个目标部分，用于将图案化光束投影到基板目标部分上的投影系统，用于将图案形成装置相对于支撑结构固定的连接器，以及安全机构，其被配置为减少图案形成装置在失败时的不受控制的位移 的连接器。
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公开(公告)号：US07236233B2
公开(公告)日：2007-06-26
申请号：US10962751
申请日：2004-10-13
CPC分类号： G03F7/707
摘要： An assembly for use in a lithographic apparatus is disclosed. The assembly includes a reticle, and a reticle holder. The reticle holder is adjustable between a form closed reticle blocking state and a reticle releasing state. The reticle holder is arranged to (1) prevent movement of the reticle with respect to the reticle holder in at least one direction without friction when the reticle holder is in the form closed reticle blocking state, and (2) release the reticle when the reticle holder is in the reticle releasing state.
摘要翻译： 公开了一种用于光刻设备的组件。 组件包括掩模版和掩模版保持器。 标线架支架在形状闭合的掩模版阻挡状态和掩模版释放状态之间是可调节的。 所述标线架保持器布置为：（1）当所述标线架保持器处于封闭掩模版阻挡状态时，防止所述掩模版相对于所述标线架保持器在至少一个方向上的移动而不产生摩擦，并且（2）当所述标线片 支架处于分划板释放状态。
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8.发明授权Alignment marker and lithographic apparatus and device manufacturing method using the same 有权对准标记和光刻设备及使用其的器件制造方法公开(公告)号：US07781237B2
公开(公告)日：2010-08-24
申请号：US11147114
申请日：2005-06-08
申请人： Gert-Jan Heerens , Anastasius Jacobus Anicetus Bruinsma , Jacob Fredrik Frisco Klinkhamer , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Hubert Adriaan Van Mierlo , Willem Arthur Vliegenthart
发明人： Gert-Jan Heerens , Anastasius Jacobus Anicetus Bruinsma , Jacob Fredrik Frisco Klinkhamer , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Hubert Adriaan Van Mierlo , Willem Arthur Vliegenthart
CPC分类号： G03F9/7065 , G03F9/7076 , G03F9/7088
摘要： An apparatus includes a first support structure configured to support an element that has an alignment marker provided with at least one height difference. The apparatus also includes an alignment sensor comprising a light source that is configured to provide a light beam that illuminates the alignment marker; and at least one detector configured to detect the at least one height difference of the alignment marker by analyzing the light beam reflected by the alignment marker. Such an apparatus may be used to align of the element with respect to the first support structure.
摘要翻译： 一种装置包括：第一支撑结构，其构造成支撑具有设置有至少一个高度差的对准标记的元件。 该装置还包括对准传感器，该对准传感器包括被配置为提供照射对准标记的光束的光源; 以及至少一个检测器，被配置为通过分析由所述对准标记物反射的光束来检测所述对准标记的所述至少一个高度差。 可以使用这样的装置来相对于第一支撑结构对准元件。
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公开(公告)号：US07084961B2
公开(公告)日：2006-08-01
申请号：US10740822
申请日：2003-12-22
CPC分类号： G03F7/707 , G03F7/70741 , G03F7/70825
摘要： A lithographic apparatus equipped with a patterning device safety mechanism, is presented herein. In one embodiment, the apparatus comprises an illumination system for providing a beam of radiation, a support structure for supporting a patterning device that serves to impart the beam of radiation with a pattern in its cross-section, a substrate holder for holding a substrate having a plurality of target portions, a projection system for projecting the patterned beam onto the substrate target portions, a connector for securing the patterning device relative to the support structure; and a safety mechanism configured to reduce uncontrolled displacement of the patterning device in case of failure of the connector.
摘要翻译： 本文介绍了一种配有图案形成装置安全机构的光刻设备。 在一个实施例中，该装置包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，其用于使辐射束在其横截面上具有图案;衬底保持器，用于保持具有 多个目标部分，用于将图案化光束投影到基板目标部分上的投影系统，用于将图案形成装置相对于支撑结构固定的连接器; 以及安全机构，其构造成在连接器故障的情况下减少图案形成装置的不受控制的位移。
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公开(公告)号：US07202934B2
公开(公告)日：2007-04-10
申请号：US11015770
申请日：2004-12-20
申请人： Johannes Hubertus Josephina Moors , Erik Leonardus Ham , Gert-Jan Heerens , Paulus Martinus Maria Liebregts , Erik Roelof Loopstra , Henri Gerard Cato Werij
发明人： Johannes Hubertus Josephina Moors , Erik Leonardus Ham , Gert-Jan Heerens , Paulus Martinus Maria Liebregts , Erik Roelof Loopstra , Henri Gerard Cato Werij
CPC分类号： G03F7/70933 , G03F7/70908
摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.
摘要翻译： 公开了一种布置成将图案从图案形成装置转印到基底上的光刻设备。 该装置包括光学隔室，其包含图案形成装置的图案化表面和光学元件，以及通过布置成将图案化的辐射束从光学元件传递到衬底的连接部连接到光学隔室的衬底隔室。 该装置还包括第一冲洗气体入口，其布置成将第一冲洗气体供应到连接中，第二冲洗气体入口与图案化表面相邻，并且布置成将第二冲洗气体供应到光学隔室中并且产生邻近图案化的区域 表面，其中第二冲洗气体沿具有垂直于和远离图案化表面的部件的方向流动;以及气泵，其布置成泵送来自光学隔室的冲洗气体。
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