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公开(公告)号：US06794110B2
公开(公告)日：2004-09-21
申请号：US10090646
申请日：2002-03-04
申请人： Gregory Breyta , Hiroshi Ito , Hoa D. Truong
发明人： Gregory Breyta , Hiroshi Ito , Hoa D. Truong
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , C08L33/16 , C08L2205/02 , G03F7/0046 , G03F7/0382 , Y10S430/108 , C08L2666/04
摘要： A polymer blend is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the polymer blend is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less than 250 nm, including wavelengths of 157 nm, 193 nm and 248 nm, and has improved sensitivity and resolution. Processes for preparing and using the polymer blend are also provided, as are lithographic photoresist compositions that contain the polymer blend.
摘要翻译： 提供聚合物共混物用于光刻抗蚀剂组合物，特别是化学扩增光致抗蚀剂。 在优选的实施方案中，聚合物共混物对深紫外辐射（即，波长小于250nm，包括157nm，193nm和248nm的波长）的辐射基本上是透明的，并且具有改进的灵敏度和分辨率。 还提供了制备和使用聚合物共混物的方法，以及含有聚合物共混物的平版光刻胶组合物。
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2.发明申请BILAYER SYSTEMS INCLUDING A POLYDIMETHYLGLUTARIMIDE-BASED BOTTOM LAYER AND COMPOSITIONS THEREOF 有权双层系统，其中包括基于聚二甲基硅氧烷的底层及其组合物公开(公告)号：US20110111339A1
公开(公告)日：2011-05-12
申请号：US12613800
申请日：2009-11-06
申请人： Joy Cheng , Ho-Cheol Kim , Hiroshi Ito , Atsuko Ito , Hoa D. Truong
发明人： Joy Cheng , Ho-Cheol Kim , Hiroshi Ito , Atsuko Ito , Hoa D. Truong
CPC分类号： G03F7/091 , G03F7/0392 , G03F7/095
摘要： Bilayer systems include a bottom layer formed of polydimethylglutarimide, an acid labile dissolution inhibitor and a photoacid generator. The bilayer system can be exposed and developed in a single exposure and development process.
摘要翻译： 双层体系包括由聚二甲基戊二酰亚胺形成的底层，酸不稳定溶解抑制剂和光酸产生剂。 双层系统可以在单一的曝光和开发过程中暴露和发展。
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3.发明授权Bilayer systems including a polydimethylglutarimide-based bottom layer and compositions thereof 有权双层体系包括聚二甲基戊二酰亚胺基底层及其组合物公开(公告)号：US08323868B2
公开(公告)日：2012-12-04
申请号：US12613800
申请日：2009-11-06
发明人： Joy Cheng , Ho-Cheol Kim , Hiroshi Ito , Hoa D. Truong
CPC分类号： G03F7/091 , G03F7/0392 , G03F7/095
摘要： Bilayer systems include a bottom layer formed of polydimethylglutarimide, an acid labile dissolution inhibitor and a photoacid generator. The bilayer system can be exposed and developed in a single exposure and development process.
摘要翻译： 双层体系包括由聚二甲基戊二酰亚胺形成的底层，酸不稳定溶解抑制剂和光酸产生剂。 双层系统可以在单一的曝光和开发过程中暴露和发展。
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公开(公告)号：US06277546B1
公开(公告)日：2001-08-21
申请号：US08345290
申请日：1994-11-28
申请人： Gregory Breyta , Nicholas Jeffries Clecak , William Dinan Hinsberg, III , Donald Clifford Hofer , Hiroshi Ito , Scott Arthur MacDonald , Ratnam Sooriyakumaran
发明人： Gregory Breyta , Nicholas Jeffries Clecak , William Dinan Hinsberg, III , Donald Clifford Hofer , Hiroshi Ito , Scott Arthur MacDonald , Ratnam Sooriyakumaran
IPC分类号： G03F726
CPC分类号： G03F7/168 , G03F7/0045 , G03F7/38
摘要： The present invention relates to an improved lithographic imaging process for use in the manufacture of integrated circuits. The process provides protection to the photoresist film from airborne chemical contaminants.
摘要翻译： 本发明涉及用于制造集成电路的改进的光刻成像方法。 该工艺为光致抗蚀剂膜提供了防止空气传播的化学污染物的保护。
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公开(公告)号：US6153696A
公开(公告)日：2000-11-28
申请号：US59861
申请日：1993-05-10
申请人： Gregory Breyta , Daniel Joseph Dawson , Moahmoud Mostafa Khojasteh , Ranee Wai-Ling Kwong , Elwood Herbert Macy , David Paul Merritt , Wayne Martin Moreau , Stanley Eugene Perreault , Harbans Singh Sachdev , Robert Lavin Wood , Hiroshi Ito
发明人： Gregory Breyta , Daniel Joseph Dawson , Moahmoud Mostafa Khojasteh , Ranee Wai-Ling Kwong , Elwood Herbert Macy , David Paul Merritt , Wayne Martin Moreau , Stanley Eugene Perreault , Harbans Singh Sachdev , Robert Lavin Wood , Hiroshi Ito
摘要： A process for the stoichiometric carbonation of a hydroxyaromatic material is provided which comprises the steps of (a) mixing together in a reaction vessel (1) a hydroxyaromatic material, (2) a sufficient amount of a dialkyl dicarbonate to give the desired degree of substitution, (3) a catalytic amount of an unhindered tertiary amine, and (4) a solvent, (b) stirring the reaction mixture, (c) precipitating the alkyl carbonate of the hydroxyaromatic material, and (d) recovering the alkyl carbonate of the hydroxyaromatic material.
摘要翻译： 提供了一种用于羟基芳族化合物的化学计量碳酸化的方法，其包括以下步骤：（a）在反应容器（1）中将羟基芳族化合物混合在一起，（2）足够量的二碳酸二烷基酯以产生所需的取代度 ，（3）催化量的不受阻碍的叔胺，和（4）溶剂，（b）搅拌反应混合物，（c）沉淀羟基芳族物质的碳酸烷基酯，和（d）回收碳酸烷基酯 羟基芳族化合物。
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公开(公告)号：US5625020A
公开(公告)日：1997-04-29
申请号：US571571
申请日：1995-12-13
IPC分类号： G03F7/004 , G03F7/039 , C08F220/12
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/108 , Y10S430/109 , Y10S430/111 , Y10S430/115 , Y10S430/121 , Y10S430/122
摘要： The present invention relates to an improved chemically amplified photoresist composition comprising (i) a photosensitive acid generator and (ii) a polymer comprising the reaction product of hydroxystyrene with acrylate, methacrylate or a mixture of acrylate and methacrylate.
摘要翻译： 本发明涉及一种改进的化学放大光致抗蚀剂组合物，其包含（i）光敏酸产生剂和（ii）包含羟基苯乙烯与丙烯酸酯，甲基丙烯酸酯或丙烯酸酯和甲基丙烯酸酯的混合物的反应产物的聚合物。
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公开(公告)号：US5585220A
公开(公告)日：1996-12-17
申请号：US566025
申请日：1995-12-01
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , Y10S430/111 , Y10S430/115
摘要： The invention relates to a polymeric, radiation-sensitive resist composition comprising (i) iodonium sulfonate radiation sensitive acid generator; (ii) a polymer; and (iii) an acid labile compound.
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公开(公告)号：US6165673A
公开(公告)日：2000-12-26
申请号：US813245
申请日：1997-03-07
申请人： Gregory Breyta , Richard Anthony DiPietro , Donald Clifford Hofer , Hiroshi Ito , Robert David Allen , Juliann Opitz , Thomas I. Wallow
发明人： Gregory Breyta , Richard Anthony DiPietro , Donald Clifford Hofer , Hiroshi Ito , Robert David Allen , Juliann Opitz , Thomas I. Wallow
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/122 , Y10S430/126
摘要： The invention relates to a polymeric, radiation-sensitive resist composition comprising (i) iodonium sulfonate radiation sensitive acid generator; (ii) a polymer; and (iii) an acid labile compound.
摘要翻译： 本发明涉及一种聚合物，辐射敏感性抗蚀剂组合物，其包含（i）碘磺酸盐辐射敏感性酸产生剂; （ii）聚合物; 和（iii）酸不稳定化合物。
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9.发明授权Photo acid generator compounds, photo resists, and method for improving bias 失效照片酸发生剂化合物，光致抗蚀剂和改善偏压的方法
公开(公告)号：US6074800A
公开(公告)日：2000-06-13
申请号：US64955
申请日：1998-04-23
申请人： Gregory Breyta , Phillip J. Brock , Daniel J. Dawson , Ronald A. DellaGuardia , Charlotte R. DeWan , Andrew R. Eckert , Hiroshi Ito , Premlatha Jagannathan , Leo L. Linehan , Kathleen H. Martinek , Wayne M. Moreau , Randolph J. Smith
发明人： Gregory Breyta , Phillip J. Brock , Daniel J. Dawson , Ronald A. DellaGuardia , Charlotte R. DeWan , Andrew R. Eckert , Hiroshi Ito , Premlatha Jagannathan , Leo L. Linehan , Kathleen H. Martinek , Wayne M. Moreau , Randolph J. Smith
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , Y10S430/115
摘要： Several mid UV photo acid generators (PAGs), a chemically amplified photo resist (CAMP), and method for improving nested to isolated line bias are provided. Similarly, photo speed may also be improved. Unlike conventional mid UV PAGs, the present invention's PAG compounds, resist composition, and method do not require a mid UV sensitizer. Specifically, PAGs are provided that bear a chromophore capable of receiving mid UV radiation, particularly I-line, and that are suitable for use in a chemically amplified photo resist having a photo speed of 500 mJ/cm.sup.2 or less, but preferrably 200 mJ/cm.sup.2 or less. For example, the PAGs can be a sulfonium or iodonium salt, such as anthryl, butyl, methyl sulfonium triflate and bis(4-t-butylphenyl)iodonium 9,10-dimethoxyanthracene sulfonate. The chromophore forming a part of the PAGs can be selected from polyaromatic hydrocarbons, for example, chrysenes, pyrenes, fluoranthenes, anthrones, benzophenones, thioxanthones, anthracenes, and phenanthrenes, but preferably anthracenes.
摘要翻译： 提供了几个中等紫外光酸产生剂（PAG），化学放大光抗蚀剂（CAMP）和改进嵌套到隔离线偏压的方法。 类似地，也可以提高照相速度。 与传统的中等紫外线PAG不同，本发明的PAG化合物，抗蚀剂组合物和方法不需要中等紫外线敏化剂。 具体地说，提供了能够承受中等紫外线辐射，特别是I线的发色团的PAG，并且适合用于光速为500mJ / cm 2以下但优选为200mJ / cm 2的化学放大型光致抗蚀剂的PAG， cm2以下。 例如，PAG可以是锍或碘鎓盐，例如蒽基，丁基，甲基锍三氟甲磺酸酯和双（4-叔丁基苯基）碘9,10-二甲氧基蒽磺酸盐。 形成PAG的一部分的发色团可以选自多芳族烃，例如氯仿，芘，荧蒽，蒽，二苯甲酮，噻吨酮，蒽和菲，但优选为蒽。
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公开(公告)号：US5492793A
公开(公告)日：1996-02-20
申请号：US241931
申请日：1994-05-11
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/108 , Y10S430/109 , Y10S430/111 , Y10S430/115 , Y10S430/121 , Y10S430/122
摘要： The present invention relates to an improved chemically amplified photoresist composition comprising (i) a photosensitive acid generator and (ii) a polymer comprising the reaction product of hydroxystyrene with acrylate, methacrylate or a mixture of acrylate and methacrylate.
摘要翻译： 本发明涉及一种改进的化学放大光致抗蚀剂组合物，其包含（i）光敏酸产生剂和（ii）包含羟基苯乙烯与丙烯酸酯，甲基丙烯酸酯或丙烯酸酯和甲基丙烯酸酯的混合物的反应产物的聚合物。
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