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公开(公告)号：US06794110B2
公开(公告)日：2004-09-21
申请号：US10090646
申请日：2002-03-04
申请人： Gregory Breyta , Hiroshi Ito , Hoa D. Truong
发明人： Gregory Breyta , Hiroshi Ito , Hoa D. Truong
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , C08L33/16 , C08L2205/02 , G03F7/0046 , G03F7/0382 , Y10S430/108 , C08L2666/04
摘要： A polymer blend is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the polymer blend is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less than 250 nm, including wavelengths of 157 nm, 193 nm and 248 nm, and has improved sensitivity and resolution. Processes for preparing and using the polymer blend are also provided, as are lithographic photoresist compositions that contain the polymer blend.
摘要翻译： 提供聚合物共混物用于光刻抗蚀剂组合物，特别是化学扩增光致抗蚀剂。 在优选的实施方案中，聚合物共混物对深紫外辐射（即，波长小于250nm，包括157nm，193nm和248nm的波长）的辐射基本上是透明的，并且具有改进的灵敏度和分辨率。 还提供了制备和使用聚合物共混物的方法，以及含有聚合物共混物的平版光刻胶组合物。
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公开(公告)号：US07014980B2
公开(公告)日：2006-03-21
申请号：US10916934
申请日：2004-08-12
申请人： Robert David Allen , Gregory Breyta , Phillip Brock , Richard A. DiPietro , Debra Fenzel-Alexander , Carl Larson , David R. Medeiros , Dirk Pfeiffer , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory M. Wallraff
发明人： Robert David Allen , Gregory Breyta , Phillip Brock , Richard A. DiPietro , Debra Fenzel-Alexander , Carl Larson , David R. Medeiros , Dirk Pfeiffer , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory M. Wallraff
CPC分类号： C08F220/22 , C08F220/28 , G03F7/0046 , G03F7/0382 , Y10S430/108
摘要： A photoresist composition is provided that includes a polymer having at least one acrylate or methacrylate monomer having a formula where R1 represents hydrogen (H), a linear or branched alkyl group of 1 to 20 carbons, or a semi- or perfluorinated linear or branched alkyl group of 1 to 20 carbons; and where R2 represents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl (CF3) group attached to each carbon of the substituted aliphatic group, or a substituted or unsubstituted aromatic group; and where R3 represents hydrogen (H), methyl (CH3), trifluoromethyl (CF3), difluoromethyl(CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated aliphatic chain; and where R4 represents trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group. A method of patterning a substrate using the photoresist composition is also provided herein.
摘要翻译： 提供了一种光致抗蚀剂组合物，其包括具有至少一个具有下式的丙烯酸酯或甲基丙烯酸酯单体的聚合物，其中R 1表示氢（H），1至20个碳的直链或支链烷基或 1至20个碳的半或全氟化直链或支链烷基; 其中R 2表示未取代的脂族基团或具有与取代的脂族基团的每个碳上连接的具有0或1个三氟甲基（CF 3 N 3）基团的取代的脂族基团，或 取代或未取代的芳基; 其中R 3表示氢（H），甲基（CH 3），三氟甲基（CF 3），二氟甲基（CHF 2） （CH 2 CO 2），或半或全氟化脂族链; 并且其中R 4表示三氟甲基（CF 3 S），二氟甲基（CH 2）2，氟甲基（CH 2 CH 2） ）或半或全氟取代或未取代的脂族基团。 本文还提供了使用光致抗蚀剂组合物图案化衬底的方法。
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3.发明授权Method for using compositions containing fluorocarbinols in lithographic processes 有权在光刻工艺中使用含有氟代甲醇的组合物的方法公开(公告)号：US08124327B2
公开(公告)日：2012-02-28
申请号：US12794208
申请日：2010-06-04
IPC分类号： G03F7/20
CPC分类号： G03F7/0046 , G03F7/0382 , G03F7/0395 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating the film to a temperature of, at, or below about 90° C. and developing the image. The present invention also relates to a method for generating a photoresist image on a substrate where a polymer comprising fluorocarbinol monomers is used as a protective top coat.
摘要翻译： 本发明涉及一种在衬底上产生光刻胶图像的方法。 该方法包括用包含含氟甲醇单体的聚合物的膜涂覆基材; 将膜成像曝光于辐射; 将膜加热至约90℃或低于约90℃的温度并显影图像。 本发明还涉及一种在基材上产生光致抗蚀剂图像的方法，其中使用含有氟甲醇单体的聚合物作为保护面漆。
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公开(公告)号：US07135595B2
公开(公告)日：2006-11-14
申请号：US11330659
申请日：2006-01-12
申请人： Robert David Allen , Gregory Breyta , Phillip Brock , Richard A. DiPietro , Debra Fenzel-Alexander , Carl Larson , David R. Medeiros , Dirk Pfeiffer , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory M. Wallraff
发明人： Robert David Allen , Gregory Breyta , Phillip Brock , Richard A. DiPietro , Debra Fenzel-Alexander , Carl Larson , David R. Medeiros , Dirk Pfeiffer , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory M. Wallraff
IPC分类号： C08F118/00 , C08F18/20 , C08F120/22 , C07C69/62 , C07C69/52
CPC分类号： C08F220/22 , C08F220/28 , G03F7/0046 , G03F7/0382 , Y10S430/108
摘要： A photoresist composition is provided that includes a polymer having at least one acrylate or methacrylate monomer having a formula where R1 represents hydrogen (H), a linear or branched alkyl group of 1 to 20 carbons, or a semi- or perfluorinated linear or branched alkyl group of 1 to 20 carbons; and where R2 represents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl (CF3) group attached to each carbon of the substituted aliphatic group, or a substituted or unsubstituted aromatic group; and where R3 represents hydrogen (H), methyl (CH3), trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated aliphatic chain; and where R4 represents trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group. A method of patterning a substrate using the photoresist composition is also provided herein.
摘要翻译： 提供了一种光致抗蚀剂组合物，其包括具有至少一个具有下式的丙烯酸酯或甲基丙烯酸酯单体的聚合物，其中R 1表示氢（H），1至20个碳的直链或支链烷基或 1至20个碳的半或全氟化直链或支链烷基; 其中R 2表示未取代的脂族基团或具有与取代的脂族基团的每个碳上连接的具有0或1个三氟甲基（CF 3 N 3）基团的取代的脂族基团，或 取代或未取代的芳基; 其中R 3表示氢（H），甲基（CH 3），三氟甲基（CF 3），二氟甲基（CHF 2） （CH 2 CO 2），或半或全氟化脂族链; 并且其中R 4表示三氟甲基（CF 3 S），二氟甲基（CH 2）2，氟甲基（CH 2 CH 2） ）或半或全氟取代或未取代的脂族基团。 本文还提供了使用光致抗蚀剂组合物图案化衬底的方法。
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公开(公告)号：US07820369B2
公开(公告)日：2010-10-26
申请号：US10729452
申请日：2003-12-04
申请人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory Michael Wallraff
发明人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory Michael Wallraff
IPC分类号： G03F7/30
CPC分类号： G03F7/0392 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： Polymers containing an acetal or ketal linkage and their use in lithographic photoresist compositions, particularly in chemical amplification photoresists, are provided. The polymer is prepared from at least one first olefinic monomer containing an acetal or ketal linkage, the acid-catalyzed cleavage of which renders the polymer soluble in aqueous base; and at least one second olefinic monomer selected from (i) an olefinic monomer containing a pendant fluorinated hydroxyalkyl group RH, (ii) an olefinic monomer containing a pendant fluorinated alkylsulfonamide group RS, and (iii) combinations thereof. The acetal or ketal linkage may be contained within an acid-cleavable substituent RCL in the first olefinic monomer. A method for using the photoresist compositions containing these polymers in preparing a patterned substrate is also provided in which the polymer is rendered soluble in aqueous base at a temperature of less than about 100° C. by acid-catalyzed deprotection of pendent acetal- or ketal-protected carboxylic acid groups.
摘要翻译： 提供了含有缩醛或缩酮键的聚合物及其在平版光刻胶组合物中的用途，特别是在化学放大光致抗蚀剂中。 聚合物由至少一种含有缩醛或缩酮键的第一烯属单体制备，其酸催化裂解使聚合物可溶于碱水溶液; 和至少一种第二烯烃单体，其选自（i）含有侧氟化羟烷基RH的烯烃单体，（ii）含有侧氟化烷基磺酰胺基RS的烯烃单体，和（iii）其组合。 缩醛或缩酮键可以包含在第一烯属单体中的酸可裂解取代基RCL中。 还提供了一种使用含有这些聚合物的光致抗蚀剂组合物来制备图案化基材的方法，其中聚合物在低于约100℃的温度下可溶于碱水溶液，通过酸催化的侧链缩醛或缩酮脱保护 保护的羧酸基团。
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6.发明授权Method for using compositions containing fluorocarbinols in lithographic processes 失效在光刻工艺中使用含有氟代甲醇的组合物的方法公开(公告)号：US07781157B2
公开(公告)日：2010-08-24
申请号：US11495038
申请日：2006-07-28
CPC分类号： G03F7/0046 , G03F7/0382 , G03F7/0395 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating the film to a temperature of, at, or below about 90° C. and developing the image. The present invention also relates to a method for generating a photoresist image on a substrate where a polymer comprising fluorocarbinol monomers is used as a protective top coat.
摘要翻译： 本发明涉及一种在衬底上产生光刻胶图像的方法。 该方法包括用包含含氟甲醇单体的聚合物的膜涂覆基材; 将膜成像曝光于辐射; 将膜加热至约90℃或低于约90℃的温度并显影图像。 本发明还涉及一种在基材上产生光致抗蚀剂图像的方法，其中使用含有氟甲醇单体的聚合物作为保护性面漆。
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公开(公告)号：US07193023B2
公开(公告)日：2007-03-20
申请号：US10729169
申请日：2003-12-04
申请人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory Michael Wallraff
发明人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory Michael Wallraff
IPC分类号： C08F112/68
CPC分类号： G03F7/0046 , G03F7/0397
摘要： Polymers containing an acetal or ketal linkage and their use in lithographic photoresist compositions, particularly in chemical amplification photoresists, are provided. The polymer is prepared from at least one first olefinic monomer containing an acetal or ketal linkage, the acid-catalyzed cleavage of which renders the polymer soluble in aqueous base; and at least one second olefinic monomer selected from (i) an olefinic monomer containing a pendant fluorinated hydroxyalkyl group RH, (ii) an olefinic monomer containing a pendant fluorinated alkylsulfonamide group RS, and (iii) combinations thereof. The acetal or ketal linkage may be contained within an acid-cleavable substituent RCL in the first olefinic monomer. A method for using the photoresist compositions containing these polymers in preparing a patterned substrate is also provided in which the polymer is rendered soluble in aqueous base at a temperature of less than about 100° C. by acid-catalyzed deprotection of pendent acetal- or ketal-protected carboxylic acid groups.
摘要翻译： 提供了含有缩醛或缩酮键的聚合物及其在平版光刻胶组合物中的用途，特别是在化学放大光致抗蚀剂中。 聚合物由至少一种含有缩醛或缩酮键的第一烯属单体制备，其酸催化裂解使聚合物可溶于碱水溶液; 和至少一种第二烯烃单体，其选自（i）含有侧氟化羟烷基R H的烯烃单体，（ii）含有侧氟化烷基磺酰胺基R S的烯属单体， SUP），和（iii）其组合。 缩醛或缩酮键可以包含在第一烯烃单体中的酸可裂解取代基R CL中。 还提供了一种使用含有这些聚合物的光致抗蚀剂组合物来制备图案化基材的方法，其中聚合物在低于约100℃的温度下可溶于碱水溶液，通过酸催化的侧链缩醛或缩酮脱保护 保护的羧酸基团。
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8.发明申请Method for Using Compositions Containing Fluorocarbinols in Lithographic Processes 有权在平版印刷方法中使用含有氟代甲醇的组合物的方法公开(公告)号：US20100239985A1
公开(公告)日：2010-09-23
申请号：US12794208
申请日：2010-06-04
IPC分类号： G03F7/20
CPC分类号： G03F7/0046 , G03F7/0382 , G03F7/0395 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating the film to a temperature of, at, or below about 90° C. and developing the image. The present invention also relates to a method for generating a photoresist image on a substrate where a polymer comprising fluorocarbinol monomers is used as a protective top coat.
摘要翻译： 本发明涉及一种在衬底上产生光刻胶图像的方法。 该方法包括用包含含氟甲醇单体的聚合物的膜涂覆基材; 将膜成像曝光于辐射; 将膜加热至约90℃或低于约90℃的温度并显影图像。 本发明还涉及一种在基材上产生光致抗蚀剂图像的方法，其中使用含有氟甲醇单体的聚合物作为保护性面漆。
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9.发明申请Method for using compositions containing fluorocarbinols in lithographic processes 失效在光刻工艺中使用含有氟代甲醇的组合物的方法公开(公告)号：US20080026317A1
公开(公告)日：2008-01-31
申请号：US11495038
申请日：2006-07-28
IPC分类号： G03C1/00
CPC分类号： G03F7/0046 , G03F7/0382 , G03F7/0395 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating the film to a temperature of, at, or below about 90° C. and developing the image. The present invention also relates to a method for generating a photoresist image on a substrate where a polymer comprising fluorocarbinol monomers is used as a protective top coat.
摘要翻译： 本发明涉及一种在衬底上产生光刻胶图像的方法。 该方法包括用包含含氟甲醇单体的聚合物的膜涂覆基材; 将膜成像曝光于辐射; 将膜加热至约90℃或低于约90℃的温度并显影图像。 本发明还涉及一种在基材上产生光致抗蚀剂图像的方法，其中使用含有氟甲醇单体的聚合物作为保护性面漆。
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公开(公告)号：US06806026B2
公开(公告)日：2004-10-19
申请号：US10159635
申请日：2002-05-31
申请人： Robert David Allen , Gregory Breyta , Phillip Brock , Richard A. DiPietro , Debra Fenzel-Alexander , Carl Larson , David R. Medeiros , Dirk Pfeiffer , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory M. Wallraff
发明人： Robert David Allen , Gregory Breyta , Phillip Brock , Richard A. DiPietro , Debra Fenzel-Alexander , Carl Larson , David R. Medeiros , Dirk Pfeiffer , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory M. Wallraff
IPC分类号： G03F7039
CPC分类号： C08F220/22 , C08F220/28 , G03F7/0046 , G03F7/0382 , Y10S430/108
摘要： A photoresist composition is provided that includes a polymer having at least one acrylate or methacrylate monomer having a formula: where R1 represents hydrogen (H), a linear or branched alkyl group of 1 to 20 carbons, or a semi- or perfluorinated linear or branched alkyl group of 1 to 20 carbons; and where R2 represents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl (CF3) group attached to each carbon of the substituted aliphatic group, or a substituted or unsubstituted aromatic group; and where R3 represents hydrogen (H), methyl (CH3), trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated aliphatic chain; and where R4 represents trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group. A method of patterning a substrate using the photoresist composition is also provided herein.
摘要翻译： 提供了一种光致抗蚀剂组合物，其包括具有至少一种具有下式的丙烯酸酯或甲基丙烯酸酯单体的聚合物：其中R 1表示氢（H），1-20个碳的直链或支链烷基，或半或全氟 1〜20个碳原子的直链或支链烷基; 并且其中R 2表示未取代的脂族基团或具有连接在取代的脂族基团的每个碳上的零个或一个三氟甲基（CF 3）基团的取代的脂族基团，或取代或未取代的芳族基团; 并且其中R 3表示氢（H），甲基（CH 3），三氟甲基（CF 3），二氟甲基（CHF 2），氟甲基（CH 2 F）或半或全氟化脂族链; 并且其中R 4表示三氟甲基（CF 3），二氟甲基（CHF 2），氟甲基（CH 2 F）或半或全氟取代或未取代的脂族基团。 本文还提供了使用光致抗蚀剂组合物图案化衬底的方法。
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