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公开(公告)号：US12142450B2
公开(公告)日：2024-11-12
申请号：US18021457
申请日：2021-06-09
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Tomohiko Hirano , Hiroyuki Taketomi , Motohiro Suyama , Wataru Matsudaira , Akihiro Kageyama , Kota Iwasaki , Taku Yamada
Abstract: A photoelectric-surface electron source includes: a glass substrate that receives laser light from a substrate light-receiving surface including microlenses and that focuses the laser light toward a substrate main surface located on the opposite side from the substrate light-receiving surface; a photoelectric surface that is provided to the substrate main surface, and that receives the focused laser light and emits photoelectrons; and an extraction electrode that is fixed to the substrate main surface and that extracts the photoelectrons from the photoelectric surface. The extraction electrode is disposed away from the photoelectric surface along the normal direction of the substrate main surface and has: an electrode part in which electrode holes for allowing the photoelectrons to pass therethrough are provided; and a frame part that is fixed to a region surrounding the photoelectric surface in the substrate main surface.
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公开(公告)号：US09728393B2
公开(公告)日：2017-08-08
申请号：US14437236
申请日：2013-09-06
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Yoshinori Honda , Hiroyuki Taketomi , Fumitsugu Fukuyo , Koji Kawai , Hidetsugu Takaoka , Takashi Suzuki
CPC classification number: H01J63/06 , B05D5/061 , C09K11/7774 , C09K2211/1416 , H01J9/221
Abstract: A target for ultraviolet light generation comprises a substrate adapted to transmit ultraviolet light therethrough and a light-emitting layer disposed on the substrate and generating ultraviolet light UV in response to an electron beam. The light-emitting layer includes a powdery or granular rare-earth-containing aluminum garnet crystal doped with an activator. The light-emitting layer has an ultraviolet light emission peak wavelength of 300 nm or shorter.
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3.发明申请TARGET FOR ULTRAVIOLET LIGHT GENERATION, ELECTRON BEAM-EXCITED ULTRAVIOLET LIGHT SOURCE, AND PRODUCTION METHOD FOR TARGET FOR ULTRAVIOLET LIGHT GENERATION 有权用于超紫外线光产生的目标，电子束激光紫外光源和用于超紫外线发光的目标的生产方法公开(公告)号：US20150294853A1
公开(公告)日：2015-10-15
申请号：US14437376
申请日：2013-09-06
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Yoshinori Honda , Hiroyuki Taketomi , Fumitsugu Fukuyo , Koji Kawai , Hidetsugu Takaoka , Norio Ichikawa , Takashi Suzuki
CPC classification number: H01J63/06 , C09K11/7774 , C23C16/40 , H01J63/04
Abstract: A target for ultraviolet light generation comprises a substrate adapted to transmit ultraviolet light therethrough and a light-emitting layer disposed on the substrate and generating ultraviolet light in response to an electron beam. The light-emitting layer includes a polycrystalline film constituted by an oxide polycrystal containing Lu and Si doped with an activator or a polycrystalline film constituted by a rare-earth-containing aluminum garnet polycrystal doped with an activator.
Abstract translation: 紫外光产生的目标包括适于透射紫外光的基板和设置在基板上的发光层，并响应于电子束产生紫外光。 发光层包括由掺杂有活化剂的Lu和Si的氧化物多晶体或由掺杂有活化剂的含稀土的铝石榴石多晶构成的多晶膜构成的多晶膜。
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Patent Agency Ranking
4.发明申请TARGET FOR ULTRAVIOLET LIGHT GENERATION, ELECTRON BEAM-EXCITED ULTRAVIOLET LIGHT SOURCE, AND PRODUCTION METHOD FOR TARGET FOR ULTRAVIOLET LIGHT GENERATION 有权用于超紫外线光产生的目标，电子束激光紫外光源和用于超紫外线发光的目标的生产方法公开(公告)号：US20150270116A1
公开(公告)日：2015-09-24
申请号：US14437345
申请日：2013-09-06
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Yoshinori Honda , Hiroyuki Taketomi , Fumitsugu Fukuyo , Koji Kawai , Hidetsugu Takaoka , Takashi Suzuki
IPC: H01J63/06
CPC classification number: H01J63/06 , C09K11/7774 , H01J63/04
Abstract: A target for ultraviolet light generation comprises a substrate adapted to transmit ultraviolet light therethrough and a light-emitting layer, disposed on the substrate, for generating ultraviolet light in response to an electron beam. The light-emitting layer includes a powdery or granular oxide crystal containing Lu and Si doped with an activator (e.g., Pr:LPS and Pr:LSO crystals).
Abstract translation: 紫外光产生的目标包括适于透射紫外光的基板和设置在基板上的用于响应于电子束产生紫外光的发光层。 发光层包括掺杂有活化剂（例如Pr：LPS和Pr：LSO晶体）的Lu和Si的粉末状或粒状氧化物晶体。
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5.发明申请TARGET FOR ULTRAVIOLET LIGHT GENERATION, ELECTRON BEAM-EXCITED ULTRAVIOLET LIGHT SOURCE, AND PRODUCTION METHOD FOR TARGET FOR ULTRAVIOLET LIGHT GENERATION 有权用于超紫外线光产生的目标，电子束激光紫外光源和用于超紫外线发光的目标的生产方法公开(公告)号：US20150287587A1
公开(公告)日：2015-10-08
申请号：US14437236
申请日：2013-09-06
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Yoshinori Honda , Hiroyuki Taketomi , Fumitsugu Fukuyo , Koji Kawai , Hidetsugu Takaoka , Takashi Suzuki
CPC classification number: H01J63/06 , B05D5/061 , C09K11/7774 , C09K2211/1416 , H01J9/221
Abstract: A target for ultraviolet light generation comprises a substrate adapted to transmit ultraviolet light therethrough and a light-emitting layer disposed on the substrate and generating ultraviolet light UV in response to an electron beam. The light-emitting layer includes a powdery or granular rare-earth-containing aluminum garnet crystal doped with an activator. The light-emitting layer has an ultraviolet light emission peak wavelength of 300 nm or shorter.
Abstract translation: 紫外光产生的目标包括适于透射紫外光的基板和设置在基板上的发光层，并响应于电子束产生紫外光UV。 发光层包含掺杂有活化剂的粉状或颗粒状含稀土的铝石榴石晶体。 发光层的紫外发光峰值波长为300nm以下。
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公开(公告)号：US10381215B2
公开(公告)日：2019-08-13
申请号：US15580335
申请日：2016-06-06
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Kohei Ikeda , Norio Ichikawa , Hiroyuki Taketomi
Abstract: A target for ultraviolet light generation 20A includes a sapphire substrate 21 that transmits ultraviolet light UV, an interlayer 22 that is in contact with the sapphire substrate 21, includes oxygen atoms and aluminum atoms in a composition, and transmits ultraviolet light UV, and a luminous layer 23 that is provided on the interlayer 22, includes oxide crystals containing rare earth elements to which an activator agent is added, and receives electron beams EB so as to generate ultraviolet light UV.
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公开(公告)号：US09852898B2
公开(公告)日：2017-12-26
申请号：US14437345
申请日：2013-09-06
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Yoshinori Honda , Hiroyuki Taketomi , Fumitsugu Fukuyo , Koji Kawai , Hidetsugu Takaoka , Takashi Suzuki
CPC classification number: H01J63/06 , C09K11/7774 , H01J63/04
Abstract: A target for ultraviolet light generation comprises a substrate adapted to transmit ultraviolet light therethrough and a light-emitting layer, disposed on the substrate, for generating ultraviolet light in response to an electron beam. The light-emitting layer includes a powdery or granular oxide crystal containing Lu and Si doped with an activator (e.g., Pr:LPS and Pr:LSO crystals).
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8.发明授权Target for ultraviolet light generation, electron beam-excited ultraviolet light source, and production method for target for ultraviolet light generation 有权用于紫外线产生的目标，电子束激发的紫外光源和用于紫外线产生的靶的制备方法公开(公告)号：US09240313B2
公开(公告)日：2016-01-19
申请号：US14437376
申请日：2013-09-06
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Yoshinori Honda , Hiroyuki Taketomi , Fumitsugu Fukuyo , Koji Kawai , Hidetsugu Takaoka , Norio Ichikawa , Takashi Suzuki
CPC classification number: H01J63/06 , C09K11/7774 , C23C16/40 , H01J63/04
Abstract: A target for ultraviolet light generation comprises a substrate adapted to transmit ultraviolet light therethrough and a light-emitting layer disposed on the substrate and generating ultraviolet light in response to an electron beam. The light-emitting layer includes a polycrystalline film constituted by an oxide polycrystal containing Lu and Si doped with an activator or a polycrystalline film constituted by a rare-earth-containing aluminum garnet polycrystal doped with an activator.
Abstract translation: 紫外光产生的目标包括适于透射紫外光的基板和设置在基板上的发光层，并响应于电子束产生紫外光。 发光层包括由掺杂有活化剂的Lu和Si的氧化物多晶体或由掺杂有活化剂的含稀土的铝石榴石多晶构成的多晶膜构成的多晶膜。
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