公开(公告)号：US10345518B1

公开(公告)日：2019-07-09

申请号：US15610396

申请日：2017-05-31

Applicant: HRL LABORATORIES LLC ,  HRL LABORATORIES LLC

Inventor： Daniel Yap ,  Troy Rockwood ,  Kevin Geary ,  Sarabjit Mehta

IPC: G02F1/035 ,  G02B6/10 ,  G01S7/495 ,  G02F1/025 ,  G02F1/295 ,  H01L33/64 ,  G01S13/44 ,  H01L21/768 ,  H01L23/48 ,  H01L23/498 ,  H01L23/522 ,  H01L33/62 ,  G01S7/481 ,  G02F1/01 ,  G02B3/00 ,  G02F1/015

Abstract: A photonic waveguide for conducting light having first and second wavelengths, the waveguide comprising superposed first and second strips of light conducting semiconductor materials having first and second refractive indexes, wherein the second wavelength is shorter than the first wavelength and the second refractive index is higher than the first refractive index, wherein the width and height of the first strip of light conducting semiconductor material are such that the first strip of light conducting semiconductor material is adapted to confine an optical mode of the first wavelength and the width and height of the second strip of light conducting semiconductor material are such that the second strip of light conducting semiconductor material is adapted to confine an optical mode of the second wavelength but is too narrow to confine an optical mode of the first wavelength.

公开(公告)号：US20180236113A1

公开(公告)日：2018-08-23

申请号：US15870082

申请日：2018-01-12

Applicant: HRL LABORATORIES, LLC

Inventor： Adam F. Gross ,  Kevin Geary ,  Shanying Cui

IPC: A61L2/10 ,  F21V8/00 ,  G02B5/00 ,  A61L2/26

CPC classification number: A61L2/10 ,  A61L2/238 ,  A61L2/26 ,  A61L2202/11 ,  G02B5/008 ,  G02B6/0023 ,  G02B6/003 ,  G02B6/0043 ,  G02B6/0065 ,  G02B6/0066 ,  G02B6/102

Abstract: A self-sanitizing surface structure configured to selectively refract light, a method of fabricating a self-sanitizing surface configured to selectively refract light, and a method of decontaminating a surface using selectively refracted light. A waveguide including a support layer below a propagating layer is positioned over a substrate as a self-sanitizing layer. In the absence of a contaminant or residue on the waveguide, UV light injected into the propagating layer is constrained within the propagating layer due to total internal reflection. When a residue is present on the self-sanitizing surface structure, light may be selectively refracted at or near the interface with the residue along the side of the waveguide to destroy the residue. The self-sanitizing surface structure may be configured to refract a suitable amount of UV light in response to a particular type of residue or application.

公开(公告)号：US09726818B1

公开(公告)日：2017-08-08

申请号：US14290979

申请日：2014-05-29

Applicant: HRL LABORATORIES LLC

Inventor： Daniel Yap ,  Troy Rockwood ,  Kevin Geary ,  Sarabjit Mehta

IPC: G02F1/035 ,  G02B6/10 ,  G02F1/01 ,  G02F1/025

CPC classification number: G02B6/10 ,  G01S7/4815 ,  G01S7/4817 ,  G01S7/495 ,  G01S13/4463 ,  G02B3/0056 ,  G02F1/0147 ,  G02F1/025 ,  G02F1/2955 ,  G02F2001/0151 ,  H01L21/76879 ,  H01L23/481 ,  H01L23/49827 ,  H01L23/5226 ,  H01L33/62 ,  H01L33/64

Abstract: A photonic waveguide for conducting light having first and second wavelengths, the waveguide comprising superposed first and second strips of light conducting semiconductor materials having first and second refractive indexes, wherein the second wavelength is shorter than the first wavelength and the second refractive index is higher than the first refractive index, wherein the width and height of the first strip of light conducting semiconductor material are such that the first strip of light conducting semiconductor material is adapted to confine an optical mode of the first wavelength and the width and height of the second strip of light conducting semiconductor material are such that the second strip of light conducting semiconductor material is adapted to confine an optical mode of the second wavelength but is too narrow to confine an optical mode of the first wavelength.

公开(公告)号：US20240358869A1

公开(公告)日：2024-10-31

申请号：US18767463

申请日：2024-07-09

Applicant: HRL LABORATORIES, LLC

Inventor： Adam F. Gross ,  Kevin Geary ,  Shanying Cui

IPC: A61L2/10 ,  A61L2/238 ,  A61L2/26 ,  G02B5/00 ,  G02B6/10

CPC classification number: A61L2/10 ,  A61L2/238 ,  A61L2/26 ,  G02B5/008 ,  G02B6/0023 ,  G02B6/0065 ,  G02B6/102 ,  A61L2202/11 ,  G02B6/003 ,  G02B6/0043 ,  G02B6/0066

Abstract: A self-sanitizing surface structure configured to selectively refract light, a method of fabricating a self-sanitizing surface configured to selectively refract light, and a method of decontaminating a surface using selectively refracted light. A waveguide including a support layer below a propagating layer is positioned over a substrate as a self-sanitizing layer. In the absence of a contaminant or residue on the waveguide, UV light injected into the propagating layer is constrained within the propagating layer due to total internal reflection. When a residue is present on the self-sanitizing surface structure, light may be selectively refracted at or near the interface with the residue along the side of the waveguide to destroy the residue. The self-sanitizing surface structure may be configured to refract a suitable amount of UV light in response to a particular type of residue or application.

公开(公告)号：US12048773B2

公开(公告)日：2024-07-30

申请号：US18464884

申请日：2023-09-11

Applicant: HRL LABORATORIES, LLC

Inventor： Adam F. Gross ,  Kevin Geary ,  Shanying Cui

IPC: A61L2/10 ,  A61L2/238 ,  A61L2/26 ,  F21V8/00 ,  G02B5/00 ,  G02B6/10

CPC classification number: A61L2/10 ,  A61L2/238 ,  A61L2/26 ,  G02B5/008 ,  G02B6/0023 ,  G02B6/0065 ,  G02B6/102 ,  A61L2202/11 ,  G02B6/003 ,  G02B6/0043 ,  G02B6/0066

Abstract: A self-sanitizing surface structure configured to selectively refract light, a method of fabricating a self-sanitizing surface configured to selectively refract light, and a method of decontaminating a surface using selectively refracted light. A waveguide including a support layer below a propagating layer is positioned over a substrate as a self-sanitizing layer. In the absence of a contaminant or residue on the waveguide, UV light injected into the propagating layer is constrained within the propagating layer due to total internal reflection. When a residue is present on the self-sanitizing surface structure, light may be selectively refracted at or near the interface with the residue along the side of the waveguide to destroy the residue. The self-sanitizing surface structure may be configured is to refract a suitable amount of UV light in response to a particular type of residue or application.

公开(公告)号：US09735885B1

公开(公告)日：2017-08-15

申请号：US14795860

申请日：2015-07-09

Applicant: HRL LABORATORIES, LLC

Inventor： Keyvan R. Sayyah ,  James H. Schaffner ,  Kevin Geary

IPC: H04B10/61

CPC classification number: H04B10/615 ,  B82Y20/00 ,  B82Y40/00 ,  G02B1/002 ,  G02F1/0018 ,  G02F1/0316 ,  G02F1/19 ,  G02F1/218 ,  G02F1/2257 ,  G02F1/29 ,  G02F1/292 ,  G02F2001/0151 ,  G02F2001/212 ,  G02F2001/291 ,  G02F2202/30 ,  G02F2203/12 ,  G02F2203/13 ,  G02F2203/15 ,  G02F2203/24 ,  H01L21/84 ,  H01L29/66151 ,  H01L31/02161 ,  H01P7/082 ,  H01P7/088 ,  H01Q15/002 ,  H01Q15/0086

Abstract: A coherent frequency modulated receiver for receiving and detecting arriving optical signals which comprises an electrically controllable optical beam scanner receiving optical input beams arriving at different angles in a field of view of the electrically controllable optical beam scanner, the electrically controllable optical beam scanner conveying a scanned optical input beam as its output optical beam; a grating coupler responsive to the output or reflected optical beam of the electrically controllable optical beams scanner, the grating coupler having a waveguided output; an optical local oscillator laser having a waveguided output; an FMCW signal generator; an optical modulator responsive to the optical waveguided outputs of the optical local oscillator laser and also to an electrical FMCW signal from the FMCW signal generator; a pair of second order non-linear optical elements for frequency upconverting respective outputs of the optical modulator and the grating coupler; and at least one photodiode optically coupled to an outputs of the pair of second order non-linear optical elements.

公开(公告)号：US12230659B1

公开(公告)日：2025-02-18

申请号：US17325107

申请日：2021-05-19

Applicant: HRL Laboratories, LLC

Inventor： Tobias A. Schaedler ,  Florian G. Herrault ,  Kevin Geary ,  Mark O'Masta ,  Kayleigh A. Porter ,  Minh B. Nguyen

IPC: H01L27/146

Abstract: An interposer for a curved detector. In some embodiments a system includes a curved array photodetector; a first readout integrated circuit, the first readout integrated circuit being substantially flat; and an interposer, between the photodetector and the first readout integrated circuit. The photodetector and the first readout integrated circuit may each have a plurality of electrical contacts. The interposer may include a first conductor connecting a first contact, of the plurality of electrical contacts of the photodetector, and a second contact, of the plurality of electrical contacts of the first readout integrated circuit.

公开(公告)号：US20210023249A1

公开(公告)日：2021-01-28

申请号：US17036474

申请日：2020-09-29

Applicant: HRL LABORATORIES, LLC

Inventor： Adam F. Gross ,  Kevin Geary ,  Shanying Cui

IPC: A61L2/10 ,  F21V8/00 ,  G02B5/00 ,  A61L2/26 ,  A61L2/238 ,  G02B6/10

Abstract: A self-sanitizing surface structure configured to selectively refract light, a method of fabricating a self-sanitizing surface configured to selectively refract light, and a method of decontaminating a surface using selectively refracted light. A waveguide including a support layer below a propagating layer is positioned over a substrate as a self-sanitizing layer. In the absence of a contaminant or residue on the waveguide, UV light injected into the propagating layer is constrained within the propagating layer due to total internal reflection. When a residue is present on the self-sanitizing surface structure, light may be selectively refracted at or near the interface with the residue along the side of the waveguide to destroy the residue. The self-sanitizing surface structure may be configured to refract a suitable amount of UV light in response to a particular type of residue or application.

公开(公告)号：US10821198B2

公开(公告)日：2020-11-03

申请号：US15870082

申请日：2018-01-12

Applicant: HRL LABORATORIES, LLC

Inventor： Adam F. Gross ,  Kevin Geary ,  Shanying Cui

IPC: A61L2/10 ,  F21V8/00 ,  A61L2/26 ,  A61L2/238 ,  G02B6/10 ,  G02B5/00

Abstract: A self-sanitizing surface structure configured to selectively refract light, a method of fabricating a self-sanitizing surface configured to selectively refract light, and a method of decontaminating a surface using selectively refracted light. A waveguide including a support layer below a propagating layer is positioned over a substrate as a self-sanitizing layer. In the absence of a contaminant or residue on the waveguide, UV light injected into the propagating layer is constrained within the propagating layer due to total internal reflection. When a residue is present on the self-sanitizing surface structure, light may be selectively refracted at or near the interface with the residue along the side of the waveguide to destroy the residue. The self-sanitizing surface structure may be configured to refract a suitable amount of UV light in response to a particular type of residue or application.

公开(公告)号：US20230414809A1

公开(公告)日：2023-12-28

申请号：US18464884

申请日：2023-09-11

Applicant: HRL LABORATORIES, LLC

Inventor： Adam F. Gross ,  Kevin Geary ,  Shanying Cui

IPC: A61L2/10 ,  F21V8/00 ,  G02B5/00 ,  A61L2/26 ,  A61L2/238 ,  G02B6/10

CPC classification number: A61L2/10 ,  G02B6/0065 ,  G02B5/008 ,  A61L2/26 ,  G02B6/0023 ,  A61L2/238 ,  G02B6/102 ,  A61L2202/11 ,  G02B6/0043 ,  G02B6/0066 ,  G02B6/003

Abstract: A self-sanitizing surface structure configured to selectively refract light, a method of fabricating a self-sanitizing surface configured to selectively refract light, and a method of decontaminating a surface using selectively refracted light. A waveguide including a support layer below a propagating layer is positioned over a substrate as a self-sanitizing layer. In the absence of a contaminant or residue on the waveguide, UV light injected into the propagating layer is constrained within the propagating layer due to total internal reflection. When a residue is present on the self-sanitizing surface structure, light may be selectively refracted at or near the interface with the residue along the side of the waveguide to destroy the residue. The self-sanitizing surface structure may be configured is to refract a suitable amount of UV light in response to a particular type of residue or application.