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公开(公告)号:US08138486B2
公开(公告)日:2012-03-20
申请号:US12613846
申请日:2009-11-06
申请人: Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
发明人: Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
IPC分类号: G03F7/20
CPC分类号: G03F7/70341 , G03F7/707
摘要: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译: 在浸没式光刻设备中,通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号:US07928407B2
公开(公告)日:2011-04-19
申请号:US11603228
申请日:2006-11-22
申请人: Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人: Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号: G21K5/10
CPC分类号: G03F7/70341 , G03F7/707
摘要: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译: 在浸没式光刻设备中,通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号:US20110090474A1
公开(公告)日:2011-04-21
申请号:US12980406
申请日:2010-12-29
申请人: Hans JANSEN , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人: Hans JANSEN , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号: G03B27/52
CPC分类号: G03F7/70341 , G03F7/707
摘要: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
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公开(公告)号:US07633073B2
公开(公告)日:2009-12-15
申请号:US11285774
申请日:2005-11-23
申请人: Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
发明人: Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
IPC分类号: G03F7/20
CPC分类号: G03F7/70341 , G03F7/707
摘要: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译: 在浸没式光刻设备中,通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号:US08481978B2
公开(公告)日:2013-07-09
申请号:US13083327
申请日:2011-04-08
申请人: Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人: Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号: G21G5/00
CPC分类号: G03F7/70341 , G03F7/707
摘要: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
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公开(公告)号:US20100044593A1
公开(公告)日:2010-02-25
申请号:US12613846
申请日:2009-11-06
申请人: Hans JANSEN , Sebastian Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelius Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
发明人: Hans JANSEN , Sebastian Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelius Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
IPC分类号: G03F7/20
CPC分类号: G03F7/70341 , G03F7/707
摘要: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译: 在浸没式光刻设备中,通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号:US20070114452A1
公开(公告)日:2007-05-24
申请号:US11285774
申请日:2005-11-23
申请人: Hans Jansen , Sebastiaan Cornelissen , Sjoerd Donders , Roelof Graaf , Christiaan Hoogendam , Hernes Jacobs , Martinus Leenders , Jeroen Johannes Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Janssen , Michel Riepen , Bob Streefkerk
发明人: Hans Jansen , Sebastiaan Cornelissen , Sjoerd Donders , Roelof Graaf , Christiaan Hoogendam , Hernes Jacobs , Martinus Leenders , Jeroen Johannes Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Janssen , Michel Riepen , Bob Streefkerk
IPC分类号: G03F7/20
CPC分类号: G03F7/70341 , G03F7/707
摘要: Lithographic Apparatus and Device Manufacturing Method In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译: 平版印刷设备和设备制造方法在浸没式光刻设备中,通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号:US20070114451A1
公开(公告)日:2007-05-24
申请号:US11603228
申请日:2006-11-22
申请人: Hans Jansen , Sebastiaan Maria Cornelissen , Sjoerd Nicolaas Donders , Roelof De Graaf , Christiaan Hoogendam , Hernes Jacobs , Martinus Hendrikus Leenders , Jeroen Johannes Mertens , Bob Streefkerk , Jan-Gerard Van Der Toorn , Peter Smits , Franciscus Johannes Janssen , Michel Riepen
发明人: Hans Jansen , Sebastiaan Maria Cornelissen , Sjoerd Nicolaas Donders , Roelof De Graaf , Christiaan Hoogendam , Hernes Jacobs , Martinus Hendrikus Leenders , Jeroen Johannes Mertens , Bob Streefkerk , Jan-Gerard Van Der Toorn , Peter Smits , Franciscus Johannes Janssen , Michel Riepen
IPC分类号: G21G5/00
CPC分类号: G03F7/70341 , G03F7/707
摘要: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译: 在浸没式光刻设备中,通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号:US08860926B2
公开(公告)日:2014-10-14
申请号:US13240650
申请日:2011-09-22
申请人: Pieter Renaat Maria Hennus , Jeroen Johannes Sophia Maria Mertens , Patrick Johannes Cornelus Hendrik Smulders , Peter Smits
发明人: Pieter Renaat Maria Hennus , Jeroen Johannes Sophia Maria Mertens , Patrick Johannes Cornelus Hendrik Smulders , Peter Smits
IPC分类号: G03F7/20
CPC分类号: G03F7/70341 , G03F7/707 , G03F7/70808 , G03F7/7085 , G03F7/709
摘要: A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.
摘要翻译: 公开了一种用于浸没式光刻的光刻设备,其中可以布置衬底台的不同部分之间的密封以减少不同部件之间的力的传递。
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公开(公告)号:US08115905B2
公开(公告)日:2012-02-14
申请号:US12076731
申请日:2008-03-21
申请人: Pieter Renaat Maria Hennus , Jeroen Johannes Sophia Maria Mertens , Patrick Johannes Cornelus Hendrik Smulders , Peter Smits
发明人: Pieter Renaat Maria Hennus , Jeroen Johannes Sophia Maria Mertens , Patrick Johannes Cornelus Hendrik Smulders , Peter Smits
CPC分类号: G03F7/70341 , G03F7/707 , G03F7/70808 , G03F7/7085 , G03F7/709
摘要: A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.
摘要翻译: 公开了一种用于浸没式光刻的光刻设备,其中可以布置衬底台的不同部分之间的密封以减少不同部件之间的力的传递。
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