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    Positive-working radiation-sensitive mixture and production of relief structures
    10.
    发明授权
    Positive-working radiation-sensitive mixture and production of relief structures 失效
    积极工作的辐射敏感混合物和浮雕结构的生产

    公开(公告)号：US5846689A

    公开(公告)日：1998-12-08

    申请号：US708818

    申请日：1996-09-09

    申请人： Reinhold Schwalm ,  Dirk Funhoff ,  Horst Binder

    发明人： Reinhold Schwalm ,  Dirk Funhoff ,  Horst Binder

    IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106

    摘要： A positive-working radiation-sensitive mixture essentially consists of (a) at least one polymer which contains acid-labile groups and is insoluble in water but becomes soluble in aqueous alkaline solutions as a result of the action of acid, (b) at least one organic compound which produces an acid under the action of actinic radiation and (c) at least one further organic compound differing from (b), where the polymer (a) contains incorporated units of the formulae (I), (II) and (III) ##STR1## and the organic compound (b) is a sulfonium salt of the formula (IV) ##STR2## The radiation-sensitive mixture is suitable for the production of relief structures having improved contrast.

    摘要翻译： 正面工作的辐射敏感混合物基本上由（a）至少一种含有酸不稳定基团并且不溶于水但由于酸的作用而变得可溶于碱性水溶液的聚合物，（b）至少 一种在光化辐射作用下产生酸的有机化合物和（c）至少一种与（b）不同的另外的有机化合物，其中聚合物（a）含有式（I），（II）和（ III）和有机化合物（b）是式（IV）的锍盐。（IV）辐射敏感性混合物适用于生产具有改善的对比度的浮雕结构。