-
公开(公告)号:US07034924B2
公开(公告)日:2006-04-25
申请号:US10754634
申请日:2004-01-12
IPC分类号: G03B27/60
CPC分类号: G03F7/70841 , G03F7/707 , G03F7/70716 , G03F7/70808 , G03F7/70991
摘要: A lithographic apparatus includes at least one object support structure in a high vacuum chamber. The object support structure includes a carrier device in which a number of dividing walls are provided forming a number of compartments in the carrier device. At least one of the compartments is shielded from the high vacuum chamber and is provided with separate gas evacuating structures.
摘要翻译: 光刻设备包括在高真空室中的至少一个物体支撑结构。 物体支撑结构包括载体装置,其中多个分隔壁被设置成在载体装置中形成多个隔间。 隔室中的至少一个与高真空室隔离,并设有单独的排气结构。