利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

61 条记录 (耗时 0.021 秒)

    Substrate handler, lithographic apparatus and device manufacturing method
    3.
    发明申请
    Substrate handler, lithographic apparatus and device manufacturing method 有权
    基板处理器，光刻设备和器件制造方法

    公开(公告)号：US20070008512A1

    公开(公告)日：2007-01-11

    申请号：US11175037

    申请日：2005-07-06

    申请人： Harmen Van Der Schoot ,  Hernes Jacobs ,  Bernardus Luttikhuis ,  Petrus Vosters ,  Johannes Hazenberg ,  Aart Van Beuzekom

    发明人： Harmen Van Der Schoot ,  Hernes Jacobs ,  Bernardus Luttikhuis ,  Petrus Vosters ,  Johannes Hazenberg ,  Aart Van Beuzekom

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70875 ,  G03F7/7075

    摘要： Embodiments of the invention relates to a substrate handler for handling a substrate, including a conditioning device for conditioning the substrate. In an embodiment, the substrate handler includes a displacing device configured to displace the substrate in a direction substantially parallel to the support surface, wherein the displacing device is configured to displace the substrate during the conditioning process from one conditioning position to one or more other conditioning positions. According to another embodiment of the invention, the substrate handler includes a float device for providing an air bed above a support surface of the substrate handler, the substrate handler being configured to support the substrate on an air bed during conditioning of the substrate.

    摘要翻译： 本发明的实施例涉及一种用于处理基板的基板处理器，包括用于调节基板的调节装置。 在一个实施例中，衬底处理器包括移位装置，其配置成在基本上平行于支撑表面的方向上移动衬底，其中，移位装置构造成在调节过程期间将衬底从一个调节位置移位到一个或多个其他调节 职位 根据本发明的另一实施例，衬底处理器包括用于在衬底处理器的支撑表面上方提供空气床的浮动装置，衬底处理器被配置为在衬底调节期间将衬底支撑在空气床上。

    Lithographic apparatus and device manufacturing method utilizing substrate stage compensating
    4.
    发明申请
    Lithographic apparatus and device manufacturing method utilizing substrate stage compensating 有权
    利用基板台补偿的平版印刷设备和器件制造方法

    公开(公告)号：US20060279716A1

    公开(公告)日：2006-12-14

    申请号：US11147467

    申请日：2005-06-08

    申请人： Henrikus Cox ,  Hernes Jacobs ,  Harmen Van Der Schoot ,  Petrus Vosters

    发明人： Henrikus Cox ,  Hernes Jacobs ,  Harmen Van Der Schoot ,  Petrus Vosters

    IPC分类号： G03B27/42

    CPC分类号： G03F7/709

    摘要： A lithographic apparatus has an illumination system that conditions a radiation beam and a patterning device support that supports a patterning device. The patterning device patterns the radiation beam. The lithographic apparatus also has a substrate support that supports a substrate, a machine frame that supports the substrate support, a projection system that projects the patterned beam onto a target portion of the substrate, and a substrate support drive that moves the substrate support in at least one direction. The lithographic apparatus can have a reaction mass, a balance mass, a base frame, where the substrate support drive is configured to generate a force in the at least one direction between the substrate support and the reaction mass, the balance mass, or the support frame.

    摘要翻译： 光刻设备具有调节辐射束的照明系统和支持图案形成装置的图案形成装置支撑件。 图案形成装置对辐射束进行图案化。 光刻设备还具有支撑基板的基板支撑件，支撑基板支撑件的机架，将图案化的光束投影到基板的目标部分上的投影系统以及将基板支撑件移动到基​​板支撑驱动器 至少一个方向。 光刻设备可以具有反应物料，平衡物质，基底框架，其中基底支撑驱动器构造成在基底支撑体和反应块之间的至少一个方向上产生力，平衡块或支撑体 帧。

    Lithographic apparatus, device manufacturing method, and device manufactured thereby
    6.
    发明申请
    Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
    平版印刷设备，器件制造方法和由此制造的器件

    公开(公告)号：US20050007574A1

    公开(公告)日：2005-01-13

    申请号：US10845604

    申请日：2004-05-14

    申请人： Frits Van Der Meulen ,  Hernes Jacobs ,  Martinus Terken

    发明人： Frits Van Der Meulen ,  Hernes Jacobs ,  Martinus Terken

    IPC分类号： H01L21/027 ,  G03F7/20 ,  G03B27/58

    CPC分类号： G03F7/70733 ,  G03F7/70716 ,  G03F7/70725

    摘要： A lithographic projection apparatus is presented herein that includes a collision protection system for protecting internal components against damage from a collision. The collision protection apparatus includes at least one damper for applying a braking force and/or for absorbing a collision force, reducing or eliminating any damage to delicate and costly parts. The collision protection apparatus can also monitor the position and velocity of a moving part to determine when a collision is likely to occur.

    摘要翻译： 本文提出了一种光刻投影装置，其包括用于保护内部部件免受碰撞破坏的防撞系统。 碰撞保护装置包括用于施加制动力和/或吸收碰撞力的至少一个阻尼器，减少或消除对精细和昂贵部件的任何损坏。 碰撞保护装置还可以监视移动部件的位置和速度，以确定何时可能发生碰撞。