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    Metrology method and inspection apparatus, lithographic system and device manufacturing method
    1.
    发明授权
    Metrology method and inspection apparatus, lithographic system and device manufacturing method 有权
    计量方法和检验仪器，光刻系统和器件制造方法

    公开(公告)号：US09140998B2

    公开(公告)日：2015-09-22

    申请号：US13294057

    申请日：2011-11-10

    申请人： Hendrik Jan Hidde Smilde ,  Arno Jan Bleeker ,  Patrick Warnaar ,  Willem Marie Julia Marcel Coene ,  Michael Kubis

    发明人： Hendrik Jan Hidde Smilde ,  Arno Jan Bleeker ,  Patrick Warnaar ,  Willem Marie Julia Marcel Coene ,  Michael Kubis

    IPC分类号： G06F17/00 ,  G06F15/18 ,  G01N21/55 ,  G03F7/20

    CPC分类号： G03F7/70633 ,  G03F7/70483 ,  G03F7/70625 ,  G03F7/70641 ,  G06N99/005

    摘要： Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The optical system has a first branch leading to a pupil plane imaging sensor and a second branch leading to a substrate plane imaging sensor. A spatial light modulator is arranged in an intermediate pupil plane of the second branch of the optical system. The SLM imparts a programmable pattern of attenuation that may be used to correct for asymmetries between the first and second modes of illumination or imaging. By use of specific target designs and machine-learning processes, the attenuation patterns may also be programmed to act as filter functions, enhancing sensitivity to specific parameters of interest, such as focus.

    摘要翻译： 公开了用于测量由基板上的光刻工艺形成的目标结构的方法。 目标内的光栅结构小于测量光学系统的照明点和视场。 光学系统具有通向光瞳平面成像传感器的第一分支和通向基板平面成像传感器的第二分支。 空间光调制器被布置在光学系统的第二分支的中间光瞳平面中。 SLM赋予可编程的衰减模式，其可用于校正第一和第二照明模式或成像之间的不对称性。 通过使用特定的目标设计和机器学习过程，衰减模式也可以被编程为充当滤波器功能，增强对诸如焦点的特定参数的敏感性。

    Inspection apparatus and method
    4.
    发明授权
    Inspection apparatus and method 有权
    检验仪器及方法

    公开(公告)号：US09304077B2

    公开(公告)日：2016-04-05

    申请号：US13166384

    申请日：2011-06-22

    申请人： Lucas Henricus Johannes Stevens ,  Arno Jan Bleeker

    发明人： Lucas Henricus Johannes Stevens ,  Arno Jan Bleeker

    IPC分类号： G01N21/00 ,  G01N21/17 ,  G01N21/956

    CPC分类号： G01N21/1717 ,  G01N21/00 ,  G01N21/95623

    摘要： Ghost reflections in a catadioptric scatterometer objective are excluded from an angle-resolved spectrum measurement by using a partial pupil for illumination and for the measurement excluding the area of the pupil plane that has been illuminated. Ghost reflections are reflected back into same point in the pupil plane. The ghost reflections do not interfere with the signal in the non-illuminated area of the pupil plane. An illumination system provides a beam of electromagnetic radiation to illuminate a first area in an illumination pupil plane of the objective. The objective is arranged as to illuminate the substrate with the beam of electromagnetic radiation. The illumination pupil plane is the back projected image of the pupil plane of the objective and is also imaged into the measurement pupil plane at the back focal plane of the objective, via auxiliary optics. A detector is configured to measure an angle resolved spectrum arising from the illumination of the substrate, in a measurement area of the measurement pupil plane of the objective excluding an area corresponding to the first area.

    摘要翻译： 通过使用用于照明的部分光瞳和除了被照明的光瞳面的区域之外的测量，从角度分辨光谱测量中排除反射折射式散射仪物镜中的鬼反射。 幽灵反射回到瞳孔平面上的相同点。 幽灵反射不影响瞳孔平面的非照明区域中的信号。 照明系统提供电磁辐射束以照射物镜的照明光瞳平面中的第一区域。 该目的被布置为用电磁辐射束照射基板。 照明光瞳平面是物镜的光瞳平面的背投影像，并且还通过辅助光学器件在物镜的后焦平面处成像到测量光瞳平面中。 检测器被配置为测量除了与第一区域相对应的区域之外的物镜的测量光瞳平面的测量区域中由基板照射产生的角度分辨光谱。

    Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data
    7.
    发明授权
    Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data 有权
    使用存储图案变化数据的数据缓冲器在衬底上利用多个管芯设计的平版印刷设备和器件制造方法

    公开(公告)号：US07728956B2

    公开(公告)日：2010-06-01

    申请号：US11098607

    申请日：2005-04-05

    申请人： Arno Jan Bleeker ,  Kars Zeger Troost ,  Adrianus Johannes Henricus Maas

    发明人： Arno Jan Bleeker ,  Kars Zeger Troost ,  Adrianus Johannes Henricus Maas

    IPC分类号： G03B27/32

    CPC分类号： G03F7/70508 ,  G03F7/70275 ,  G03F7/70291

    摘要： A lithographic system and method are provided that allow for variations of a basic device design to be generated without substantially increasing the cost of the data path hardware. The lithographic apparatus includes an array of individually controllable elements, a control system, a first data buffer, and a second data buffer. The control system provides control signals to the array of individually controllable elements. The first data buffer stores pattern data that corresponds to a pattern to be exposed on a plurality of areas on the substrate. The second data buffer stores pattern variation data, corresponding to at least one change to a part of the pattern. The control system is configured, such that at least one variation of the pattern is exposed on one of the areas on the substrate with the pattern variation data.

    摘要翻译： 提供了一种光刻系统和方法，其允许在不显着增加数据路径硬件的成本的情况下生成基本设备设计的变化。 光刻设备包括独立可控元件阵列，控制系统，第一数据缓冲器和第二数据缓冲器。 控制系统向独立可控元件阵列提供控制信号。 第一数据缓冲器存储对应于要暴露在基板上的多个区域上的图案的图案数据。 第二数据缓冲器存储对应于图案的一部分的至少一个改变的图案变化数据。 控制系统被配置为使得图案的至少一个变化在图案变化数据的基板上的一个区域上露出。