公开(公告)号：US07184128B2

公开(公告)日：2007-02-27

申请号：US10875505

申请日：2004-06-25

申请人： Henricus Gerardus Tegenbosch ,  Sebastiaan Maria Johannes Cornelissen

发明人： Henricus Gerardus Tegenbosch ,  Sebastiaan Maria Johannes Cornelissen

IPC分类号： G03B27/58

CPC分类号： G03F7/70716

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation, a support surface having an edge, and a support structure for supporting an object to be moved across the beam of radiation. The support structure is moveably supported on the support surface. The apparatus also includes a rim that is associated with the support surface. The support structure and the rim are configured to allow the support structure to move in a first direction toward the rim and collide with the rim. A total force generated by the collision on the support structure is at least partially directed away from a second direction that is opposite to the first direction.

摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的照明系统，具有边缘的支撑表面以及用于支撑跨过辐射束移动的物体的支撑结构。 支撑结构可移动地支撑在支撑表面上。 该装置还包括与支撑表面相关联的边缘。 支撑结构和边缘被构造成允许支撑结构沿着第一方向朝着边缘移动并与边缘碰撞。 由支撑结构上的碰撞产生的总力至少部分地远离与第一方向相反的第二方向。

公开(公告)号：US08138486B2

公开(公告)日：2012-03-20

申请号：US12613846

申请日：2009-11-06

申请人： Hans Jansen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen ,  Bob Streefkerk

发明人： Hans Jansen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen ,  Bob Streefkerk

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

公开(公告)号：US07755742B2

公开(公告)日：2010-07-13

申请号：US11246554

申请日：2005-10-11

申请人： Sebastiaan Maria Johannes Cornelissen ,  Martinus Agnes Willem Cuijpers ,  Cornelis Christiaan Ottens ,  Peter Smits ,  Johannes Antonius Maria Van De Wal

发明人： Sebastiaan Maria Johannes Cornelissen ,  Martinus Agnes Willem Cuijpers ,  Cornelis Christiaan Ottens ,  Peter Smits ,  Johannes Antonius Maria Van De Wal

IPC分类号： G03B27/58

CPC分类号： G03F7/707 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/70858

摘要： A lithographic apparatus is disclosed in which a circular sensor is mounted to a substrate table with three leaf springs that are evenly spaced around a thermal axis of the sensor. The leaf springs are provided in two parts that are releasably attachable to each other. The leaf springs are elastic and allow some movement of the sensor relative to the substrate table on thermal expansion and contraction but ensure that the thermal center of the sensor does not move relative to the substrate table.

摘要翻译： 公开了一种光刻设备，其中圆形传感器安装到具有围绕传感器的热轴均匀间隔的三个板簧的基板台。 板簧设置在彼此可拆卸地连接的两个部分中。 板簧是弹性的，并允许传感器相对于基板台进行热膨胀和收缩的一些运动，但确保传感器的热中心不相对于基板台移动。

公开(公告)号：US06906786B2

公开(公告)日：2005-06-14

申请号：US10454839

申请日：2003-06-05

申请人： Henrikus Herman Marie Cox ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Petrus Matthijs Henricus Vosters ,  Sven Antoin Johan Hol ,  Sebastiaan Maria Johannes Cornelissen

发明人： Henrikus Herman Marie Cox ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Petrus Matthijs Henricus Vosters ,  Sven Antoin Johan Hol ,  Sebastiaan Maria Johannes Cornelissen

IPC分类号： B23Q1/58 ,  B23Q11/00 ,  F16F15/02 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/58 ,  G03B5/01

CPC分类号： G03F7/70766 ,  B23Q1/58 ,  B23Q11/0032 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70833 ,  G03F7/709

摘要： A lithographic projection apparatus in which a reaction force is generated between a balance mass and a substrate table. The balance mass is elastically coupled to the base frame with a suspension eigenfrequency of between 0.3 and 10 Hz.

公开(公告)号：US20110090474A1

公开(公告)日：2011-04-21

申请号：US12980406

申请日：2010-12-29

申请人： Hans JANSEN ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Bob Streefkerk ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

发明人： Hans JANSEN ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Bob Streefkerk ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

公开(公告)号：US07633073B2

公开(公告)日：2009-12-15

申请号：US11285774

申请日：2005-11-23

申请人： Hans Jansen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen ,  Bob Streefkerk

发明人： Hans Jansen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen ,  Bob Streefkerk

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

公开(公告)号：US20090168042A1

公开(公告)日：2009-07-02

申请号：US12292962

申请日：2008-12-01

申请人： Roger Johannes Maria Hubertus Kroonen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Fransiscus Mathijs Jacobs ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Reinder Wietse Roos ,  Mattijs Hogeland

发明人： Roger Johannes Maria Hubertus Kroonen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Fransiscus Mathijs Jacobs ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Reinder Wietse Roos ,  Mattijs Hogeland

IPC分类号： G03B27/60

CPC分类号： G03F7/70341

摘要： An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate, the substrate table being constructed and arranged to allow liquid to flow off the substrate and over an edge of a top surface of the substrate table, and a gutter for collecting the liquid flow under the edge. Several features for improving liquid retrieval are described.

摘要翻译： 公开了一种浸没式光刻投影装置。 所述设备包括用于保持基板的基板台，所述基板台被构造和布置成允许液体从所述基板流出并且超过所述基板台的顶表面的边缘，以及用于收集所述边缘下方的液体流的槽 。 描述了用于改善液体回收的几个特征。

公开(公告)号：US08481978B2

公开(公告)日：2013-07-09

申请号：US13083327

申请日：2011-04-08

申请人： Hans Jansen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Bob Streefkerk ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

发明人： Hans Jansen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Bob Streefkerk ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

IPC分类号： G21G5/00

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

公开(公告)号：US07679720B2

公开(公告)日：2010-03-16

申请号：US12068071

申请日：2008-02-01

申请人： Michel Pieter Dansberg ,  Sebastiaan Maria Johannes Cornelissen ,  Henrikus Herman Marie Cox ,  Robert Johannes Petrus Van Diesen ,  Nicolaas Rudolf Kemper ,  Robert-Han Munnig-Schmidt ,  Harmen Klaas Van der Schoot ,  Rob Jansen

发明人： Michel Pieter Dansberg ,  Sebastiaan Maria Johannes Cornelissen ,  Henrikus Herman Marie Cox ,  Robert Johannes Petrus Van Diesen ,  Nicolaas Rudolf Kemper ,  Robert-Han Munnig-Schmidt ,  Harmen Klaas Van der Schoot ,  Rob Jansen

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/62 ,  H02K41/00

CPC分类号： G03F7/70933 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/7095

摘要： An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.

摘要翻译： 一种装置构造成定位工件。 该装置包括平面基座和被配置为支撑工件的可移动台。 该台被配置成在平面底座上移动。 该装置还包括构造成移动台的致动器，被配置为测量台的位置的非接触位置测量器以及被配置为在测量器和台之间的体积中产生经调节的气流的第一泵。 底座包括设置在基座中的多个气体通道，其提供调节气体流经基座的路径。

公开(公告)号：US20090168037A1

公开(公告)日：2009-07-02

申请号：US12292963

申请日：2008-12-01

申请人： Roger Johannes Maria Hubertus Kroonen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Ronald Van Der Ham ,  Niek Jacobus Johannes Roset ,  Fransiscus Mathijs Jacobs ,  Michel Riepen ,  Gerardus Arnoldus Hendricus Fanciscus Janssen ,  Reinder Wietse Roos ,  Mattijs Hogeland

发明人： Roger Johannes Maria Hubertus Kroonen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Ronald Van Der Ham ,  Niek Jacobus Johannes Roset ,  Fransiscus Mathijs Jacobs ,  Michel Riepen ,  Gerardus Arnoldus Hendricus Fanciscus Janssen ,  Reinder Wietse Roos ,  Mattijs Hogeland

IPC分类号： G03B27/60 ,  G03B27/52

CPC分类号： G03F7/70716 ,  G03F7/70341

摘要： An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate and a liquid supply system for supply liquid to the substrate. The apparatus is constructed and arranged to allow the liquid to flow off the substrate and over at least two edges of a top surface of the substrate table. The geometry of the edge may be optimized to reduce a static thickness of a layer of liquid on the top surface.

摘要翻译： 公开了一种浸没式光刻投影装置。 该装置包括用于保持基板的基板台和用于向基板供应液体的液体供应系统。 该装置被构造和布置成允许液体从衬底流出并且在衬底台的顶表面的至少两个边缘之上。 可优化边缘的几何形状以减少顶表面上的液体层的静态厚度。