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公开(公告)号：US20100208224A1
公开(公告)日：2010-08-19
申请号：US12709278
申请日：2010-02-19
申请人： Hernes Jacobs , Erik Roelof Loopstra , Michel Riepen , Eva Mondt
发明人： Hernes Jacobs , Erik Roelof Loopstra , Michel Riepen , Eva Mondt
IPC分类号： G03B27/54
CPC分类号： G03F7/70341
摘要： A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35° and 90° to the local tangent of the gap.
摘要翻译： 从支撑在基板台上的基板和从基板和基板台之间的间隙去除液体的方法包括：提供液体去除装置，其具有连接到下压源的至少一个出口，所述出口形成细长的提取器 预定的几何形状; 相对移动衬底台和液体去除装置，使得提取器适于通过所有衬底和间隙，并且使得基本上在任何给定时间，提取器的任何局部部分在非干燥部分的边缘处 间隙在平面中具有与间隙的局部切线成35°至90°之间的角度的局部切线。
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公开(公告)号：US20090296056A1
公开(公告)日：2009-12-03
申请号：US12476089
申请日：2009-06-01
申请人： Eva Mondt , Noud Jan Gilissen , Hernes Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Marcus Martinus Petrus Adrianus Vermeulen , Michel Riepen
发明人： Eva Mondt , Noud Jan Gilissen , Hernes Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Marcus Martinus Petrus Adrianus Vermeulen , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/707
摘要： A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table.
摘要翻译： 公开了一种表格，其中采取措施来将工作台和使用中的物体的边缘密封在桌子上。 特别地，在桌子上的物体和桌子本身之间形成毛细管通道。 在毛细管通道的径向向内的弯液面钉扎特征和/或超压存在使通道中的液体保持在通道中并有助于防止其进一步向内径向前进。 执行该功能的特征可以与围绕对象的构件相关联或形成在其中。 该构件可以与桌子的一部分热分离。
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公开(公告)号：US08675172B2
公开(公告)日：2014-03-18
申请号：US12709278
申请日：2010-02-19
申请人： Hernes Jacobs , Erik Roelof Loopstra , Michel Riepen , Eva Mondt
发明人： Hernes Jacobs , Erik Roelof Loopstra , Michel Riepen , Eva Mondt
CPC分类号： G03F7/70341
摘要： A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35° and 90° to the local tangent of the gap.
摘要翻译： 从支撑在基板台上的基板和从基板和基板台之间的间隙去除液体的方法包括：提供液体去除装置，其具有连接到下压源的至少一个出口，所述出口形成细长的提取器 预定的几何形状; 相对移动衬底台和液体去除装置，使得提取器适于通过所有衬底和间隙，并且使得基本上在任何给定时间，提取器的任何局部部分在非干燥部分的边缘处 间隙在平面中具有与间隙的局部切线成35°至90°之间的角度的局部切线。
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公开(公告)号：US08274641B2
公开(公告)日：2012-09-25
申请号：US12476089
申请日：2009-06-01
申请人： Eva Mondt , Noud Jan Gilissen , Hernes Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Marcus Martinus Petrus Adrianus Vermeulen , Michel Riepen
发明人： Eva Mondt , Noud Jan Gilissen , Hernes Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Marcus Martinus Petrus Adrianus Vermeulen , Michel Riepen
IPC分类号： G03B27/60
CPC分类号： G03F7/70341 , G03F7/707
摘要： A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table.
摘要翻译： 公开了一种表格，其中采取措施来将工作台和使用中的物体的边缘密封在桌子上。 特别地，在桌子上的物体和桌子本身之间形成毛细管通道。 在毛细管通道的径向向内的弯液面钉扎特征和/或超压存在使通道中的液体保持在通道中并有助于防止其进一步向内径向前进。 执行该功能的特征可以与围绕对象的构件相关联或形成在其中。 该构件可以与桌子的一部分热分离。
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公开(公告)号：US07692765B2
公开(公告)日：2010-04-06
申请号：US11708686
申请日：2007-02-21
申请人： Hernes Jacobs , Erik Roelof Loopstra , Michel Riepen , Eva Mondt
发明人： Hernes Jacobs , Erik Roelof Loopstra , Michel Riepen , Eva Mondt
CPC分类号： G03F7/70341
摘要： A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35° and 90° to the local tangent of the gap.
摘要翻译： 从支撑在基板台上的基板和从基板和基板台之间的间隙去除液体的方法包括：提供液体去除装置，其具有连接到下压源的至少一个出口，所述出口形成细长的提取器 预定的几何形状; 相对移动衬底台和液体去除装置，使得提取器适于通过所有衬底和间隙，并且使得基本上在任何给定时间，提取器的任何局部部分在非干燥部分的边缘处 间隙在平面中具有与间隙的局部切线成35°至90°之间的角度的局部切线。
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公开(公告)号：US20080198344A1
公开(公告)日：2008-08-21
申请号：US11708686
申请日：2007-02-21
申请人： Hernes Jacobs , Erik Roelof Loopstra , Michel Riepen , Eva Mondt
发明人： Hernes Jacobs , Erik Roelof Loopstra , Michel Riepen , Eva Mondt
CPC分类号： G03F7/70341
摘要： A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the-substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35° and 90° to the local tangent of the gap.
摘要翻译： 从支撑在基板台上的基板和从基板和基板台之间的间隙去除液体的方法包括：提供液体去除装置，其具有连接到下压源的至少一个出口，所述出口形成细长的提取器 预定的几何形状; 相对移动衬底台和液体去除装置，使得提取器适于通过所有衬底和间隙，并且使得基本上在任何给定时间处，提取器的任何局部部分在非干燥部分的边缘处 该间隙在平面中具有与间隙的局部切线成约35°至90°之间的角度的局部切线。
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公开(公告)号：US20100165319A1
公开(公告)日：2010-07-01
申请号：US12642627
申请日：2009-12-18
申请人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
发明人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
IPC分类号： G03B27/32
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译： 公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。 液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。 可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。
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公开(公告)号：US07656502B2
公开(公告)日：2010-02-02
申请号：US11472566
申请日：2006-06-22
申请人： Harmen Klaus Van Der Schoot , Noud Jan Gilissen , Peter Paul Steijaert , Erik Roelof Loopstra , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Johannes Catharinus Hubertus Mulkens , Martinus Hendrikus Antonius Leenders , Hans Jansen , Marco Koert Stavenga , Jan Cornelis Van Der Hoeven , Bob Streefkerk , Hernes Jacobs , Marcus Martinus Petrus Adrianus Vermeulen
发明人： Harmen Klaus Van Der Schoot , Noud Jan Gilissen , Peter Paul Steijaert , Erik Roelof Loopstra , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Johannes Catharinus Hubertus Mulkens , Martinus Hendrikus Antonius Leenders , Hans Jansen , Marco Koert Stavenga , Jan Cornelis Van Der Hoeven , Bob Streefkerk , Hernes Jacobs , Marcus Martinus Petrus Adrianus Vermeulen
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译： 公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。 液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。 可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。
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公开(公告)号：US20080073602A1
公开(公告)日：2008-03-27
申请号：US11472566
申请日：2006-06-22
申请人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter-Paul Steijaert , Marcus Vermeulen , Jacco Van Der Hoeven
发明人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter-Paul Steijaert , Marcus Vermeulen , Jacco Van Der Hoeven
IPC分类号： G01N21/86
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译： 公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。 液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。 可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。
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公开(公告)号：US08416383B2
公开(公告)日：2013-04-09
申请号：US11987009
申请日：2007-11-26
CPC分类号： G03F7/70341 , G03F7/707
摘要： A lithographic apparatus is disclosed that includes a seal provided in a substrate table, the seal being actuatable from an open configuration to a closed configuration, the closed configuration being such that when a substrate is located on the substrate table, the seal closes a gap between the substrate and the substrate table.
摘要翻译： 公开了一种光刻设备，其包括设置在基板台中的密封件，所述密封件可从打开构造致动至封闭构造，所述封闭构造使得当基板位于所述基板台上时，所述密封件封闭 基板和基板台。
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