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公开(公告)号：US20060158634A1
公开(公告)日：2006-07-20
申请号：US11320494
申请日：2005-12-29
CPC分类号： G03F7/7075 , G03F7/70691 , G03F7/70733 , G03F7/70791
摘要： A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate table before and after exposure.
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2.发明申请公开(公告)号：US20070008512A1
公开(公告)日：2007-01-11
申请号：US11175037
申请日：2005-07-06
申请人： Harmen Van Der Schoot , Hernes Jacobs , Bernardus Luttikhuis , Petrus Vosters , Johannes Hazenberg , Aart Van Beuzekom
发明人： Harmen Van Der Schoot , Hernes Jacobs , Bernardus Luttikhuis , Petrus Vosters , Johannes Hazenberg , Aart Van Beuzekom
IPC分类号： G03B27/58
CPC分类号： G03F7/70875 , G03F7/7075
摘要： Embodiments of the invention relates to a substrate handler for handling a substrate, including a conditioning device for conditioning the substrate. In an embodiment, the substrate handler includes a displacing device configured to displace the substrate in a direction substantially parallel to the support surface, wherein the displacing device is configured to displace the substrate during the conditioning process from one conditioning position to one or more other conditioning positions. According to another embodiment of the invention, the substrate handler includes a float device for providing an air bed above a support surface of the substrate handler, the substrate handler being configured to support the substrate on an air bed during conditioning of the substrate.
摘要翻译： 本发明的实施例涉及一种用于处理基板的基板处理器，包括用于调节基板的调节装置。 在一个实施例中，衬底处理器包括移位装置，其配置成在基本上平行于支撑表面的方向上移动衬底，其中，移位装置构造成在调节过程期间将衬底从一个调节位置移位到一个或多个其他调节 职位 根据本发明的另一实施例，衬底处理器包括用于在衬底处理器的支撑表面上方提供空气床的浮动装置，衬底处理器被配置为在衬底调节期间将衬底支撑在空气床上。
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公开(公告)号：US20060139616A1
公开(公告)日：2006-06-29
申请号：US11157201
申请日：2005-06-21
CPC分类号： G03F7/7075 , G03F7/70691 , G03F7/70733 , G03F7/70791
摘要： A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate table before and after exposure.
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公开(公告)号：US20060132734A1
公开(公告)日：2006-06-22
申请号：US11018928
申请日：2004-12-22
IPC分类号： G03B27/42
CPC分类号： G03F7/70991 , G03F7/70616 , G03F7/70733
摘要： A lithographic method and apparatus comprises an illumination system that supplies a beam of radiation, a patterning device that patterns the beam, and a projection system that projects the patterned beam onto a target portion of a substrate. A metrology system is provided adjacent the projection system for aligning the substrate with the projection system. Two or more movable chucks are each arranged to support a substrate and move between a loading device and the projection system. The chucks are independently movable so that one substrate can be passed through the metrology system and patterned beam while the other substrates are moved between the loading system and projection system.
摘要翻译： 光刻方法和装置包括提供辐射束的照明系统，对光束进行图案化的图案形成装置，以及将图案化光束投影到基板的目标部分上的投影系统。 在投影系统附近提供了一种计量系统，用于将基板与投影系统对准。 两个或更多个可移动卡盘分别布置成支撑基板并在加载装置和投影系统之间移动。 卡盘可独立移动，使得一个基板可以通过计量系统和图案化梁，同时其它基板在装载系统和投影系统之间移动。
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5.发明申请Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination 有权利用清洁空气的移动来减少污染的平版印刷设备和设备制造方法公开(公告)号：US20070002297A1
公开(公告)日：2007-01-04
申请号：US11169305
申请日：2005-06-29
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , G03F7/7075 , G03F7/70791
摘要： A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to load substrates on to and unload substrates from the substrate table before and after exposure. Also, a clean gas supply system supplies a clean gas to at least one location at which the substrate is located. The clean gas supply system is moveably mounted. A device manufacturing method utilizing the lithographic apparatus can be used to manufacture at least one of a flat panel display and an integrated circuit device.
摘要翻译： 光刻设备包括支撑衬底的衬底台和相对于衬底台移动衬底的衬底处理器。 衬底处理器适于在曝光之前和之后将衬底加载到衬底台上并从衬底台卸载衬底。 此外，清洁气体供应系统将清洁气体提供到至少一个位置，在该位置处衬底被定位。 清洁气体供应系统可移动安装。 利用光刻设备的器件制造方法可用于制造平板显示器和集成电路器件中的至少一个。
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公开(公告)号：US20070188723A1
公开(公告)日：2007-08-16
申请号：US11353232
申请日：2006-02-14
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/707 , G03F7/70783
摘要： The mask in a lithographic apparatus is clamped on a first side using a first clamping device and on a second side, different from the first side, using a second clamping device. The clamping forces are preferably applied using thin membranes. The first clamp clamps the substrate in directions parallel to the plane of the patterning device, perpendicular to the plane of the patterning device and rotationally. The second clamping device clamps the patterning device only in directions parallel to the plane of the substrate.
摘要翻译： 光刻设备中的掩模使用第一夹紧装置夹紧在第一侧上，并使用第二夹紧装置夹紧在不同于第一侧的第二侧上。 夹紧力优选使用薄膜施加。 第一夹具将基板平行于图案形成装置的平面垂直于图案形成装置的平面并旋转夹紧基板。 第二夹紧装置仅在平行于基板的平面的方向上夹持图案形成装置。
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公开(公告)号：US20050122490A1
公开(公告)日：2005-06-09
申请号：US10729376
申请日：2003-12-08
申请人： Bernardus Luttikhuis , Pertrus Bartray , Wilhelmus Box , Martinus Hendrikus Leenders , Marc Maria Van Der Wijst
发明人： Bernardus Luttikhuis , Pertrus Bartray , Wilhelmus Box , Martinus Hendrikus Leenders , Marc Maria Van Der Wijst
IPC分类号： G21K5/02 , F16F15/04 , G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70858
摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure constructed to support a patterning device, which serves to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame with a position sensor and the substrate being located thereon. The apparatus further includes a heat transport system having a heating element, in thermal interaction with at least one of the projection system and the reference frame, for heat transport to or from at least one of the projection system and the reference frame, wherein the heat transport system, is coupled to a further frame which is mechanically isolated from the reference frame.
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公开(公告)号：US20050024611A1
公开(公告)日：2005-02-03
申请号：US10876786
申请日：2004-06-25
申请人： Pertrus Bartray , Wilhelmus Box , Dominicus Jacobus Franken , Bernardus Luttikhuis , Engelbertus Van Der Pasch , Marc Van Der Wijst , Marc Engels
发明人： Pertrus Bartray , Wilhelmus Box , Dominicus Jacobus Franken , Bernardus Luttikhuis , Engelbertus Van Der Pasch , Marc Van Der Wijst , Marc Engels
CPC分类号： G03F7/70716 , G03F7/70775
摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a projection system for projecting the patterned beam of radiation onto a target portion of a substrate, and an assembly for determining a spatial position of the patterning device relative to the projection system. The assembly includes a measuring unit that has a plurality of sensors that are mounted on the projection system.
摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于将图案化的辐射束投影到基板的目标部分上的投影系统和用于确定图案形成装置相对于投影系统的空间位置的组件。 组件包括具有安装在投影系统上的多个传感器的测量单元。
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9.发明申请Lithographic apparatus, device manufacturing method and exchangeable optical element 有权光刻设备，器件制造方法和可交换光学元件公开(公告)号：US20070177122A1
公开(公告)日：2007-08-02
申请号：US11341894
申请日：2006-01-30
申请人： Erik Loopstra , Adrianus Engelen , Bernardus Luttikhuis , Maria Rubingh , Johannes Hazenberg , Laurentius Jorritsma , Johannes Klerk , Bernhard Geuppert , Aart Van Beuzekom , Petrus Franciscus Mandigers , Franz Sorg , Peter Deufel
发明人： Erik Loopstra , Adrianus Engelen , Bernardus Luttikhuis , Maria Rubingh , Johannes Hazenberg , Laurentius Jorritsma , Johannes Klerk , Bernhard Geuppert , Aart Van Beuzekom , Petrus Franciscus Mandigers , Franz Sorg , Peter Deufel
IPC分类号： G03B27/54
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.
摘要翻译： 光刻设备具有在其投影系统的光瞳平面中交换光学元件的组件。 光学元件可以是光瞳滤光器，并且可以符合对于掩模版标准规定的物理尺寸，例如。 侧面基本上等于5,6或9英寸。
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公开(公告)号：US20070178704A1
公开(公告)日：2007-08-02
申请号：US11343219
申请日：2006-01-31
IPC分类号： H01L21/302
CPC分类号： G03F7/707
摘要： The invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a transmissive patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the patterning device support is configured to hold a patterning device and wherein the lithographic apparatus includes a clamping device, the clamping device being configured to clamp the patterning device at the top side.
摘要翻译： 本发明提供一种光刻设备，其包括配置成调节辐射束的照明系统，构造成支撑透射式图案形成装置的图案形成装置支撑件，所述图案形成装置能够在其横截面上赋予辐射束图案以形成 图案化的辐射束，构造成保持衬底的衬底台，以及被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统，其中，图案形成装置支撑件构造成保持图案形成装置，并且其中光刻装置包括 夹持装置，夹持装置构造成将图案形成装置夹在顶侧。
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