CARRIER HEAD USING FLEXURE RESTRAINTS FOR RETAINING RING ALIGNMENT
    3.
    发明申请
    CARRIER HEAD USING FLEXURE RESTRAINTS FOR RETAINING RING ALIGNMENT 失效
    携带器头使用弯曲限制器来保持环对准

    公开(公告)号:US20100062694A1

    公开(公告)日:2010-03-11

    申请号:US12206338

    申请日:2008-09-08

    IPC分类号: B24B5/00 B24B47/02

    CPC分类号: B24B37/32

    摘要: One embodiment provides a retaining ring assembly. The retaining ring assembly comprises a retaining ring configured to circumferentially surround and retain the substrate within an inner surface of the retaining ring, and a flexure coupled to the retaining ring. The flexure is configured to maintain a gap between an inner surface of a carrier ring and an outer surface of the retaining ring, and the carrier ring is circumferentially surrounding the retaining ring.

    摘要翻译: 一个实施例提供一种保持环组件。 保持环组件包括保持环,所述保持环被构造成周向地围绕并保持在保持环的内表面内的基板,以及耦合到保持环的挠曲件。 挠曲构造成在承载环的内表面和保持环的外表面之间保持间隙,并且承载环周向围绕保持环。

    FAST SUBSTRATE LOADING ON POLISHING HEAD WITHOUT MEMBRANE INFLATION STEP
    6.
    发明申请
    FAST SUBSTRATE LOADING ON POLISHING HEAD WITHOUT MEMBRANE INFLATION STEP 有权
    快速底板装载在无膜渗透步骤的抛光头上

    公开(公告)号:US20070289124A1

    公开(公告)日:2007-12-20

    申请号:US11757069

    申请日:2007-06-01

    IPC分类号: H05K13/04

    摘要: The present invention relates to an apparatus and method for improving and speeding up substrate loading process. One embodiment provides a method for vacuum chucking a substrate. The method comprises venting a center chamber of a flexible membrane configured for mounting the substrate, moving the substrate such that a backside of the substrate is in full contact with the flexible membrane, and vacuuming the center chamber to vacuum chuck the backside of the substrate to the flexible membrane.

    摘要翻译: 本发明涉及一种用于改善和加速基板加载过程的装置和方法。 一个实施例提供了用于真空吸附衬底的方法。 该方法包括将配置用于安装衬底的柔性膜的中心室排出,移动衬底,使得衬底的背面与柔性膜完全接触,并且抽真空中心室以将衬底的背面真空吸附到 柔性膜。

    Multiple zone carrier head with flexible membrane
    10.
    发明授权
    Multiple zone carrier head with flexible membrane 有权
    带有柔性膜的多区域载体头

    公开(公告)号:US07842158B2

    公开(公告)日:2010-11-30

    申请号:US11837412

    申请日:2007-08-10

    IPC分类号: B24B29/00

    CPC分类号: B24B37/30

    摘要: A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.

    摘要翻译: 用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。 柔性膜包括具有提供基板接收表面的外表面的中心部分,将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。 翼片将柔性膜和基部之间的体积分成多个室,并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。