Semiconductor laser having an active layer and cladding layer
    1.
    发明授权
    Semiconductor laser having an active layer and cladding layer 失效
    具有有源层和包层的半导体激光器

    公开(公告)号:US4856013A

    公开(公告)日:1989-08-08

    申请号:US113788

    申请日:1987-10-28

    IPC分类号: H01S5/22 H01S5/223 H01S5/323

    摘要: A laser has an active layer formed on a prepared substrate, a cladding layer on the active layer and a contact layer on the cladding layer. The active layer and contact layer are formed of a semiconductor material of elements from Groups III-V. The contact layer and cladding layer are formed into an elongated projecting rib wherein the cladding layer has a remaining planar portion disposed across the active layer. An insulating layer of semiconductor of elements from Group II-VI is formed on each side of the rib supported on the remaining cladding layer.

    摘要翻译: 激光器具有形成在准备好的基板上的有源层,有源层上的包覆层和包覆层上的接触层。 有源层和接触层由来自III-V族的元素的半导体材料形成。 接触层和包层形成为细长的突出肋,其中包覆层具有跨过活性层设置的剩余平面部分。 在支撑在剩余包层上的肋的每一侧上形成有II-VI族元素半导体绝缘层。

    Method of making surface emission type semiconductor laser
    2.
    发明授权
    Method of making surface emission type semiconductor laser 失效
    制造表面发射型半导体激光器的方法

    公开(公告)号:US5587335A

    公开(公告)日:1996-12-24

    申请号:US501660

    申请日:1995-07-12

    摘要: In order to manufacture a surface emission type semiconductor laser, a plurality of semiconductor layers including a multilayered semiconductor mirror, a cladding layer, an active layer and other layers are sequentially formed on a substrate through the organic metal vapor growth method. A photoresist mask is then formed on the semiconductor layers. At least the cladding layer in the semiconductor layers is anisotropically etched by the use of the photoresist mask. At least one column-like portion is thus formed to have sidewalls extending perpendicular to the substrate and to guide the light in a direction perpendicular to the substrate. Thereafter, a buried layer including a single layer formed therein at an area covering at least the sidewalls of the column-like portion is formed around the column-like portion. A multilayered dielectric mirror is deposited in the column-like portion on the light exit end thereof. The multilayered dielectric mirror is disposed at the light exit port of a light exit side electrode. To increase the reflectivity below the light exit side electrode, a multilayered semiconductor mirror may be formed in the column-like portion at a position nearer the light exit side than the cladding layer.

    摘要翻译: 为了制造表面发射型半导体激光器,通过有机金属蒸气生长法在衬底上依次形成包括多层半导体镜,包层,有源层等的多个半导体层。 然后在半导体层上形成光致抗蚀剂掩模。 至少通过使用光致抗蚀剂掩模对半导体层中的包覆层进行各向异性蚀刻。 因此,至少一个柱状部分形成为具有垂直于衬底延伸的侧壁并且在垂直于衬底的方向上引导光。 此后,在柱状部分周围形成包括在至少覆盖柱状部分的侧壁的区域上形成的单层的埋层。 在其出射端的柱状部分中沉积多层电介质镜。 多层电介质反射镜设置在光出射侧电极的光出射口。 为了增加光出射侧电极之下的反射率,可以在比包层更靠近光出射侧的位置的柱状部分中形成多层半导体镜。

    Optical head and optical memory device
    3.
    发明授权
    Optical head and optical memory device 失效
    光头和光存储器

    公开(公告)号:US5436876A

    公开(公告)日:1995-07-25

    申请号:US162902

    申请日:1993-12-08

    摘要: A small and inexpensive optical head for detecting a recorded signal, a focusing error signal and a tracking error signal, and an optical memory device utilizing the optical head. A diffraction device (103) is provided having two chirped grating regions (103A, 103B) for dividing a light beam from an optical recording medium (105) and directing the divided beams toward four band-shaped photoelectric transducers (106) and an astigmatism generator formed by the diffraction device (103) and a positive lens (102). The four photoelectric transducers are positioned in a plane inclined with respect to the optical axis of zero-order diffraction light, and the longitudinal axes of each of the band-shaped photoelectric transducers are radially arranged relative to the optical axis.

    摘要翻译: 用于检测记录信号的小而廉价的光学头,聚焦误差信号和跟踪误差信号,以及利用光学头的光学存储器件。 衍射装置(103)具有两个用于分割来自光记录介质(105)的光束的啁啾光栅区域(103A,103B),并将分束光束引向四个带状光电变换器(106)和像散发生器 由衍射装置(103)和正透镜(102)形成。 四个光电传感器位于相对于零级衍射光的光轴倾斜的平面中,并且每个带状光电变换器的纵轴相对于光轴径向布置。

    Surface emission type semiconductor laser
    4.
    发明授权
    Surface emission type semiconductor laser 失效
    表面发射型半导体激光器

    公开(公告)号:US5295148A

    公开(公告)日:1994-03-15

    申请号:US13024

    申请日:1993-02-02

    摘要: A surface emission type semiconductor laser includes a plurality of semiconductor layers defining at least one resonator in a direction perpendicular to the semiconductor substrate of the laser, the layers including at least a cladding layer in the semiconductor layers being formed into at least one column-like portion extending in a direction perpendicular to the semiconductor substrate, and a II-VI group compound semiconductor epitaxial layer buried around the column-like portion. The column-like portion is of rectangular cross-section in a plane parallel to the semiconductor substrate and having longer and shorter sides, whereby the polarization plane of said emitted laser beam is parallel to the direction of said shorter sides.

    摘要翻译: 表面发射型半导体激光器包括在与激光器的半导体衬底垂直的方向上限定至少一个谐振器的多个半导体层,所述至少一层半导体层中的包层被形成为至少一个柱状 在垂直于半导体衬底的方向延伸的部分,以及围绕柱状部分埋设的II-VI族化合物半导体外延层。 柱状部分在与半导体衬底平行的平面中具有矩形横截面并且具有较长和较短的侧面,由此所述发射的激光束的偏振面平行于所述短边的方向。

    Method of anisotropic dry etching of thin film semiconductors
    6.
    发明授权
    Method of anisotropic dry etching of thin film semiconductors 失效
    薄膜半导体的各向异性干蚀刻方法

    公开(公告)号:US5194119A

    公开(公告)日:1993-03-16

    申请号:US485058

    申请日:1990-02-22

    IPC分类号: H01L21/465 H01L21/467

    CPC分类号: H01L21/465 H01L21/467

    摘要: A microwave ECR plasma etching method and apparatus employs a combination reactive gas medium supplied to a microwave excitation ECR plasma chamber coupled to a treatment chamber containing a Group II-VI sample to be etched. A reactive gas plasma is formed containing reactive species in the plasma chamber and the Group II-VI sample is irradiated with a beam of reactive species formed from the reactive gas plasma. The reactive gas medium is selected from the group consisting of a hydrogen halogenate, a mixture of a halogen gas and an inert gas, a mixture of a halogen gas and hydrogen gas, a mixture of a halogen gas, an inert gas and hydrogen gas, and a mixture of a halogen gas and nitrogen gas.

    摘要翻译: 微波ECR等离子体蚀刻方法和装置采用提供给微波激发ECR等离子体室的组合反应气体介质,该等离子体室与含有要蚀刻的II-VI族样品的处理室相连。 在等离子体室中形成含有反应性物质的反应气体等离子体,并且使用由反应性气体等离子体形成的反应物质束照射II-VI族样品。 反应性气体介质选自卤化氢,卤素气体和惰性气体的混合物,卤素气体和氢气的混合物,卤素气体,惰性气体和氢气的混合物, 以及卤素气体和氮气的混合物。

    Electrophotographic sensitive member with amorphous Si barrier layer
    9.
    发明授权
    Electrophotographic sensitive member with amorphous Si barrier layer 失效
    具有非晶Si阻挡层的电子照相敏感元件

    公开(公告)号:US4675264A

    公开(公告)日:1987-06-23

    申请号:US885923

    申请日:1986-07-15

    IPC分类号: G03G5/082 G03G5/14

    CPC分类号: G03G5/08242

    摘要: The invention relates to improvements in an electrophotographic sensitive member having a photoconductive layer formed with amorphous silicon produced by glow discharge decomposition or sputtering. An electrophotographic sensitive member is formed by laminating an amorphous silicon barrier layer and an amorphous photoconductive layer successively on an electrically conductive substrate, the first mentioned layer containing an impurity of Group IIIa of Periodic Table of Elements, or nitrogen and impurity of Group IIIa of same Table, and also containing oxygen within a range of 0.1 to 20.0 atomic % at the point of the layer and in a progressively decreasing pattern throughout the rest thereof. Constructed as such, the photosensitive member has an increased photosensitivity to near-infrared beams, a large charge-holding capability, and low-rate dark attenuation characteristics. In addition, it is less expensive to manufacture.

    摘要翻译: 本发明涉及具有由辉光放电分解或溅射产生的非晶硅形成的光电导层的电子照相敏感元件的改进。 通过在导电性基板上依次层叠非晶硅阻隔层和非晶质光电导层而形成电子照相感光体,所述第一层含有元素周期表IIIa族的杂质,或含有相同的IIIa族的氮和杂质 表中,并且在该层的点处还含有0.1至20.0原子%范围内的氧,并且在其余部分中以逐渐递减的图案含有氧。 因此,感光构件对近红外光束具有增加的光敏性,大的电荷保持能力和低速率暗衰减特性。 此外,制造成本较低。

    Amorphous silicon electrophotographic sensitive member
    10.
    发明授权
    Amorphous silicon electrophotographic sensitive member 失效
    非晶硅电子照相敏感元件

    公开(公告)号:US4666808A

    公开(公告)日:1987-05-19

    申请号:US594201

    申请日:1984-03-28

    IPC分类号: G03G5/082 G03G5/14

    CPC分类号: G03G5/08242

    摘要: The invention relates to improvements in an electrophotographic sensitive member having a photoconductive layer formed with amorphous silicon produced by glow discharge decomposition or sputtering. An electrophotographic sensitive member is formed by laminating an amorphous silicon barrier layer and an amorphous photoconductive layer successively on an electrically conductive substrate, the first mentioned layer containing an impurity of Group IIIa of Periodic Table of Elements, or nitrogen and impurity of Group IIIa of same Table, and also containing oxygen within a range of 0.1 to 20.0 atomic % at the point of the layer and in a progressively decreasing pattern throughout the rest thereof. Constructed as such, the photosensitive member has an increased photosensitivity to near-infrared beams, a large charge-holding capability, and low-rate dark attenuation characteristics. In addition, it is less expensive to manufacture.

    摘要翻译: 本发明涉及具有由辉光放电分解或溅射产生的非晶硅形成的光电导层的电子照相敏感元件的改进。 通过在导电性基板上依次层叠非晶硅阻隔层和非晶质光电导层而形成电子照相感光体,所述第一层含有元素周期表IIIa族的杂质,或含有相同的IIIa族的氮和杂质 表中,并且在该层的点处还含有0.1至20.0原子%范围内的氧,并且在其余部分中以逐渐递减的图案含有氧。 因此,感光构件对近红外光束具有增加的光敏性,大的电荷保持能力和低速率暗衰减特性。 此外,制造成本较低。