摘要:
In an electrophotographic process using an amorphous silicon photosensitive member which has a surface protective layer and effecting reverse development and cleaning with a cleaning blade, the surface moving speed PS (mm/sec) of the photosensitive member is 320 mm/sec or more and a film thickness and a specific resistance value of the surface protective layer are respectively Ds (&mgr;m) and Rs (&OHgr;·cm) which fulfill the following conditions: 1.0×109≦Rs≦1.0×1013 Ds≦−0.136Ln(Rs)+(−0.004×PS+6).
摘要:
A method for performing a cleaning process uses a cleaning gas and high-frequency power upon a film deposition apparatus for depositing a film on a substrate placed in a reactor chamber which can be evacuated to a low pressure. Supplying of high-frequency power is temporarily stopped in the middle of the cleaning process, and the cleaning process is restarted by again supplying high-frequency power. This method is capable of effectively removing by-products from the inside of a reactor chamber and makes it possible to form a high-quality deposition film, in particular, a high-quality electrophotographic photosensitive drum.
摘要:
Provided is a film formation mask capable of preventing slit-like openings from being closed by vibrations so as to form a highly precise patterned film with stability. In a film formation mask formed by providing multiple slit-like openings in a metal foil, the shape of the opening of at least one end of the slit-like openings is asymmetrical with respect to a center line of the width direction of the slit-like openings.
摘要:
Provided is a film formation mask capable of preventing slit-like openings from being closed by vibrations so as to form a highly precise patterned film with stability. In a film formation mask formed by providing multiple slit-like openings in a metal foil, the shape of the opening of at least one end of the slit-like openings is asymmetrical with respect to a center line of the width direction of the slit-like openings.
摘要:
In the electrophotographic method of the present invention employing a photosensitive member and forming an electrostatic latent image by a charging step and a light beam irradiating step, in order to improve the dot reproducibility in the output image to thereby obtain an image with excellent gradation property, the amount of potential attenuation in the depth direction at light beam irradiation for one pixel of the photosensitive member is set so as to be not less than 65% but less than 135% of the amount of potential attenuation in the depth direction at the continuous light beam irradiation.
摘要:
A light-receiving member comprising a conductive substrate, and formed superposingly thereon a photosensitive layer and a surface protective layer in order. The light-receiving member has a surface roughness Ra of from 15 nm to 100 nm. Also disclosed is an image-forming apparatus having such a light-receiving member, and an image-forming method of rendering visible an electrostatic pattern formed on the light-receiving member. The light-receiving member promises stable formation of images over a long period of time.
摘要:
An electrophotographic process is implemented with improved ghost memory and with high chargeability even under circumstances of increased process speed or compactified structure and the electrophotographic process forms an image on a photosensitive member having a photosensitive layer through a series of steps including steps of charge elimination, charging, latent image exposure, and development to form a toner image, wherein light used in the latent image exposure step is light of a wavelength within such a range that a value of (optical memory before charging)/(sensitivity) of the photosensitive layer is not more than 1.5 times a minimum value. The optical memory before charging means lowering in chargeability due to light irradiation before charging.
摘要:
A photosensitive member to be used for an image-forming apparatus effectively suppresses the effect of wetting the foreign matters adhered to the surface thereof, reduces the load of the cleaning unit and prolong the service life of the photosensitive member so that the image-forming apparatus may be down-sized. In the photosensitive member, the surface free energy (&ggr;) on the uppermost surface of the photosensitive member is made between 35 and 65 mN/m and the variation of the surface free energy &Dgr;&ggr; is made less than 25 mN/m during long operation.
摘要:
A cylindrical, photosensitive member is disclosed which has a photosensitive layer comprising amorphous silicon provided on an electroconductive substrate, and in which the thickness of the electroconductive substrate is not less than 0.1 mm but less than 2.5 mm, thereby accomplishing cost reduction of the photosensitive member and also accomplishing prevention of variations of image density and image smearing by high-accuracy temperature control.
摘要:
Provided is a film formation mask capable of preventing slit-like openings from being closed by vibrations so as to form a highly precise patterned film with stability. In a film formation mask formed by providing multiple slit-like openings in a metal foil, the shape of the opening of at least one end of the slit-like openings is asymmetrical with respect to a center line of the width direction of the slit-like openings.