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    Positive type resist composition and resist pattern formation method using same
    1.
    发明授权
    Positive type resist composition and resist pattern formation method using same 有权
    正型抗蚀剂组合物和使用其的抗蚀剂图案形成方法

    公开(公告)号：US07316888B2

    公开(公告)日：2008-01-08

    申请号：US11347102

    申请日：2006-02-02

    申请人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    发明人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

    摘要翻译： 提供一种正型树脂组合物，其包含（A）树脂组分，其在主链内包含衍生自（甲基）丙烯酸酯的结构单元，并且在酯侧链部分上并入含有多环基团的酸解离的溶解抑制基团 （B）在暴露时产生酸的酸产生剂组分和（C）有机溶剂，其中组分（A）包含衍生自甲基丙烯酸酯的结构单元 酯和衍生自丙烯酸酯的结构单元。 根据这样的抗蚀剂组合物，可以形成抗蚀剂图案，其在蚀刻时显示出很小的表面粗糙度和线边缘粗糙度，并且还提供优异的分辨率和宽的焦深范围。

    Positive type resist composition and resist pattern formation method using same
    3.
    发明授权
    Positive type resist composition and resist pattern formation method using same 有权
    正型抗蚀剂组合物和使用其的抗蚀剂图案形成方法

    公开(公告)号：US07501221B2

    公开(公告)日：2009-03-10

    申请号：US11347167

    申请日：2006-02-02

    申请人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    发明人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, whereinthe component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

    摘要翻译： 提供一种正型树脂组合物，其包含（A）树脂组分，其在主链内包含衍生自（甲基）丙烯酸酯的结构单元，并且在酯侧链部分上并入含有多环基团的酸解离的溶解抑制基团 （B）在暴露时产生酸的酸产生剂组分和（C）有机溶剂，其中组分（A）包含衍生自甲基丙烯酸酯的结构单元 酯和衍生自丙烯酸酯的结构单元。 根据这样的抗蚀剂组合物，可以形成抗蚀剂图案，其在蚀刻时显示出很小的表面粗糙度和线边缘粗糙度，并且还提供优异的分辨率和宽的焦深范围。

    Positive type resist composition and resist pattern formation method using same
    4.
    发明授权
    Positive type resist composition and resist pattern formation method using same 有权
    正型抗蚀剂组合物和使用其的抗蚀剂图案形成方法

    公开(公告)号：US07435530B2

    公开(公告)日：2008-10-14

    申请号：US11621437

    申请日：2007-01-09

    申请人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    发明人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

    摘要翻译： 一种正型树脂组合物，其包含（A）树脂组分，其在所述主链内包含衍生自（甲基）丙烯酸酯的结构单元，并且在酯侧链部分上并入含有多环基团的酸解离的溶解抑制基团， 在碱的作用下，碱的溶解度增加，（B）暴露时产生酸的酸产生剂组分和（C）有机溶剂，其中组分（A）包含衍生自甲基丙烯酸酯的结构单元和 衍生自丙烯酸酯的结构单元。 根据这样的抗蚀剂组合物，可以形成抗蚀剂图案，其在蚀刻时显示出很小的表面粗糙度和线边缘粗糙度，并且还提供优异的分辨率和宽的焦深范围。

    Method of forming resist pattern, positive resist composition, and layered product
    6.
    发明授权
    Method of forming resist pattern, positive resist composition, and layered product 有权
    形成抗蚀剂图案的方法，正型抗蚀剂组合物和层状产品

    公开(公告)号：US07316885B2

    公开(公告)日：2008-01-08

    申请号：US10535533

    申请日：2003-12-01

    申请人： Hideo Hada ,  Miwa Miyairi ,  Naotaka Kubota ,  Takeshi Iwai

    发明人： Hideo Hada ,  Miwa Miyairi ,  Naotaka Kubota ,  Takeshi Iwai

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/40 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： There are provided a method of forming a resist pattern that enables the resist pattern to be formed with good control of the pattern size, as well as a positive resist composition used in the method, and a layered product formed using the positive resist composition. In the above method a positive resist composition comprising a resin component (A), which contains a structural unit (a1) derived from a (meth)acrylate ester represented by a general formula (I) shown below, and displays increased alkali solubility under action of acid, and an acid generator component (B) that generates acid on exposure is applied to a substrate, a prebake is conducted, the resist composition is selectively exposed, post exposure baking (PEB) is conducted, alkali developing is then used to form a resist pattern, and the pattern size of the thus produced resist pattern is then narrowed by heat treatment.

    摘要翻译： 提供一种形成抗蚀剂图案的方法，其能够形成对图案尺寸的良好控制，以及该方法中使用的正性抗蚀剂组合物和使用正性抗蚀剂组合物形成的层叠体。 在上述方法中，含有含有由下述通式（I）表示的（甲基）丙烯酸酯衍生的结构单元（a1））的树脂成分（A）的正型抗蚀剂组合物在动作中显示出增加的碱溶解性 的酸，并且在基材上产生酸的酸发生剂组分（B）施加到基材上，进行预烘烤，选择性地暴露抗蚀剂组合物，进行曝光后烘烤（PEB），然后用碱显影形成 抗蚀剂图案，然后通过热处理使由此制得的抗蚀剂图案的图案尺寸变窄。

    POSITIVE TYPE RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD USING SAME
    7.
    发明申请
    POSITIVE TYPE RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD USING SAME 有权
    使用相同类型的积极类型抗蚀剂组合物和抗蚀剂图案形成方法

    公开(公告)号：US20070190455A1

    公开(公告)日：2007-08-16

    申请号：US11621437

    申请日：2007-01-09

    申请人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    发明人： Takeshi Iwai ,  Naotaka Kubota ,  Satoshi Fujimura ,  Miwa Miyairi ,  Hideo Hada

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

    摘要翻译： 一种正型树脂组合物，其包含（A）树脂组分，其在所述主链内包含衍生自（甲基）丙烯酸酯的结构单元，并且在酯侧链部分上并入含有多环基团的酸解离的溶解抑制基团， 在碱的作用下，碱的溶解度增加，（B）暴露时产生酸的酸产生剂组分和（C）有机溶剂，其中组分（A）包含衍生自甲基丙烯酸酯的结构单元和 衍生自丙烯酸酯的结构单元。 根据这样的抗蚀剂组合物，可以形成抗蚀剂图案，其在蚀刻时显示出很小的表面粗糙度和线边缘粗糙度，并且还提供优异的分辨率和宽的焦深范围。

    Method of forming resist pattern, positive resist composition, and layered product
    10.
    发明申请
    Method of forming resist pattern, positive resist composition, and layered product 有权
    形成抗蚀剂图案的方法，正型抗蚀剂组合物和层状产品

    公开(公告)号：US20060154181A1

    公开(公告)日：2006-07-13

    申请号：US10535533

    申请日：2003-12-01

    申请人： Hideo Hada ,  Miwa Miyairi ,  Naotaka Kubota ,  Takeshi Iwai

    发明人： Hideo Hada ,  Miwa Miyairi ,  Naotaka Kubota ,  Takeshi Iwai

    IPC分类号： G03C5/00

    CPC分类号： G03F7/40 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： There are provided a method of forming a resist pattern that enables the resist pattern to be formed with good control of the pattern size, as well as a positive resist composition used in the method, and a layered product formed using the positive resist composition. In the above method a positive resist composition comprising a resin component (A), which contains a structural unit (a1) derived from a (meth)acrylate ester represented by a general formula (I) shown below, and displays increased alkali solubility under action of acid, and an acid generator component (B) that generates acid on exposure is applied to a substrate, a prebake is conducted, the resist composition is selectively exposed, post exposure baking (PEB) is conducted, alkali developing is then used to form a resist pattern, and the pattern size of the thus produced resist pattern is then narrowed by heat treatment.

    摘要翻译： 提供一种形成抗蚀剂图案的方法，其能够形成对图案尺寸的良好控制，以及该方法中使用的正性抗蚀剂组合物和使用正性抗蚀剂组合物形成的层叠体。 在上述方法中，含有含有由下述通式（I）表示的（甲基）丙烯酸酯衍生的结构单元（a1））的树脂成分（A）的正型抗蚀剂组合物在动作中显示出增加的碱溶解性 的酸，并且在基材上产生酸的酸发生剂组分（B）施加到基材上，进行预烘烤，选择性地暴露抗蚀剂组合物，进行曝光后烘烤（PEB），然后用碱显影形成 抗蚀剂图案，然后通过热处理使由此制得的抗蚀剂图案的图案尺寸变窄。