公开(公告)号：US20120122036A1

公开(公告)日：2012-05-17

申请号：US13352384

申请日：2012-01-18

申请人： Hikaru SUGITA ,  Nobuji MATSUMURA ,  Daisuke SHIMIZU ,  Toshiyuki KAI ,  Tsutomu SHIMOKAWA

发明人： Hikaru SUGITA ,  Nobuji MATSUMURA ,  Daisuke SHIMIZU ,  Toshiyuki KAI ,  Tsutomu SHIMOKAWA

IPC分类号： G03F7/20

CPC分类号： G03F7/11 ,  G03F7/0045 ,  G03F7/0757 ,  G03F7/265

摘要： A pattern forming method includes providing and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate. The under-layer film is irradiated with radiation through a mask to cause an acid to be selectively generated in an exposed area of the under-layer film. An upper-layer film which does not contain a radiation-sensitive acid generator and which contains a composition capable of polymerizing or crosslinking by an action of an acid is provided. A cured film is provided by polymerization or crosslinking selectively in an area of the upper-layer film corresponding to the exposed area of the under-layer film in which the acid has been generated. An area of the upper-layer film corresponding to an area of the under-layer film in which the acid has not been generated is removed.

摘要翻译： 图案形成方法包括提供和固化含有辐射敏感性酸产生剂的底层膜，其在暴露于基底上的辐射时产生酸。 底层膜通过掩模用辐射照射，以在底层膜的暴露区域中选择性地产生酸。 提供了不含有辐射敏感性酸产生剂并且含有能够通过酸的作用聚​​合或交联的组合物的上层膜。 通过在与产生酸的底层膜的暴露区域相对应的上层膜的区域中选择性地聚合或交联固化膜。 除去与未生成酸的下层膜的区域对应的上层膜的区域。

公开(公告)号：US20100285405A1

公开(公告)日：2010-11-11

申请号：US12775475

申请日：2010-05-07

申请人： Tsutomu SHIMOKAWA ,  Takuma Ebata

发明人： Tsutomu SHIMOKAWA ,  Takuma Ebata

IPC分类号： G03F7/004

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： A radiation-sensitive resin composition includes a resin, a radiation-sensitive acid generator, an acid diffusion controller, and a mixed solvent. The radiation-sensitive acid generator includes a compound (I) shown by a following general formula (I). The mixed solvent includes about 50 mass % to about 90 mass % of propylene glycol monomethyl ether acetate, wherein M+ represents a sulfonium cation or an iodonium cation, R represents a hydrogen atom or a hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, n represents an integer from 1 to 10, and m represents an integer from 1 to 4.

摘要翻译： 辐射敏感性树脂组合物包括树脂，辐射敏感性酸产生剂，酸扩散控制剂和混合溶剂。 辐射敏感性酸产生剂包括由以下通式（I）表示的化合物（I）。 混合溶剂包括约50质量％至约90质量％的丙二醇单甲醚乙酸酯，其中M +表示锍阳离子或碘鎓阳离子，R表示氢原子或具有1至8个碳原子的烃基，Rf表示 氟原子或碳原子数1〜4的全氟烷基，n表示1〜10的整数，m表示1〜4的整数。

公开(公告)号：US20110143279A1

公开(公告)日：2011-06-16

申请号：US13005539

申请日：2011-01-13

申请人： Tsutomu SHIMOKAWA ,  Takuma Ebata ,  Kaori Sakai ,  Yoshifumi Oizumi ,  Akimasa Soyano ,  Noboru Otsuka

发明人： Tsutomu SHIMOKAWA ,  Takuma Ebata ,  Kaori Sakai ,  Yoshifumi Oizumi ,  Akimasa Soyano ,  Noboru Otsuka

IPC分类号： G03F7/004

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： A radiation-sensitive resin composition includes a sulfonate or sulfonic acid group-containing photoacid generator and a resin. The sulfonate or sulfonic acid group-containing photoacid generator includes a partial structure shown by a following formula (1), wherein R1 represents a substituted or unsubstituted linear or branched monovalent hydrocarbon group having 1 to 30 carbon atoms, a substituted or unsubstituted cyclic or partially cyclic monovalent hydrocarbon group having 3 to 30 carbon atoms, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted cyclic monovalent organic group having 4 to 30 carbon atoms that include a hetero atom.

摘要翻译： 辐射敏感性树脂组合物包含含磺酸酯基或含磺酸基的光酸产生剂和树脂。 含有磺酸基或含磺酸基的光酸产生剂包括由下式（1）表示的部分结构，其中R 1表示取代或未取代的具有1至30个碳原子的直链或支链一价烃基，取代或未取代的环状或部分 具有3〜30个碳原子的环状一价烃基，取代或未取代的碳原子数为6〜30的芳基，或取代或未取代的包含杂原子的碳原子数为4〜30的环状一价有机基团。