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    Liquid crystal display and heater control circuit for use with said display
    6.
    发明授权
    Liquid crystal display and heater control circuit for use with said display 失效
    液晶显示器和加热器控制电路，用于与所述显示器一起使用

    公开(公告)号：US5744819A

    公开(公告)日：1998-04-28

    申请号：US945625

    申请日：1992-09-16

    申请人： Takashi Yamamoto ,  Shigeru Noda ,  Hiroyuki Yokomizo ,  Hiroshi Takabayashi ,  Makoto Uehara ,  Mitsuo Iwayama

    发明人： Takashi Yamamoto ,  Shigeru Noda ,  Hiroyuki Yokomizo ,  Hiroshi Takabayashi ,  Makoto Uehara ,  Mitsuo Iwayama

    IPC分类号： G02F1/133 ,  G02F1/141 ,  H01L29/04 ,  H01L31/036

    CPC分类号： G02F1/133382 ,  G02F1/141

    摘要： There is disclosed a liquid crystal display comprising a liquid crystal panel having a pair of boards each formed with an electrode and arranged opposedly, and a liquid crystal disposed between said boards, a heater provided near or adjacent said panel, means for detecting the temperature of said panel, and a control circuit for controlling the amount of heat generated by said heater in accordance with a comparison result between an output of said detecting means and a first set temperature for use when said liquid crystal panel is in a service state, or a second set temperature for use when said liquid crystal panel is in a non-service state.

    摘要翻译： 公开了一种液晶显示器，它包括一个液晶面板，它具有一对板，每个板形成有一个电极并且相对设置，并且一个液晶设置在所述板之间，设置在靠近或邻近所述面板的加热器，用于检测温度的装置 所述面板和控制电路，用于根据所述检测装置的输出与当所述液晶面板处于使用状态时使用的第一设定温度之间的比较结果来控制由所述加热器产生的热量， 当所述液晶面板处于非使用状态时使用的第二设定温度。

    Multi-wavelength projection exposure and alignment apparatus
    7.
    发明授权
    Multi-wavelength projection exposure and alignment apparatus 失效
    多波长投影曝光和对准装置

    公开(公告)号：US4798962A

    公开(公告)日：1989-01-17

    申请号：US16120

    申请日：1987-02-18

    申请人： Koichi Matsumoto ,  Yutaka Suenaga ,  Makoto Uehara ,  Kiyoyuki Muramatsu

    发明人： Koichi Matsumoto ,  Yutaka Suenaga ,  Makoto Uehara ,  Kiyoyuki Muramatsu

    IPC分类号： G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/67 ,  H01L21/68 ,  G01B11/00

    CPC分类号： G03F9/70

    摘要： A projection exposure apparatus has a pattern lighting optical system including an exposure light source for lighting a pattern on a photomask, a projection optical system for forming an image of the pattern lighted by the exposure light source on the surface of a wafer, an alignment lighting optical system including an alignment light source for lighting alignment marks on the photomask and the wafer, and an alignment optical system for detecting relative positional relationship between the mask pattern and the wafer through the projection optical system, and further the projection optical system includes an image-forming system which exhibits two extremums of axial aberration as a function of wavelength.

    摘要翻译： 投影曝光装置具有图案照明光学系统，其包括用于点亮光掩模上的图案的曝光光源，用于在晶片表面上形成由曝光光源照射的图案的图像的投影光学系统，对准照明 光学系统，包括用于照明光掩模和晶片上的对准标记的对准光源，以及用于通过投影光学系统检测掩模图案和晶片之间的相对位置关系的对准光学系统，此外，投影光学系统包括图像 表现出作为波长的函数的两个轴向像差极值的系统。

    Optical apparatus for detecting the position of an object
    8.
    发明授权
    Optical apparatus for detecting the position of an object 失效
    用于检测物体位置的光学装置

    公开(公告)号：US4789242A

    公开(公告)日：1988-12-06

    申请号：US894840

    申请日：1986-08-08

    申请人： Shuhei Takagi ,  Makoto Uehara ,  Koichi Matsumoto

    发明人： Shuhei Takagi ,  Makoto Uehara ,  Koichi Matsumoto

    IPC分类号： G02B27/46 ,  G01B11/00 ,  G01S17/02 ,  G03F9/00 ,  H01L21/027

    CPC分类号： G03F9/70 ,  G01S17/02

    摘要： An optical apparatus comprising a laser light source, an optical system for focusing a beam of light from the laser light source onto an object surface through an objective lens and a spatial filter disposed at the entrance pupil of the objective lens or at a position conjugated with the entrance pupil, wherein the origin of the divergence of the laser beam having an angle of divergence emitted from the laser light source is projected on the entrance pupil of the objective lens by the optical system.

    摘要翻译： 一种光学装置，包括激光光源，用于通过物镜将来自激光光源的光束聚焦到物体表面上的光学系统，以及设置在物镜的入射光瞳上的空间滤光器或与物镜共轭的位置 入射光瞳，其中具有从激光源发射的发散角的激光束的发散的原点通过光学系统投影在物镜的入射光瞳上。

    Mirror converging-type illumination optical system
    10.
    发明授权
    Mirror converging-type illumination optical system 失效
    镜面会聚式照明光学系统

    公开(公告)号：US4637691A

    公开(公告)日：1987-01-20

    申请号：US576477

    申请日：1984-02-02

    申请人： Makoto Uehara ,  Sumio Hashimoto

    发明人： Makoto Uehara ,  Sumio Hashimoto

    IPC分类号： G03B27/54 ,  G02B5/00 ,  G02B17/08 ,  G02B19/00 ,  G02B21/06 ,  G02B27/09 ,  G02F1/19 ,  G03F7/20

    CPC分类号： G03F7/70058 ,  G02B19/0028 ,  G02B19/0047 ,  G02B21/06 ,  G02B5/001

    摘要： A mirror converging-type illumination optical system for converging light rays from a light source into substantially parallel light rays using a concave reflecting mirror having a secondary curved surface comprises a conical refraction member having a convex conical refraction surface at an input or incident side thereof and another convex conical refraction surface at an output side thereof. The refraction member is arranged in a path of the parallel light rays with a vertex of the conical refraction member being substantially aligned with the optical axis of the illumination optical system. The refraction member inverts the inner and outer portions of the incident parallel light rays. The absence of incident parallel light around the optical axis thereof is corrected to achieve a uniform intensity of light rays.

    摘要翻译： 使用具有次级曲面的凹面反射镜将来自光源的光线会聚到基本上平行的光线的镜面会聚式照明光学系统包括在输入或入射侧具有凸锥形折射面的锥形折射构件， 在其输出侧的另一个凸锥形折射表面。 折射构件布置在平行光线的路径中，其中锥形折射构件的顶点基本上与照明光学系统的光轴对准。 折射构件使入射的平行光线的内部和外部反转。 校正光轴周围没有入射平行光，以实现均匀的光线强度。